TWD227585S - Collimator for use in a physical vapor deposition (pvd) chamber - Google Patents

Collimator for use in a physical vapor deposition (pvd) chamber Download PDF

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Publication number
TWD227585S
TWD227585S TW111303316F TW111303316F TWD227585S TW D227585 S TWD227585 S TW D227585S TW 111303316 F TW111303316 F TW 111303316F TW 111303316 F TW111303316 F TW 111303316F TW D227585 S TWD227585 S TW D227585S
Authority
TW
Taiwan
Prior art keywords
pvd
collimator
chamber
vapor deposition
physical vapor
Prior art date
Application number
TW111303316F
Other languages
Chinese (zh)
Inventor
馬丁李 萊克
凱斯Ａ 米勒
路克菲安妮 法凱
祥金 謝
奇索庫瑪 卡拉瑟帕蘭比爾
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD227585S publication Critical patent/TWD227585S/en

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Abstract

【物品用途】;本設計所請求係用於物理氣相沉積(PVD)腔室的準直器。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。【Use of article】;The design requested is a collimator for physical vapor deposition (PVD) chamber. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.

Description

用於物理氣相沉積(PVD)腔室的準直器 Collimators for physical vapor deposition (PVD) chambers

本設計所請求係用於物理氣相沉積(PVD)腔室的準直器。 This design request is for a collimator for a physical vapor deposition (PVD) chamber.

圖式所揭露之虛線部分，為本案不主張設計之部分。 The dotted line parts revealed in the diagram are the parts that are not designed in this case.

TW111303316F 2022-04-22 2022-07-05 Collimator for use in a physical vapor deposition (pvd) chamber TWD227585S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/835,991 2022-04-22
US29/835,991 USD1026054S1 (en) 2022-04-22 2022-04-22 Collimator for a physical vapor deposition (PVD) chamber

Publications (1)

Publication Number Publication Date
TWD227585S true TWD227585S (en) 2023-09-21

Family

ID=84533806

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111303316F TWD227585S (en) 2022-04-22 2022-07-05 Collimator for use in a physical vapor deposition (pvd) chamber

Country Status (3)

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US (1) USD1026054S1 (en)
JP (1) JP1732968S (en)
TW (1) TWD227585S (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970009828B1 (en) * 1994-02-23 1997-06-18 Sansung Electronics Co Ltd Fabrication method of collimator
KR100206938B1 (en) * 1996-09-19 1999-07-01 구본준 Metan wiring structure of semiconductor device and manufacturing method thereof
US20090308739A1 (en) * 2008-06-17 2009-12-17 Applied Materials, Inc. Wafer processing deposition shielding components
USD760180S1 (en) * 2014-02-21 2016-06-28 Hzo, Inc. Hexcell channel arrangement for use in a boat for a deposition apparatus
US9831074B2 (en) * 2013-10-24 2017-11-28 Applied Materials, Inc. Bipolar collimator utilized in a physical vapor deposition chamber
US20150354054A1 (en) * 2014-06-06 2015-12-10 Applied Materials, Inc. Cooled process tool adapter for use in substrate processing chambers
JP5985581B2 (en) * 2014-11-05 2016-09-06 株式会社東芝 Processing device and collimator
US9543126B2 (en) * 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
KR20240127488A (en) * 2015-10-27 2024-08-22 어플라이드 머티어리얼스, 인코포레이티드 Biasable flux optimizer/collimator for pvd sputter chamber
KR102383703B1 (en) * 2016-03-05 2022-04-08 어플라이드 머티어리얼스, 인코포레이티드 Methods and apparatus for controlling ion fraction in physical vapor deposition processes
WO2017158978A1 (en) * 2016-03-14 2017-09-21 株式会社東芝 Processing device and collimator
JP6105115B1 (en) * 2016-03-14 2017-03-29 株式会社東芝 Processing device and collimator
JP6105114B1 (en) * 2016-03-14 2017-03-29 株式会社東芝 Film forming apparatus, sputtering apparatus, and collimator
JP2018154880A (en) * 2017-03-17 2018-10-04 株式会社東芝 Collimator and processing device
USD858468S1 (en) * 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) * 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD998575S1 (en) * 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

Also Published As

Publication number Publication date
JP1732968S (en) 2022-12-22
USD1026054S1 (en) 2024-05-07

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