TWD168774S - 反應管之部分 - Google Patents
反應管之部分Info
- Publication number
- TWD168774S TWD168774S TW102308331D01F TW102308331D01F TWD168774S TW D168774 S TWD168774 S TW D168774S TW 102308331D01 F TW102308331D01 F TW 102308331D01F TW 102308331D01 F TW102308331D01 F TW 102308331D01F TW D168774 S TWD168774 S TW D168774S
- Authority
- TW
- Taiwan
- Prior art keywords
- design
- opening
- article
- reaction tube
- gas nozzle
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 4
- 238000007599 discharging Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是反應管,為應用在基板處理裝置的反應管。;【設計說明】;本物品具有用來收容處理基板的開口,在該開口的周緣設有凸緣;本物品,是在側面具備:形成設置有氣體噴嘴之空間的略矩形狀之突出部;和排出從該氣體噴嘴被噴出的氣體的開口部,於本物品的內部,將氣體從上述氣體噴嘴供給到上述處理基板之後,從上述開口部排出,進行上述處理基板的處理。本衍生設計與原設計之外觀差異在於:如立體圖及仰視圖等所示,其圓周上的凸部之寬度設計略有所不同,因此本案與原設計案之差異些微,不影響原設計與衍生設計之近似。;圖式中以實線所示為「主張設計之部分」,以虛線所示為「不主張設計之部分」。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013014832 | 2013-06-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD168774S true TWD168774S (zh) | 2015-07-01 |
Family
ID=52683723
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102308331D01F TWD168774S (zh) | 2013-06-28 | 2013-12-24 | 反應管之部分 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD725055S1 (zh) |
| TW (1) | TWD168774S (zh) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120195749A1 (en) | 2004-03-15 | 2012-08-02 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods |
| USD698916S1 (en) * | 2012-05-15 | 2014-02-04 | Airius Ip Holdings, Llc | Air moving device |
| US10024531B2 (en) | 2013-12-19 | 2018-07-17 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods |
| US9702576B2 (en) | 2013-12-19 | 2017-07-11 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods |
| USD742339S1 (en) * | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD748594S1 (en) * | 2014-03-12 | 2016-02-02 | Hitachi Kokusai Electric Inc. | Reaction tube |
| US9643311B1 (en) | 2014-04-16 | 2017-05-09 | Marshalltown Company | Octagonal extension handle |
| WO2015187856A1 (en) | 2014-06-06 | 2015-12-10 | Airius Ip Holdings, Llc | Columnar air moving devices, systems and methods |
| JP1534829S (zh) * | 2015-02-23 | 2015-10-13 | ||
| JP1535455S (zh) * | 2015-02-25 | 2015-10-19 | ||
| JP1548462S (zh) * | 2015-09-04 | 2016-04-25 | ||
| JP1546345S (zh) * | 2015-09-04 | 2016-03-22 | ||
| JP1546512S (zh) * | 2015-09-04 | 2016-03-22 | ||
| USD812595S1 (en) * | 2015-11-30 | 2018-03-13 | Kmw Inc. | Antenna |
| US10487852B2 (en) | 2016-06-24 | 2019-11-26 | Airius Ip Holdings, Llc | Air moving device |
| JP1605460S (zh) * | 2017-08-09 | 2021-05-31 | ||
| JP1605461S (zh) * | 2017-08-10 | 2021-05-31 | ||
| JP1605462S (zh) * | 2017-08-10 | 2021-05-31 | ||
| JP1605982S (zh) * | 2017-12-27 | 2021-05-31 | ||
| USD987054S1 (en) | 2019-03-19 | 2023-05-23 | Airius Ip Holdings, Llc | Air moving device |
| JP1644260S (zh) * | 2019-03-20 | 2019-10-28 | ||
| GB2596757B (en) | 2019-04-17 | 2023-09-13 | Airius Ip Holdings Llc | Air moving device with bypass intake |
| USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| USD991733S1 (en) * | 2021-12-28 | 2023-07-11 | Zhuhai Kelitong Electronic Co., Ltd. | Electric milk frother |
| JP1731672S (ja) * | 2022-03-15 | 2025-12-15 | 基板処理装置用炉 | |
| JP1731671S (ja) * | 2022-03-15 | 2025-12-15 | 基板処理装置用炉 | |
| JP1731674S (ja) * | 2022-05-30 | 2025-12-15 | 半導体製造装置用反応管のインナー管 | |
| JP1731673S (ja) * | 2022-05-30 | 2025-12-15 | 半導体製造装置用反応管のインナー管 | |
| JP1731675S (ja) * | 2022-05-30 | 2025-12-15 | 半導体製造装置用反応管のインナー管 | |
| USD991732S1 (en) * | 2022-05-30 | 2023-07-11 | Zhuhai Kelitong Electronic Co., Ltd. | Electric milk frother |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
| USD417438S (en) * | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube |
| USD405430S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| USD407696S (en) * | 1997-08-20 | 1999-04-06 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
| USD404368S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Outer tube for use in a semiconductor wafer heat processing apparatus |
| USD520467S1 (en) * | 2003-11-04 | 2006-05-09 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| TWD125600S1 (zh) * | 2006-10-12 | 2008-10-21 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
| KR101333363B1 (ko) * | 2006-10-13 | 2013-11-28 | 도쿄엘렉트론가부시키가이샤 | 열처리 장치 |
| TWD127410S1 (zh) * | 2007-04-20 | 2009-02-11 | 東京威力科創股份有限公司 | 半導體製造用製程管 |
| JP5096182B2 (ja) * | 2008-01-31 | 2012-12-12 | 東京エレクトロン株式会社 | 熱処理炉 |
| TWD143034S1 (zh) * | 2008-03-28 | 2011-10-01 | 東京威力科創股份有限公司 | 半導體製造用處理管 |
| JP4930438B2 (ja) * | 2008-04-03 | 2012-05-16 | 東京エレクトロン株式会社 | 反応管及び熱処理装置 |
| TWD133943S1 (zh) * | 2008-05-09 | 2010-03-21 | 日立國際電氣股份有限公司 | 反應管 |
| USD610559S1 (en) | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD661265S1 (en) * | 2010-05-19 | 2012-06-05 | Nippon Mektron, Ltd. | Flexible printed circuit board |
| USD655255S1 (en) * | 2010-06-18 | 2012-03-06 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
| USD655682S1 (en) * | 2010-06-18 | 2012-03-13 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
| USD655262S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
| USD655258S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
-
2013
- 2013-12-24 TW TW102308331D01F patent/TWD168774S/zh unknown
- 2013-12-26 US US29/477,771 patent/USD725055S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| USD725055S1 (en) | 2015-03-24 |
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