TWD167985S - 反應管之部分 - Google Patents

反應管之部分

Info

Publication number
TWD167985S
TWD167985S TW102308330F TW102308330F TWD167985S TW D167985 S TWD167985 S TW D167985S TW 102308330 F TW102308330 F TW 102308330F TW 102308330 F TW102308330 F TW 102308330F TW D167985 S TWD167985 S TW D167985S
Authority
TW
Taiwan
Prior art keywords
opening
design
reaction tube
article
gas
Prior art date
Application number
TW102308330F
Other languages
English (en)
Inventor
Keishin Yamazaki
Masahiro Miyake
Kosuke Takagi
Yasuaki Komae
Shinya Morita
Naonori Akae
Masato Terasaki
Original Assignee
日立國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司 filed Critical 日立國際電氣股份有限公司
Publication of TWD167985S publication Critical patent/TWD167985S/zh

Links

Abstract

【物品用途】;本設計的物品是反應管，為應用在基板處理裝置的反應管。;【設計說明】;本物品具有用來收容處理基板的開口，在該開口的周緣設有凸緣；本物品，是在側面具備：形成設置有氣體噴嘴之空間的略矩形狀之突出部；和排出從該氣體噴嘴被噴出的氣體的開口部，於本物品的內部，將氣體從上述氣體噴嘴供給到上述處理基板之後，從上述開口部排出，進行上述處理基板的處理。;圖式中以實線所示為「主張設計之部分」，以虛線所示為「不主張設計之部分」。
TW102308330F 2013-06-28 2013-12-24 反應管之部分 TWD167985S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013014830 2013-06-28

Publications (1)

Publication Number Publication Date
TWD167985S true TWD167985S (zh) 2015-05-21

Family

ID=52117640

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102308330F TWD167985S (zh) 2013-06-28 2013-12-24 反應管之部分

Country Status (2)

Country Link
US (1) USD720707S1 (zh)
TW (1) TWD167985S (zh)

Families Citing this family (14)

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Publication number Priority date Publication date Assignee Title
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
JP1534829S (zh) * 2015-02-23 2015-10-13
JP1535455S (zh) * 2015-02-25 2015-10-19
JP1546345S (zh) * 2015-09-04 2016-03-22
JP1546512S (zh) * 2015-09-04 2016-03-22
JP1548462S (zh) * 2015-09-04 2016-04-25
JP1605462S (zh) * 2017-08-10 2021-05-31
US11631567B2 (en) * 2020-03-12 2023-04-18 Applied Materials, Inc. Ion source with single-slot tubular cathode
JP1706321S (zh) * 2021-06-28 2022-01-31
JP1731672S (ja) * 2022-03-15 2025-12-15 基板処理装置用炉
JP1731671S (ja) * 2022-03-15 2025-12-15 基板処理装置用炉
JP1731675S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管
JP1731673S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管
JP1731674S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管

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USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405430S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD404368S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Outer tube for use in a semiconductor wafer heat processing apparatus
USD407696S (en) * 1997-08-20 1999-04-06 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
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USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
TWD125600S1 (zh) * 2006-10-12 2008-10-21 東京威力科創股份有限公司 半導體製造用加工處理管
KR101333363B1 (ko) * 2006-10-13 2013-11-28 도쿄엘렉트론가부시키가이샤 열처리 장치
TWD127410S1 (zh) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 半導體製造用製程管
JP5096182B2 (ja) * 2008-01-31 2012-12-12 東京エレクトロン株式会社 熱処理炉
TWD143034S1 (zh) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 半導體製造用處理管
JP4930438B2 (ja) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 反応管及び熱処理装置
TWD133943S1 (zh) * 2008-05-09 2010-03-21 日立國際電氣股份有限公司 反應管
USD610559S1 (en) 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD661265S1 (en) * 2010-05-19 2012-06-05 Nippon Mektron, Ltd. Flexible printed circuit board
USD655255S1 (en) * 2010-06-18 2012-03-06 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD655682S1 (en) * 2010-06-18 2012-03-13 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD655262S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor
USD655258S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor

Also Published As

Publication number Publication date
USD720707S1 (en) 2015-01-06

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