SG157999A1 - Protective film forming apparatus and laser processing apparatus - Google Patents
Protective film forming apparatus and laser processing apparatusInfo
- Publication number
- SG157999A1 SG157999A1 SG200806865-2A SG2008068652A SG157999A1 SG 157999 A1 SG157999 A1 SG 157999A1 SG 2008068652 A SG2008068652 A SG 2008068652A SG 157999 A1 SG157999 A1 SG 157999A1
- Authority
- SG
- Singapore
- Prior art keywords
- wafer
- protective film
- film forming
- forming apparatus
- laser processing
- Prior art date
Links
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
- Coating Apparatus (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
FILM FORMING APPARATUS AND LASER PROCESSING APPARATUS A protective film forming apparatus for forming a protective film on the subject surface of a wafer. The protective film forming apparatus includes a spinner table for holding the wafer thereon under suction vacuum and rotating the wafer in a held condition thereof and resin applying means for applying a liquid resin to the wafer held on the spinner table. The resin applying means includes spraying means for spraying the liquid resin, an arm for supporting the spraying means, and swinging means for horizontally swinging the spraying means supported to the arm in a minimum required range from the center of rotation of the wafer to the outer circumference of the wafer.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008176536A JP2010012508A (en) | 2008-07-07 | 2008-07-07 | Protective film covering device and laser beam machining device |
Publications (1)
Publication Number | Publication Date |
---|---|
SG157999A1 true SG157999A1 (en) | 2010-01-29 |
Family
ID=41519763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200806865-2A SG157999A1 (en) | 2008-07-07 | 2008-09-16 | Protective film forming apparatus and laser processing apparatus |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2010012508A (en) |
KR (1) | KR20100005643A (en) |
CN (1) | CN101623685A (en) |
SG (1) | SG157999A1 (en) |
TW (1) | TW201002463A (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5591560B2 (en) * | 2010-03-02 | 2014-09-17 | 株式会社ディスコ | Laser processing equipment |
JP5681452B2 (en) * | 2010-11-08 | 2015-03-11 | 株式会社ディスコ | Measuring method and measuring device |
JP2013021211A (en) * | 2011-07-13 | 2013-01-31 | Disco Abrasive Syst Ltd | Method for processing wafer |
JP5902529B2 (en) * | 2012-03-28 | 2016-04-13 | 株式会社ディスコ | Laser processing method |
JP6137798B2 (en) * | 2012-09-26 | 2017-05-31 | 株式会社ディスコ | Laser processing apparatus and protective film coating method |
JP2014217805A (en) * | 2013-05-08 | 2014-11-20 | 株式会社ディスコ | Liquid resin coating device |
JP6570910B2 (en) | 2015-07-24 | 2019-09-04 | 株式会社ディスコ | Wafer processing method |
CN106183415A (en) * | 2016-06-30 | 2016-12-07 | 天津市鸿禄食品有限公司 | A kind of preparation method of food bag spray code spraying apparatus |
CN106941074B (en) * | 2017-04-27 | 2023-03-03 | 林文华 | Square wafer processing device and working method thereof |
CN110784949B (en) * | 2019-10-24 | 2022-04-19 | 大同新成新材料股份有限公司 | High-strength ultrahigh-power graphite electrode device |
CN113275293B (en) * | 2021-04-02 | 2022-09-23 | 湖南冉旭能源科技有限公司 | New energy battery is based on cleaning device of oxalic acid solution performance |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004322168A (en) * | 2003-04-25 | 2004-11-18 | Disco Abrasive Syst Ltd | Laser machining apparatus |
US20050074552A1 (en) * | 2003-10-07 | 2005-04-07 | Howard Ge | Photoresist coating process for microlithography |
CN1707752A (en) * | 2004-06-09 | 2005-12-14 | 中国科学院上海硅酸盐研究所 | Spray pyrolyzation processing method for nitride mixing hole type zinc oxide thin film material |
JP4621053B2 (en) * | 2005-03-30 | 2011-01-26 | 株式会社テックインテック | Substrate processing apparatus, substrate processing system, and substrate processing method |
JP4648056B2 (en) * | 2005-03-31 | 2011-03-09 | 株式会社ディスコ | Wafer laser processing method and laser processing apparatus |
JP5008849B2 (en) * | 2005-09-08 | 2012-08-22 | ソニーモバイルディスプレイ株式会社 | Laser processing method and manufacturing method of display device having transparent resin layer |
JP4777783B2 (en) * | 2006-01-26 | 2011-09-21 | 株式会社ディスコ | Laser processing equipment |
-
2008
- 2008-07-07 JP JP2008176536A patent/JP2010012508A/en active Pending
- 2008-08-05 TW TW097129629A patent/TW201002463A/en unknown
- 2008-08-27 KR KR1020080083828A patent/KR20100005643A/en not_active Application Discontinuation
- 2008-09-16 SG SG200806865-2A patent/SG157999A1/en unknown
- 2008-09-18 CN CN200810213150A patent/CN101623685A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN101623685A (en) | 2010-01-13 |
KR20100005643A (en) | 2010-01-15 |
TW201002463A (en) | 2010-01-16 |
JP2010012508A (en) | 2010-01-21 |
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