TWD183006S - 半導體製造裝置之晶舟用旋轉具之部分 - Google Patents

半導體製造裝置之晶舟用旋轉具之部分

Info

Publication number
TWD183006S
TWD183006S TW105304431F TW105304431F TWD183006S TW D183006 S TWD183006 S TW D183006S TW 105304431 F TW105304431 F TW 105304431F TW 105304431 F TW105304431 F TW 105304431F TW D183006 S TWD183006 S TW D183006S
Authority
TW
Taiwan
Prior art keywords
semiconductor manufacturing
manufacturing equipment
rotating tool
case
design
Prior art date
Application number
TW105304431F
Other languages
English (en)
Inventor
Takatomo Yamaguchi
Takashi Nogami
Original Assignee
日立國際電氣股份有限公司
Hitachi Int Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司, Hitachi Int Electric Inc filed Critical 日立國際電氣股份有限公司
Publication of TWD183006S publication Critical patent/TWD183006S/zh

Links

Abstract

【物品用途】;本物品是使得用來保持半導體晶圓等之基板的晶舟旋轉的旋轉具，在上面搭載晶舟，藉由與設置在外部的旋轉機構連結而使用。再者，在本體中央部，形成貫通的中空軸，在中空軸的前端部螺固著真空用接頭。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分；圖式中一點鏈線所圍繞者，係界定本案所欲主張之範圍，該一點鏈線本身為本案不主張設計之部分。
TW105304431F 2016-02-10 2016-08-02 半導體製造裝置之晶舟用旋轉具之部分 TWD183006S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2016-2832F JP1564807S (zh) 2016-02-10 2016-02-10

Publications (1)

Publication Number Publication Date
TWD183006S true TWD183006S (zh) 2017-05-11

Family

ID=57406432

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105304431F TWD183006S (zh) 2016-02-10 2016-08-02 半導體製造裝置之晶舟用旋轉具之部分

Country Status (3)

Country Link
US (1) USD822081S1 (zh)
JP (1) JP1564807S (zh)
TW (1) TWD183006S (zh)

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US11887878B2 (en) 2019-06-28 2024-01-30 Applied Materials, Inc. Detachable biasable electrostatic chuck for high temperature applications

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11887878B2 (en) 2019-06-28 2024-01-30 Applied Materials, Inc. Detachable biasable electrostatic chuck for high temperature applications
USD947914S1 (en) 2020-11-23 2022-04-05 Applied Materials, Inc. Base plate for a processing chamber substrate support
USD960216S1 (en) 2020-11-23 2022-08-09 Applied Materials, Inc. Base plate for a processing chamber substrate support

Also Published As

Publication number Publication date
JP1564807S (zh) 2016-12-05
USD822081S1 (en) 2018-07-03

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