TWD177637S - 反應管之部分 - Google Patents

反應管之部分

Info

Publication number
TWD177637S
TWD177637S TW105300948F TW105300948F TWD177637S TW D177637 S TWD177637 S TW D177637S TW 105300948 F TW105300948 F TW 105300948F TW 105300948 F TW105300948 F TW 105300948F TW D177637 S TWD177637 S TW D177637S
Authority
TW
Taiwan
Prior art keywords
design
reaction tube
case
protrusion
item
Prior art date
Application number
TW105300948F
Other languages
English (en)
Inventor
Akihiro Osaka
Hideto Yamaguchi
Motoya Takewaki
Original Assignee
日立國際電氣股份有限公司
Hitachi Int Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司, Hitachi Int Electric Inc filed Critical 日立國際電氣股份有限公司
Publication of TWD177637S publication Critical patent/TWD177637S/zh

Links

Abstract

【物品用途】;本設計的物品是在基板處理裝置中使用的反應管。;【設計說明】;在本體的外壁面設有突起，該突起是用來設置固定用具，該固定用具是用來固定測定反應管周邊之溫度的熱電偶。;圖式所揭露之虛線部分，為本案不主張設計之部分；圖式中一點鏈線所圍繞者，係界定本案所欲主張之範圍，該一點鏈線本身為本案不主張設計之部分。;立體圖及E-E、F-F放大立體圖中，未表現在其他六面視圖之細線，皆為用來呈現立體表面的形狀。
TW105300948F 2015-09-04 2016-02-26 反應管之部分 TWD177637S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-19681F JP1548462S (zh) 2015-09-04 2015-09-04

Publications (1)

Publication Number Publication Date
TWD177637S true TWD177637S (zh) 2016-08-11

Family

ID=55761951

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105300948F TWD177637S (zh) 2015-09-04 2016-02-26 反應管之部分

Country Status (3)

Country Link
US (1) USD790490S1 (zh)
JP (1) JP1548462S (zh)
TW (1) TWD177637S (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102043876B1 (ko) 2016-02-09 2019-11-12 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치 및 반도체 장치의 제조 방법
JP1582475S (zh) * 2016-10-14 2017-07-31
JP1605462S (zh) * 2017-08-10 2021-05-31

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR890008922A (ko) * 1987-11-21 1989-07-13 후세 노보루 열처리 장치
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
JP2000243747A (ja) * 1999-02-18 2000-09-08 Kokusai Electric Co Ltd 基板処理装置
JP3985899B2 (ja) * 2002-03-28 2007-10-03 株式会社日立国際電気 基板処理装置
JP5157100B2 (ja) * 2006-08-04 2013-03-06 東京エレクトロン株式会社 成膜装置及び成膜方法
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP5096182B2 (ja) * 2008-01-31 2012-12-12 東京エレクトロン株式会社 熱処理炉
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP4930438B2 (ja) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 反応管及び熱処理装置
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD725053S1 (en) * 2011-11-18 2015-03-24 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
TWD167985S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
JP1535455S (zh) * 2015-02-25 2015-10-19
JP1546345S (zh) * 2015-09-04 2016-03-22

Also Published As

Publication number Publication date
USD790490S1 (en) 2017-06-27
JP1548462S (zh) 2016-04-25

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