USD739832S1 - Reaction tube - Google Patents

Reaction tube Download PDF

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Publication number
USD739832S1
USD739832S1 US29/477,760 US201329477760F USD739832S US D739832 S1 USD739832 S1 US D739832S1 US 201329477760 F US201329477760 F US 201329477760F US D739832 S USD739832 S US D739832S
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US
United States
Prior art keywords
view
reaction tube
taken along
along line
elevational view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/477,760
Inventor
Keishin Yamazaki
Masahiro Miyake
Shinya Morita
Kosuke Takagi
Yasuaki Komae
Naonori Akae
Masato Terasaki
Takatomo Yamaguchi
Takafumi Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Hitachi Kokusai Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc filed Critical Hitachi Kokusai Electric Inc
Assigned to HITACHI KOKUSAI ELECTRIC INC. reassignment HITACHI KOKUSAI ELECTRIC INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KOMAE, YASUAKI, SASAKI, TAKAFUMI, AKAE, NAONORI, TERASAKI, MASATO, YAMAGUCHI, TAKATOMO, MIYAKE, MASAHIRO, MORITA, SHINYA, TAKAGI, KOSUKE, YAMAZAKI, KEISHIN
Application granted granted Critical
Publication of USD739832S1 publication Critical patent/USD739832S1/en
Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HITACHI KOKUSAI ELECTRIC INC.
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Anticipated expiration legal-status Critical

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Description

FIG. 1 is a front, top and right side perspective view of a first embodiment of a reaction tube showing our new design;
FIG. 2 is a rear, bottom and left side perspective view thereof;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a right side elevational view thereof;
FIG. 7 is a top plan view thereof;
FIG. 8 is a bottom plan view thereof;
FIG. 9 is a cross sectional view taken along line 9-9 in FIG. 3;
FIG. 10 is a cross sectional view taken along line 10-10 in FIG. 7;
FIG. 11 is an enlarged portion view taken along line 11-11 in FIG. 9;
FIG. 12 is a front, top and right side perspective view of a second embodiment of a reaction tube showing our new design;
FIG. 13 is a rear, bottom and left side perspective view thereof;
FIG. 14 is a front elevational view thereof;
FIG. 15 is a rear elevational view thereof;
FIG. 16 is a left side elevational view thereof;
FIG. 17 is a right side elevational view thereof;
FIG. 18 is a top plan view thereof;
FIG. 19 is a bottom plan view thereof;
FIG. 20 is a cross sectional view taken along line 20-20 in FIG. 14;
FIG. 21 is a cross sectional view taken along line 21-21 in FIG. 18;
FIG. 22 is an enlarged portion view taken along line 22-22 in FIG. 20;
FIG. 23 is a front, top, and right side perspective view of a third embodiment of a reaction tube showing our new design;
FIG. 24 is a rear, top and left side perspective view thereof;
FIG. 25 is a front elevational view thereof;
FIG. 26 is a rear elevational view thereof;
FIG. 27 is a left side elevational view thereof;
FIG. 28 is a right side elevational view thereof;
FIG. 29 is a top plan view thereof;
FIG. 30 is a bottom plan view thereof;
FIG. 31 is an enlarged cross sectional view taken along line 31-31 in FIG. 25;
FIG. 32 is an enlarged cross sectional view taken along line 32-32 in FIG. 25; and,
FIG. 33 is a cross sectional view taken along line 33-33 in FIG. 29.
The broken lines shown in the drawings represent portions of the reaction tube that form no part of the claimed design.

Claims (1)

    CLAIM
  1. We claim the ornamental design for a reaction tube, as shown and described.
US29/477,760 2013-06-28 2013-12-26 Reaction tube Active USD739832S1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2013-014829 2013-06-28
JP2013014829 2013-06-28
JP2013014828 2013-06-28
JP2013-014828 2013-06-28
JP2013015552 2013-07-08
JP2013-015552 2013-07-08

Publications (1)

Publication Number Publication Date
USD739832S1 true USD739832S1 (en) 2015-09-29

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ID=54149936

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/477,760 Active USD739832S1 (en) 2013-06-28 2013-12-26 Reaction tube

Country Status (1)

Country Link
US (1) USD739832S1 (en)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD790490S1 (en) * 2015-09-04 2017-06-27 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
USD812595S1 (en) * 2015-11-30 2018-03-13 Kmw Inc. Antenna
USD842824S1 (en) * 2017-08-09 2019-03-12 Kokusai Electric Corporation Reaction tube
USD842823S1 (en) * 2017-08-10 2019-03-12 Kokusai Electric Corporation Reaction tube
USD843958S1 (en) * 2017-08-10 2019-03-26 Kokusai Electric Corporation Reaction tube
USD853979S1 (en) * 2017-12-27 2019-07-16 Kokusai Electric Corporation Reaction tube
USD901406S1 (en) * 2019-03-20 2020-11-10 Kokusai Electric Corporation Inner tube of reactor for semiconductor fabrication
USD918669S1 (en) * 2019-03-18 2021-05-11 Beau Lucas Storage container
USD926963S1 (en) * 2012-05-15 2021-08-03 Airius Ip Holdings, Llc Air moving device
US11092330B2 (en) 2013-12-19 2021-08-17 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11105341B2 (en) 2016-06-24 2021-08-31 Airius Ip Holdings, Llc Air moving device
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
US11221153B2 (en) 2013-12-19 2022-01-11 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11236766B2 (en) 2014-06-06 2022-02-01 Airius Ip Holdings Llc Columnar air moving devices, systems and methods
US11365743B2 (en) 2004-03-15 2022-06-21 Airius Ip Holdings, Llc Temperature destratification systems
US11598539B2 (en) 2019-04-17 2023-03-07 Airius Ip Holdings, Llc Air moving device with bypass intake
USD987054S1 (en) 2019-03-19 2023-05-23 Airius Ip Holdings, Llc Air moving device
USD1017338S1 (en) * 2021-07-06 2024-03-12 Beau Lucas Storage container
USD1019583S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019582S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019581S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment

Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD404368S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Outer tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405430S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD407696S (en) * 1997-08-20 1999-04-06 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
US20080090195A1 (en) * 2006-10-13 2008-04-17 Tokyo Electron Limited Heat treatment apparatus
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090194521A1 (en) * 2008-01-31 2009-08-06 Tokyo Electron Limited Thermal processing furnace
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090250005A1 (en) * 2008-04-03 2009-10-08 Tokyo Electron Limited Reaction tube and heat processing apparatus for a semiconductor process
USD610559S1 (en) 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD655262S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor
USD655258S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor
USD655255S1 (en) * 2010-06-18 2012-03-06 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD655682S1 (en) * 2010-06-18 2012-03-13 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD719114S1 (en) * 2013-06-28 2014-12-09 Hitachi Kokusai Electric Inc. Reaction tube
USD720707S1 (en) * 2013-06-28 2015-01-06 Hitachi Kokusai Electric Inc. Reaction tube

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405430S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD407696S (en) * 1997-08-20 1999-04-06 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD404368S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Outer tube for use in a semiconductor wafer heat processing apparatus
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20080090195A1 (en) * 2006-10-13 2008-04-17 Tokyo Electron Limited Heat treatment apparatus
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090194521A1 (en) * 2008-01-31 2009-08-06 Tokyo Electron Limited Thermal processing furnace
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
US20090250005A1 (en) * 2008-04-03 2009-10-08 Tokyo Electron Limited Reaction tube and heat processing apparatus for a semiconductor process
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD610559S1 (en) 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD655255S1 (en) * 2010-06-18 2012-03-06 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD655682S1 (en) * 2010-06-18 2012-03-13 Hitachi Kokusai Electric Inc. Boat of wafer processing apparatus
USD655262S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor
USD655258S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Side wall for reactor for manufacturing semiconductor
USD719114S1 (en) * 2013-06-28 2014-12-09 Hitachi Kokusai Electric Inc. Reaction tube
USD720707S1 (en) * 2013-06-28 2015-01-06 Hitachi Kokusai Electric Inc. Reaction tube

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12085084B2 (en) 2004-03-15 2024-09-10 Airius Ip Holdings, Llc Temperature destratification systems
US11365743B2 (en) 2004-03-15 2022-06-21 Airius Ip Holdings, Llc Temperature destratification systems
US11703062B2 (en) 2004-03-15 2023-07-18 Airius Ip Holdings, Llc Temperature destratification systems
USD926963S1 (en) * 2012-05-15 2021-08-03 Airius Ip Holdings, Llc Air moving device
US11221153B2 (en) 2013-12-19 2022-01-11 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11092330B2 (en) 2013-12-19 2021-08-17 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11713773B2 (en) 2014-06-06 2023-08-01 Airius Ip Holdings, Llc Columnar air moving devices, systems and methods
US11236766B2 (en) 2014-06-06 2022-02-01 Airius Ip Holdings Llc Columnar air moving devices, systems and methods
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD790490S1 (en) * 2015-09-04 2017-06-27 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD812595S1 (en) * 2015-11-30 2018-03-13 Kmw Inc. Antenna
US11421710B2 (en) 2016-06-24 2022-08-23 Airius Ip Holdings, Llc Air moving device
US11105341B2 (en) 2016-06-24 2021-08-31 Airius Ip Holdings, Llc Air moving device
USD842824S1 (en) * 2017-08-09 2019-03-12 Kokusai Electric Corporation Reaction tube
USD842823S1 (en) * 2017-08-10 2019-03-12 Kokusai Electric Corporation Reaction tube
USD843958S1 (en) * 2017-08-10 2019-03-26 Kokusai Electric Corporation Reaction tube
USD853979S1 (en) * 2017-12-27 2019-07-16 Kokusai Electric Corporation Reaction tube
USD918669S1 (en) * 2019-03-18 2021-05-11 Beau Lucas Storage container
USD987054S1 (en) 2019-03-19 2023-05-23 Airius Ip Holdings, Llc Air moving device
USD901406S1 (en) * 2019-03-20 2020-11-10 Kokusai Electric Corporation Inner tube of reactor for semiconductor fabrication
US11598539B2 (en) 2019-04-17 2023-03-07 Airius Ip Holdings, Llc Air moving device with bypass intake
US11781761B1 (en) 2019-04-17 2023-10-10 Airius Ip Holdings, Llc Air moving device with bypass intake
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
USD1017338S1 (en) * 2021-07-06 2024-03-12 Beau Lucas Storage container
USD1019583S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019582S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019581S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment

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