TWD214329S - Gas distribution assembly lid - Google Patents

Gas distribution assembly lid Download PDF

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Publication number
TWD214329S
TWD214329S TW109302179D01F TW109302179D01F TWD214329S TW D214329 S TWD214329 S TW D214329S TW 109302179D01 F TW109302179D01 F TW 109302179D01F TW 109302179D01 F TW109302179D01 F TW 109302179D01F TW D214329 S TWD214329 S TW D214329S
Authority
TW
Taiwan
Prior art keywords
gas distribution
distribution assembly
design
assembly lid
lid
Prior art date
Application number
TW109302179D01F
Other languages
Chinese (zh)
Inventor
姆漢納德 穆斯塔法
幕哈瑪德Ｍ 拉許德
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD214329S publication Critical patent/TWD214329S/en

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Abstract

【物品用途】;本設計請求具有視覺效果之氣體分配組件蓋。;【設計說明】;本設計與原設計不同處，在於周圍邊緣之特徵。[Use of item]; This design requires a gas distribution component cover with visual effects. ;[Design Description];The difference between this design and the original design lies in the characteristics of the surrounding edges.

Description

氣體分配組件蓋Gas distribution assembly cover

本設計請求具有視覺效果之氣體分配組件蓋。This design requests a gas distribution assembly cover with visual effects.

本設計與原設計不同處，在於周圍邊緣之特徵。The difference between this design and the original design lies in the characteristics of the surrounding edges.

TW109302179D01F 2020-02-12 2020-04-22 Gas distribution assembly lid TWD214329S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/724,071 USD936187S1 (en) 2020-02-12 2020-02-12 Gas distribution assembly lid
US29/724,071 2020-02-12

Publications (1)

Publication Number Publication Date
TWD214329S true TWD214329S (en) 2021-10-01

Family

ID=75966944

Family Applications (2)

Application Number Title Priority Date Filing Date
TW109302179F TWD214328S (en) 2020-02-12 2020-04-22 Gas distribution assembly lid
TW109302179D01F TWD214329S (en) 2020-02-12 2020-04-22 Gas distribution assembly lid

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW109302179F TWD214328S (en) 2020-02-12 2020-04-22 Gas distribution assembly lid

Country Status (3)

Country Link
US (1) USD936187S1 (en)
JP (1) JP1686169S (en)
TW (2) TWD214328S (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD879609S1 (en) * 2017-11-14 2020-03-31 Silgan Containers Llc Can lid
US11634254B2 (en) * 2020-10-06 2023-04-25 Pws Packaging Services, Inc. Child-resistant lid and related methods

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201610220A (en) 2014-05-30 2016-03-16 蘭姆研究公司 Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate
TW201834111A (en) 2016-11-21 2018-09-16 美商應用材料股份有限公司 Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling
TWM576592U (en) 2017-04-27 2019-04-11 美商應用材料股份有限公司 Gas distribution plate and processing chamber including the same

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US6037574A (en) * 1997-11-06 2000-03-14 Watlow Electric Manufacturing Quartz substrate heater
JP4567148B2 (en) * 2000-06-23 2010-10-20 東京エレクトロン株式会社 Thin film forming equipment
USD589471S1 (en) * 2006-09-28 2009-03-31 Tokyo Electron Limited Heater for manufacturing semiconductor
USD601521S1 (en) * 2006-09-28 2009-10-06 Tokyo Electron Limited Heater for manufacturing semiconductor
TWI390608B (en) * 2007-01-12 2013-03-21 Veeco Instr Inc Gas treatment systems
USD664170S1 (en) 2011-03-04 2012-07-24 Applied Materials, Inc. Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass
USD708651S1 (en) 2011-11-22 2014-07-08 Applied Materials, Inc. Electrostatic chuck
TWD169790S (en) * 2013-07-10 2015-08-11 日立國際電氣股份有限公司 Part of the vaporizer for substrate processing equipment
US9353440B2 (en) 2013-12-20 2016-05-31 Applied Materials, Inc. Dual-direction chemical delivery system for ALD/CVD chambers
JP1541874S (en) * 2015-03-16 2016-01-18
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USD819580S1 (en) * 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
US10415137B2 (en) * 2016-01-01 2019-09-17 Applied Materials, Inc. Non-metallic thermal CVD/ALD Gas Injector and Purge Systems
KR102251209B1 (en) * 2016-06-15 2021-05-11 어플라이드 머티어리얼스, 인코포레이티드 Gas Distribution Plate Assembly for High Power Plasma Etching Processes
KR102477354B1 (en) * 2018-03-29 2022-12-15 삼성전자주식회사 Plasma processing apparatus including gas distribution plate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201610220A (en) 2014-05-30 2016-03-16 蘭姆研究公司 Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate
TWI680203B (en) 2014-05-30 2019-12-21 美商蘭姆研究公司 Hollow cathode discharge (hcd) suppressing capacitively coupled plasma electrode and gas distribution faceplate
TW201834111A (en) 2016-11-21 2018-09-16 美商應用材料股份有限公司 Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling
TWM576592U (en) 2017-04-27 2019-04-11 美商應用材料股份有限公司 Gas distribution plate and processing chamber including the same

Also Published As

Publication number Publication date
USD936187S1 (en) 2021-11-16
JP1686169S (en) 2021-05-24
TWD214328S (en) 2021-10-01

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