JP1732968S - Collimator for physical vapor deposition chamber - Google Patents

Collimator for physical vapor deposition chamber

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Publication number
JP1732968S
JP1732968S JP2022014277F JP2022014277F JP1732968S JP 1732968 S JP1732968 S JP 1732968S JP 2022014277 F JP2022014277 F JP 2022014277F JP 2022014277 F JP2022014277 F JP 2022014277F JP 1732968 S JP1732968 S JP 1732968S
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JP
Japan
Prior art keywords
collimator
vapor deposition
physical vapor
deposition chamber
chamber
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JP2022014277F
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Japanese (ja)
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JP2022014277F 2022-04-22 2022-07-04 Collimator for physical vapor deposition chamber Active JP1732968S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/835,991 USD1026054S1 (en) 2022-04-22 2022-04-22 Collimator for a physical vapor deposition (PVD) chamber

Publications (1)

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JP1732968S true JP1732968S (en) 2022-12-22

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JP2022014277F Active JP1732968S (en) 2022-04-22 2022-07-04 Collimator for physical vapor deposition chamber

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US (1) USD1026054S1 (en)
JP (1) JP1732968S (en)
TW (1) TWD227585S (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970009828B1 (en) * 1994-02-23 1997-06-18 Sansung Electronics Co Ltd Fabrication method of collimator
KR100206938B1 (en) * 1996-09-19 1999-07-01 구본준 Metan wiring structure of semiconductor device and manufacturing method thereof
US20090308739A1 (en) * 2008-06-17 2009-12-17 Applied Materials, Inc. Wafer processing deposition shielding components
USD760180S1 (en) * 2014-02-21 2016-06-28 Hzo, Inc. Hexcell channel arrangement for use in a boat for a deposition apparatus
US9831074B2 (en) * 2013-10-24 2017-11-28 Applied Materials, Inc. Bipolar collimator utilized in a physical vapor deposition chamber
US20150354054A1 (en) * 2014-06-06 2015-12-10 Applied Materials, Inc. Cooled process tool adapter for use in substrate processing chambers
JP5985581B2 (en) * 2014-11-05 2016-09-06 株式会社東芝 Processing device and collimator
US9543126B2 (en) * 2014-11-26 2017-01-10 Applied Materials, Inc. Collimator for use in substrate processing chambers
EP3369108B1 (en) 2015-10-27 2021-08-04 Applied Materials, Inc. Biasable flux optimizer/collimator for pvd sputter chamber
US11037768B2 (en) * 2016-03-05 2021-06-15 Applied Materials, Inc. Methods and apparatus for controlling ion fraction in physical vapor deposition processes
JP6105115B1 (en) * 2016-03-14 2017-03-29 株式会社東芝 Processing device and collimator
JP6105114B1 (en) * 2016-03-14 2017-03-29 株式会社東芝 Film forming apparatus, sputtering apparatus, and collimator
US20180233335A1 (en) * 2016-03-14 2018-08-16 Kabushiki Kaisha Toshiba Processing device and collimator
JP2018154880A (en) * 2017-03-17 2018-10-04 株式会社東芝 Collimator and processing device
USD858468S1 (en) * 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) * 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD998575S1 (en) * 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1026054S1 (en) * 2022-04-22 2024-05-07 Applied Materials, Inc. Collimator for a physical vapor deposition (PVD) chamber

Also Published As

Publication number Publication date
TWD227585S (en) 2023-09-21
USD1026054S1 (en) 2024-05-07

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