TWD159674S - 基板處理裝置用廻轉器 - Google Patents

基板處理裝置用廻轉器

Info

Publication number
TWD159674S
TWD159674S TW102302398F TW102302398F TWD159674S TW D159674 S TWD159674 S TW D159674S TW 102302398 F TW102302398 F TW 102302398F TW 102302398 F TW102302398 F TW 102302398F TW D159674 S TWD159674 S TW D159674S
Authority
TW
Taiwan
Prior art keywords
processing device
substrate processing
rotator
revolving part
revolver
Prior art date
Application number
TW102302398F
Other languages
English (en)
Inventor
Toru Kagaya
Hironori Shimada
Yoshitaka Abe
Original Assignee
日立國際電氣股份有限公司
Hitachi Int Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司, Hitachi Int Electric Inc filed Critical 日立國際電氣股份有限公司
Publication of TWD159674S publication Critical patent/TWD159674S/zh

Links

Abstract

【物品用途】;本設計的物品是基板處理裝置用廻轉器，為一種中介著安裝凸緣而安裝在用來處理晶圓的基板處理裝置上來使用的廻轉器，並且是在廻轉部載置著用來保持晶圓的晶舟，可使晶舟廻轉的廻轉器。再者，進料軸是用以將晶舟固定在廻轉部的軸。另外，驅動廻轉部的馬達，是被安裝在馬達安裝部(coupling)使用。;【設計說明】
TW102302398F 2012-11-30 2013-04-01 基板處理裝置用廻轉器 TWD159674S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012029397 2012-11-30

Publications (1)

Publication Number Publication Date
TWD159674S true TWD159674S (zh) 2014-04-01

Family

ID=90414912

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102302398F TWD159674S (zh) 2012-11-30 2013-04-01 基板處理裝置用廻轉器

Country Status (1)

Country Link
TW (1) TWD159674S (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber

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