JP1534915S - - Google Patents
Info
- Publication number
- JP1534915S JP1534915S JPD2014-28699F JP2014028699F JP1534915S JP 1534915 S JP1534915 S JP 1534915S JP 2014028699 F JP2014028699 F JP 2014028699F JP 1534915 S JP1534915 S JP 1534915S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2014-28699F JP1534915S (en) | 2014-12-22 | 2014-12-22 | |
| US29/530,928 USD799690S1 (en) | 2014-12-22 | 2015-06-22 | Inner cylinder for exhaust gas treatment apparatus |
| TW104303356F TWD174342S (en) | 2014-12-22 | 2015-06-22 | Part of the inner cylinder of the exhaust gas treatment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2014-28699F JP1534915S (en) | 2014-12-22 | 2014-12-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1534915S true JP1534915S (en) | 2015-10-13 |
Family
ID=54258352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2014-28699F Active JP1534915S (en) | 2014-12-22 | 2014-12-22 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1534915S (en) |
| TW (1) | TWD174342S (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1038901S1 (en) | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
-
2014
- 2014-12-22 JP JPD2014-28699F patent/JP1534915S/ja active Active
-
2015
- 2015-06-22 TW TW104303356F patent/TWD174342S/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWD174342S (en) | 2016-03-11 |