TWD176440S - Inner cylinder for exhaust gas treatment device - Google Patents
Inner cylinder for exhaust gas treatment deviceInfo
- Publication number
- TWD176440S TWD176440S TW104303350D02F TW104303350D02F TWD176440S TW D176440 S TWD176440 S TW D176440S TW 104303350D02 F TW104303350D02 F TW 104303350D02F TW 104303350D02 F TW104303350D02 F TW 104303350D02F TW D176440 S TWD176440 S TW D176440S
- Authority
- TW
- Taiwan
- Prior art keywords
- view
- design
- treatment device
- item
- exhaust gas
- Prior art date
Links
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 238000002485 combustion reaction Methods 0.000 abstract 1
- 239000004973 liquid crystal related substance Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是排氣處理裝置用內筒。;【設計說明】;本物品是由氧化鋁材質之類的陶瓷所製成，如「使用狀態參考圖」所示，係在半導體、液晶、太陽能電池製造工序、或其他工序中作為排氣分解處理的排氣處理裝置中，本物品是形成燃燒室的內壁的零件，並做定期的更換使用。;與原設計差異在於：本設計的外周環造形與原設計略異；該等差異細微，不影響兩案的近似。;後視圖、左側視圖、右視圖與前視圖對稱，均省略之。;仰視圖與俯視圖對稱，仰視圖省略。[Use of the item]; The item of this design is the inner cylinder for the exhaust treatment device. ;[Design Description];This product is made of ceramics such as alumina. As shown in the "Usage Reference Picture", it is decomposed as exhaust gas in semiconductor, liquid crystal, solar cell manufacturing processes, or other processes. In the exhaust treatment device, this item forms the inner wall of the combustion chamber and should be replaced regularly. ;The difference from the original design is that the outer ring shape of this design is slightly different from the original design; these differences are subtle and do not affect the similarity between the two cases. ;The rear view, left view, right view are symmetrical with the front view and are omitted. ;The bottom view is symmetrical to the top view, and the bottom view is omitted.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2014-28697F JP1535123S (en) | 2014-12-22 | 2014-12-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD176440S true TWD176440S (en) | 2016-06-11 |
Family
ID=54258548
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104303350D02F TWD176440S (en) | 2014-12-22 | 2015-06-22 | Inner cylinder for exhaust gas treatment device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1535123S (en) |
| TW (1) | TWD176440S (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
-
2014
- 2014-12-22 JP JPD2014-28697F patent/JP1535123S/ja active Active
-
2015
- 2015-06-22 TW TW104303350D02F patent/TWD176440S/en unknown
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1535123S (en) | 2015-10-13 |
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