USD936187S1 - Gas distribution assembly lid - Google Patents

Gas distribution assembly lid Download PDF

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Publication number
USD936187S1
USD936187S1 US29/724,071 US202029724071F USD936187S US D936187 S1 USD936187 S1 US D936187S1 US 202029724071 F US202029724071 F US 202029724071F US D936187 S USD936187 S US D936187S
Authority
US
United States
Prior art keywords
gas distribution
distribution assembly
assembly lid
lid
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/724,071
Inventor
Muhannad MUSTAFA
Muhammad M. Rasheed
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/724,071 priority Critical patent/USD936187S1/en
Priority to TW109302179F priority patent/TWD214328S/en
Priority to TW109302179D01F priority patent/TWD214329S/en
Priority to JPD2020-8353F priority patent/JP1686169S/ja
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MUSTAFA, Muhannad, RASHEED, MUHAMMAD M.
Application granted granted Critical
Publication of USD936187S1 publication Critical patent/USD936187S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a top-front parallel projection of a gas distribution assembly lid according to a first embodiment;
FIG. 2 is a bottom-back isometric view of the gas distribution assembly lid of FIG. 1;
FIG. 3 is a front view of the gas distribution assembly lid of FIG. 1;
FIG. 4 is a rear view of the gas distribution assembly lid of FIG. 1;
FIG. 5 is a right side view of the gas distribution assembly lid of FIG. 1;
FIG. 6 is a left side view of the gas distribution assembly lid of FIG. 1;
FIG. 7 is a top view of the gas distribution assembly lid of FIG. 1;
FIG. 8 is a bottom view of the gas distribution assembly lid of FIG. 1;
FIG. 9 is a top-front parallel projection of a gas distribution assembly lid according to a second embodiment;
FIG. 10 is a bottom-back isometric view of the gas distribution assembly lid of FIG. 9;
FIG. 11 is a front view of the gas distribution assembly lid of FIG. 9;
FIG. 12 is a rear view of the gas distribution assembly lid of FIG. 9;
FIG. 13 is a right side view of the gas distribution assembly lid of FIG. 9;
FIG. 14 is a left side view of the gas distribution assembly lid of FIG. 9;
FIG. 15 is a top view of the gas distribution assembly lid of FIG. 9; and,
FIG. 16 is a bottom view of the gas distribution assembly lid of FIG. 9.
Portions of the gas distribution assembly lid shown in dashed broken lines in FIGS. 9-16 form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a gas distribution assembly lid, substantially as shown and described.
US29/724,071 2020-02-12 2020-02-12 Gas distribution assembly lid Active USD936187S1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US29/724,071 USD936187S1 (en) 2020-02-12 2020-02-12 Gas distribution assembly lid
TW109302179F TWD214328S (en) 2020-02-12 2020-04-22 Gas distribution assembly lid
TW109302179D01F TWD214329S (en) 2020-02-12 2020-04-22 Gas distribution assembly lid
JPD2020-8353F JP1686169S (en) 2020-02-12 2020-04-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/724,071 USD936187S1 (en) 2020-02-12 2020-02-12 Gas distribution assembly lid

Publications (1)

Publication Number Publication Date
USD936187S1 true USD936187S1 (en) 2021-11-16

Family

ID=75966944

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/724,071 Active USD936187S1 (en) 2020-02-12 2020-02-12 Gas distribution assembly lid

Country Status (3)

Country Link
US (1) USD936187S1 (en)
JP (1) JP1686169S (en)
TW (2) TWD214329S (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005105S1 (en) * 2020-10-06 2023-11-21 Pws Packaging Services, Inc. Lid
USD1015876S1 (en) * 2017-11-14 2024-02-27 Silgan Containers Llc Can lid

Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6037574A (en) * 1997-11-06 2000-03-14 Watlow Electric Manufacturing Quartz substrate heater
US20030170388A1 (en) * 2000-06-23 2003-09-11 Hiroshi Shinriki Method for forming thin film and appatus for forming thin film
US20080173735A1 (en) * 2007-01-12 2008-07-24 Veeco Instruments Inc. Gas treatment systems
USD589471S1 (en) * 2006-09-28 2009-03-31 Tokyo Electron Limited Heater for manufacturing semiconductor
USD601521S1 (en) * 2006-09-28 2009-10-06 Tokyo Electron Limited Heater for manufacturing semiconductor
USD664170S1 (en) 2011-03-04 2012-07-24 Applied Materials, Inc. Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass
USD708651S1 (en) 2011-11-22 2014-07-08 Applied Materials, Inc. Electrostatic chuck
USD741823S1 (en) * 2013-07-10 2015-10-27 Hitachi Kokusai Electric Inc. Vaporizer for substrate processing apparatus
US20150345020A1 (en) 2014-05-30 2015-12-03 Lam Research Corporation Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate
US9353440B2 (en) 2013-12-20 2016-05-31 Applied Materials, Inc. Dual-direction chemical delivery system for ALD/CVD chambers
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
US20170191159A1 (en) * 2016-01-01 2017-07-06 Applied Materials, Inc. Non-Metallic Thermal CVD/ALD Gas Injector And Purge System
USD797690S1 (en) * 2015-03-16 2017-09-19 Nuflare Technology, Inc. Heater for semiconductor manufacturing apparatus
US20170365443A1 (en) * 2016-06-15 2017-12-21 Applied Materials, Inc. Gas distribution plate assembly for high power plasma etch processes
US20180142352A1 (en) 2016-11-21 2018-05-24 Applied Materials, Inc. Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling
USD819580S1 (en) * 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition
USD825505S1 (en) * 2015-06-18 2018-08-14 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
TWM576592U (en) 2017-04-27 2019-04-11 美商應用材料股份有限公司 Gas distribution plate and processing chamber including the same
US20190304751A1 (en) * 2018-03-29 2019-10-03 Samsung Electronics Co., Ltd. Plasma processing apparatus including gas distribution plate

Patent Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6037574A (en) * 1997-11-06 2000-03-14 Watlow Electric Manufacturing Quartz substrate heater
US20030170388A1 (en) * 2000-06-23 2003-09-11 Hiroshi Shinriki Method for forming thin film and appatus for forming thin film
USD589471S1 (en) * 2006-09-28 2009-03-31 Tokyo Electron Limited Heater for manufacturing semiconductor
USD601521S1 (en) * 2006-09-28 2009-10-06 Tokyo Electron Limited Heater for manufacturing semiconductor
US20080173735A1 (en) * 2007-01-12 2008-07-24 Veeco Instruments Inc. Gas treatment systems
USD664170S1 (en) 2011-03-04 2012-07-24 Applied Materials, Inc. Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass
USD708651S1 (en) 2011-11-22 2014-07-08 Applied Materials, Inc. Electrostatic chuck
USD741823S1 (en) * 2013-07-10 2015-10-27 Hitachi Kokusai Electric Inc. Vaporizer for substrate processing apparatus
US9353440B2 (en) 2013-12-20 2016-05-31 Applied Materials, Inc. Dual-direction chemical delivery system for ALD/CVD chambers
TWI680203B (en) 2014-05-30 2019-12-21 美商蘭姆研究公司 Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate
US20150345020A1 (en) 2014-05-30 2015-12-03 Lam Research Corporation Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate
TW201610220A (en) 2014-05-30 2016-03-16 蘭姆研究公司 Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate
USD797690S1 (en) * 2015-03-16 2017-09-19 Nuflare Technology, Inc. Heater for semiconductor manufacturing apparatus
USD825505S1 (en) * 2015-06-18 2018-08-14 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
US20170191159A1 (en) * 2016-01-01 2017-07-06 Applied Materials, Inc. Non-Metallic Thermal CVD/ALD Gas Injector And Purge System
USD819580S1 (en) * 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition
US20170365443A1 (en) * 2016-06-15 2017-12-21 Applied Materials, Inc. Gas distribution plate assembly for high power plasma etch processes
US20180142352A1 (en) 2016-11-21 2018-05-24 Applied Materials, Inc. Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling
TW201834111A (en) 2016-11-21 2018-09-16 美商應用材料股份有限公司 Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling
TWM576592U (en) 2017-04-27 2019-04-11 美商應用材料股份有限公司 Gas distribution plate and processing chamber including the same
US20190304751A1 (en) * 2018-03-29 2019-10-03 Samsung Electronics Co., Ltd. Plasma processing apparatus including gas distribution plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1015876S1 (en) * 2017-11-14 2024-02-27 Silgan Containers Llc Can lid
USD1005105S1 (en) * 2020-10-06 2023-11-21 Pws Packaging Services, Inc. Lid

Also Published As

Publication number Publication date
JP1686169S (en) 2021-05-24
TWD214328S (en) 2021-10-01
TWD214329S (en) 2021-10-01

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