USD936187S1 - Gas distribution assembly lid - Google Patents
Gas distribution assembly lid Download PDFInfo
- Publication number
- USD936187S1 USD936187S1 US29/724,071 US202029724071F USD936187S US D936187 S1 USD936187 S1 US D936187S1 US 202029724071 F US202029724071 F US 202029724071F US D936187 S USD936187 S US D936187S
- Authority
- US
- United States
- Prior art keywords
- gas distribution
- distribution assembly
- assembly lid
- lid
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
Portions of the gas distribution assembly lid shown in dashed broken lines in FIGS. 9-16 form no part of the claimed design.
Claims (1)
- The ornamental design for a gas distribution assembly lid, substantially as shown and described.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/724,071 USD936187S1 (en) | 2020-02-12 | 2020-02-12 | Gas distribution assembly lid |
TW109302179F TWD214328S (en) | 2020-02-12 | 2020-04-22 | Gas distribution assembly lid |
TW109302179D01F TWD214329S (en) | 2020-02-12 | 2020-04-22 | Gas distribution assembly lid |
JPD2020-8353F JP1686169S (en) | 2020-02-12 | 2020-04-23 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/724,071 USD936187S1 (en) | 2020-02-12 | 2020-02-12 | Gas distribution assembly lid |
Publications (1)
Publication Number | Publication Date |
---|---|
USD936187S1 true USD936187S1 (en) | 2021-11-16 |
Family
ID=75966944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/724,071 Active USD936187S1 (en) | 2020-02-12 | 2020-02-12 | Gas distribution assembly lid |
Country Status (3)
Country | Link |
---|---|
US (1) | USD936187S1 (en) |
JP (1) | JP1686169S (en) |
TW (2) | TWD214329S (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1005105S1 (en) * | 2020-10-06 | 2023-11-21 | Pws Packaging Services, Inc. | Lid |
USD1015876S1 (en) * | 2017-11-14 | 2024-02-27 | Silgan Containers Llc | Can lid |
Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6037574A (en) * | 1997-11-06 | 2000-03-14 | Watlow Electric Manufacturing | Quartz substrate heater |
US20030170388A1 (en) * | 2000-06-23 | 2003-09-11 | Hiroshi Shinriki | Method for forming thin film and appatus for forming thin film |
US20080173735A1 (en) * | 2007-01-12 | 2008-07-24 | Veeco Instruments Inc. | Gas treatment systems |
USD589471S1 (en) * | 2006-09-28 | 2009-03-31 | Tokyo Electron Limited | Heater for manufacturing semiconductor |
USD601521S1 (en) * | 2006-09-28 | 2009-10-06 | Tokyo Electron Limited | Heater for manufacturing semiconductor |
USD664170S1 (en) | 2011-03-04 | 2012-07-24 | Applied Materials, Inc. | Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass |
USD708651S1 (en) | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
USD741823S1 (en) * | 2013-07-10 | 2015-10-27 | Hitachi Kokusai Electric Inc. | Vaporizer for substrate processing apparatus |
US20150345020A1 (en) | 2014-05-30 | 2015-12-03 | Lam Research Corporation | Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate |
US9353440B2 (en) | 2013-12-20 | 2016-05-31 | Applied Materials, Inc. | Dual-direction chemical delivery system for ALD/CVD chambers |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
US20170191159A1 (en) * | 2016-01-01 | 2017-07-06 | Applied Materials, Inc. | Non-Metallic Thermal CVD/ALD Gas Injector And Purge System |
USD797690S1 (en) * | 2015-03-16 | 2017-09-19 | Nuflare Technology, Inc. | Heater for semiconductor manufacturing apparatus |
US20170365443A1 (en) * | 2016-06-15 | 2017-12-21 | Applied Materials, Inc. | Gas distribution plate assembly for high power plasma etch processes |
US20180142352A1 (en) | 2016-11-21 | 2018-05-24 | Applied Materials, Inc. | Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling |
USD819580S1 (en) * | 2016-04-01 | 2018-06-05 | Veeco Instruments, Inc. | Self-centering wafer carrier for chemical vapor deposition |
USD825505S1 (en) * | 2015-06-18 | 2018-08-14 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
TWM576592U (en) | 2017-04-27 | 2019-04-11 | 美商應用材料股份有限公司 | Gas distribution plate and processing chamber including the same |
US20190304751A1 (en) * | 2018-03-29 | 2019-10-03 | Samsung Electronics Co., Ltd. | Plasma processing apparatus including gas distribution plate |
-
2020
- 2020-02-12 US US29/724,071 patent/USD936187S1/en active Active
- 2020-04-22 TW TW109302179D01F patent/TWD214329S/en unknown
- 2020-04-22 TW TW109302179F patent/TWD214328S/en unknown
- 2020-04-23 JP JPD2020-8353F patent/JP1686169S/ja active Active
Patent Citations (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6037574A (en) * | 1997-11-06 | 2000-03-14 | Watlow Electric Manufacturing | Quartz substrate heater |
US20030170388A1 (en) * | 2000-06-23 | 2003-09-11 | Hiroshi Shinriki | Method for forming thin film and appatus for forming thin film |
USD589471S1 (en) * | 2006-09-28 | 2009-03-31 | Tokyo Electron Limited | Heater for manufacturing semiconductor |
USD601521S1 (en) * | 2006-09-28 | 2009-10-06 | Tokyo Electron Limited | Heater for manufacturing semiconductor |
US20080173735A1 (en) * | 2007-01-12 | 2008-07-24 | Veeco Instruments Inc. | Gas treatment systems |
USD664170S1 (en) | 2011-03-04 | 2012-07-24 | Applied Materials, Inc. | Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass |
USD708651S1 (en) | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
USD741823S1 (en) * | 2013-07-10 | 2015-10-27 | Hitachi Kokusai Electric Inc. | Vaporizer for substrate processing apparatus |
US9353440B2 (en) | 2013-12-20 | 2016-05-31 | Applied Materials, Inc. | Dual-direction chemical delivery system for ALD/CVD chambers |
TWI680203B (en) | 2014-05-30 | 2019-12-21 | 美商蘭姆研究公司 | Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate |
US20150345020A1 (en) | 2014-05-30 | 2015-12-03 | Lam Research Corporation | Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate |
TW201610220A (en) | 2014-05-30 | 2016-03-16 | 蘭姆研究公司 | Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate |
USD797690S1 (en) * | 2015-03-16 | 2017-09-19 | Nuflare Technology, Inc. | Heater for semiconductor manufacturing apparatus |
USD825505S1 (en) * | 2015-06-18 | 2018-08-14 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
US20170191159A1 (en) * | 2016-01-01 | 2017-07-06 | Applied Materials, Inc. | Non-Metallic Thermal CVD/ALD Gas Injector And Purge System |
USD819580S1 (en) * | 2016-04-01 | 2018-06-05 | Veeco Instruments, Inc. | Self-centering wafer carrier for chemical vapor deposition |
US20170365443A1 (en) * | 2016-06-15 | 2017-12-21 | Applied Materials, Inc. | Gas distribution plate assembly for high power plasma etch processes |
US20180142352A1 (en) | 2016-11-21 | 2018-05-24 | Applied Materials, Inc. | Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling |
TW201834111A (en) | 2016-11-21 | 2018-09-16 | 美商應用材料股份有限公司 | Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling |
TWM576592U (en) | 2017-04-27 | 2019-04-11 | 美商應用材料股份有限公司 | Gas distribution plate and processing chamber including the same |
US20190304751A1 (en) * | 2018-03-29 | 2019-10-03 | Samsung Electronics Co., Ltd. | Plasma processing apparatus including gas distribution plate |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1015876S1 (en) * | 2017-11-14 | 2024-02-27 | Silgan Containers Llc | Can lid |
USD1005105S1 (en) * | 2020-10-06 | 2023-11-21 | Pws Packaging Services, Inc. | Lid |
Also Published As
Publication number | Publication date |
---|---|
JP1686169S (en) | 2021-05-24 |
TWD214328S (en) | 2021-10-01 |
TWD214329S (en) | 2021-10-01 |
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