TWD165013S - 靜電夾盤之部分 - Google Patents
靜電夾盤之部分Info
- Publication number
- TWD165013S TWD165013S TW102300097F TW102300097F TWD165013S TW D165013 S TWD165013 S TW D165013S TW 102300097 F TW102300097 F TW 102300097F TW 102300097 F TW102300097 F TW 102300097F TW D165013 S TWD165013 S TW D165013S
- Authority
- TW
- Taiwan
- Prior art keywords
- view
- electrostatic chuck
- work
- same
- design
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 abstract 1
Abstract
【物品用途】;本創作係關於一種半導體晶圓處理組件，特別是靜電夾盤。;【設計說明】;後視圖與前視圖相同，故省略後視圖。右側視圖與左側視圖相同，故省略右側視圖。局部放大圖，係圖示本創作之靜電夾盤的上表面之部分。;圖式中虛線表示之部分為本案設計不主張之部分。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/407,085 USD708651S1 (en) | 2011-11-22 | 2011-11-22 | Electrostatic chuck |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD165013S true TWD165013S (zh) | 2014-12-21 |
Family
ID=51032253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102300097F TWD165013S (zh) | 2011-11-22 | 2012-05-08 | 靜電夾盤之部分 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD708651S1 (zh) |
| TW (1) | TWD165013S (zh) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD936187S1 (en) | 2020-02-12 | 2021-11-16 | Applied Materials, Inc. | Gas distribution assembly lid |
| USD1037778S1 (en) | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
| USD1071103S1 (en) | 2022-04-11 | 2025-04-15 | Applied Materials, Inc. | Gas distribution plate |
| USD1085029S1 (en) | 2022-07-19 | 2025-07-22 | Applied Materials, Inc. | Gas distribution plate |
| USD1104086S1 (en) | 2021-08-21 | 2025-12-02 | Applied Materials, Inc. | Gas distribution plate |
| USD1103948S1 (en) | 2021-08-21 | 2025-12-02 | Applied Materials, Inc. | Gas distribution plate |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD845770S1 (en) | 2017-01-10 | 2019-04-16 | Rockwood & Hines Glass Group Co. | Bottle |
| USD931240S1 (en) | 2019-07-30 | 2021-09-21 | Applied Materials, Inc. | Substrate support pedestal |
| USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
| USD1066620S1 (en) | 2021-02-12 | 2025-03-11 | Applied Materials, Inc. | Patterned heater pedestal with groove extensions |
| USD1054388S1 (en) * | 2021-10-15 | 2024-12-17 | Shin-Etsu Chemical Co., Ltd. | Carrier substrate for handling |
| USD1092578S1 (en) * | 2023-10-10 | 2025-09-09 | Guangzhou Avison Trading Co., Ltd. | Chuck set |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4724510A (en) * | 1986-12-12 | 1988-02-09 | Tegal Corporation | Electrostatic wafer clamp |
| US5055964A (en) * | 1990-09-07 | 1991-10-08 | International Business Machines Corporation | Electrostatic chuck having tapered electrodes |
| US5539609A (en) * | 1992-12-02 | 1996-07-23 | Applied Materials, Inc. | Electrostatic chuck usable in high density plasma |
| US5213349A (en) * | 1991-12-18 | 1993-05-25 | Elliott Joe C | Electrostatic chuck |
| US5350479A (en) * | 1992-12-02 | 1994-09-27 | Applied Materials, Inc. | Electrostatic chuck for high power plasma processing |
| KR100238629B1 (ko) * | 1992-12-17 | 2000-01-15 | 히가시 데쓰로 | 정전척을 가지는 재치대 및 이것을 이용한 플라즈마 처리장치 |
| JPH07153825A (ja) * | 1993-11-29 | 1995-06-16 | Toto Ltd | 静電チャック及びこの静電チャックを用いた被吸着体の処理方法 |
| US5822171A (en) | 1994-02-22 | 1998-10-13 | Applied Materials, Inc. | Electrostatic chuck with improved erosion resistance |
| US5883778A (en) | 1994-02-28 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with fluid flow regulator |
| EP0669644B1 (en) * | 1994-02-28 | 1997-08-20 | Applied Materials, Inc. | Electrostatic chuck |
| JPH09213777A (ja) * | 1996-01-31 | 1997-08-15 | Kyocera Corp | 静電チャック |
| US6215642B1 (en) * | 1999-03-11 | 2001-04-10 | Nikon Corporation Of Japan | Vacuum compatible, deformable electrostatic chuck with high thermal conductivity |
| WO2001086717A1 (en) * | 2000-05-10 | 2001-11-15 | Ibiden Co., Ltd. | Electrostatic chuck |
| US6583980B1 (en) * | 2000-08-18 | 2003-06-24 | Applied Materials Inc. | Substrate support tolerant to thermal expansion stresses |
| USD490827S1 (en) * | 2002-12-20 | 2004-06-01 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| USD497171S1 (en) * | 2002-12-20 | 2004-10-12 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| KR100573351B1 (ko) * | 2002-12-26 | 2006-04-25 | 미츠비시 쥬고교 가부시키가이샤 | 정전 척 |
| USD534135S1 (en) * | 2003-09-16 | 2006-12-26 | Traad Monique | Electromagnetic shield |
| US8525418B2 (en) * | 2005-03-31 | 2013-09-03 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| USD561206S1 (en) * | 2005-11-25 | 2008-02-05 | Momentive Performance Materials Inc. | Electrostatic chuck |
-
2011
- 2011-11-22 US US29/407,085 patent/USD708651S1/en active Active
-
2012
- 2012-05-08 TW TW102300097F patent/TWD165013S/zh unknown
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD936187S1 (en) | 2020-02-12 | 2021-11-16 | Applied Materials, Inc. | Gas distribution assembly lid |
| USD1104086S1 (en) | 2021-08-21 | 2025-12-02 | Applied Materials, Inc. | Gas distribution plate |
| USD1103948S1 (en) | 2021-08-21 | 2025-12-02 | Applied Materials, Inc. | Gas distribution plate |
| USD1071103S1 (en) | 2022-04-11 | 2025-04-15 | Applied Materials, Inc. | Gas distribution plate |
| USD1037778S1 (en) | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
| USD1085029S1 (en) | 2022-07-19 | 2025-07-22 | Applied Materials, Inc. | Gas distribution plate |
Also Published As
| Publication number | Publication date |
|---|---|
| USD708651S1 (en) | 2014-07-08 |
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