TWD159675S - Rotator for substrate processing device - Google Patents

Rotator for substrate processing device

Info

Publication number
TWD159675S
TWD159675S TW102302399F TW102302399F TWD159675S TW D159675 S TWD159675 S TW D159675S TW 102302399 F TW102302399 F TW 102302399F TW 102302399 F TW102302399 F TW 102302399F TW D159675 S TWD159675 S TW D159675S
Authority
TW
Taiwan
Prior art keywords
processing device
substrate processing
rotator
motor
revolving part
Prior art date
Application number
TW102302399F
Other languages
Chinese (zh)
Inventor
Toru Kagaya
Hironori Shimada
Yoshitaka Abe
Original Assignee
日立國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司 filed Critical 日立國際電氣股份有限公司
Publication of TWD159675S publication Critical patent/TWD159675S/en

Links

Abstract

【物品用途】;本設計的物品是基板處理裝置用廻轉器，為一種中介著安裝凸緣而安裝在用來處理晶圓的基板處理裝置上來使用的廻轉器，並且是在廻轉部載置著用來保持晶圓的晶舟，可使晶舟廻轉的廻轉器。再者，廻轉部是介設著馬達安裝部(coupling)而被連接在馬達，利用馬達使其驅動。;【設計說明】[Purpose of the article]; The article of this design is a revolver for a substrate processing device, which is a revolver that is mounted on a substrate processing device for processing wafers via a mounting flange, and a wafer boat for holding wafers is placed on the revolving part, and the revolving part can revolve. Furthermore, the revolving part is connected to the motor via a motor mounting part (coupling), and is driven by the motor. ; [Design description]

TW102302399F 2012-11-30 2013-04-01 Rotator for substrate processing device TWD159675S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012029398 2012-11-30

Publications (1)

Publication Number Publication Date
TWD159675S true TWD159675S (en) 2014-04-01

Family

ID=90414780

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102302399F TWD159675S (en) 2012-11-30 2013-04-01 Rotator for substrate processing device

Country Status (1)

Country Link
TW (1) TWD159675S (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

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