USD1019581S1 - Inner tube of reaction tube for semiconductor manufacturing equipment - Google Patents
Inner tube of reaction tube for semiconductor manufacturing equipment Download PDFInfo
- Publication number
- USD1019581S1 USD1019581S1 US29/861,167 US202229861167F USD1019581S US D1019581 S1 USD1019581 S1 US D1019581S1 US 202229861167 F US202229861167 F US 202229861167F US D1019581 S USD1019581 S US D1019581S
- Authority
- US
- United States
- Prior art keywords
- semiconductor manufacturing
- manufacturing equipment
- tube
- inner tube
- reaction tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 239000004065 semiconductor Substances 0.000 title claims description 3
Images
Description
Claims (1)
- I claim the ornamental design for an inner tube of reaction tube for semiconductor manufacturing equipment, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022011409F JP1731673S (en) | 2022-05-30 | 2022-05-30 | |
JP2022-011409D | 2022-05-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD1019581S1 true USD1019581S1 (en) | 2024-03-26 |
Family
ID=84322290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/861,167 Active USD1019581S1 (en) | 2022-05-30 | 2022-11-28 | Inner tube of reaction tube for semiconductor manufacturing equipment |
Country Status (2)
Country | Link |
---|---|
US (1) | USD1019581S1 (en) |
JP (1) | JP1731673S (en) |
Citations (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5637153A (en) * | 1993-04-30 | 1997-06-10 | Tokyo Electron Limited | Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus |
USD405430S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
USD551634S1 (en) * | 2005-02-28 | 2007-09-25 | Tokyo Electron Limited | Wafer-boat for heat-processing of semiconductor wafers |
USD552047S1 (en) * | 2005-02-28 | 2007-10-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
US20080205864A1 (en) * | 2007-02-28 | 2008-08-28 | Tokyo Electron Limited | Heat processing furnace and vertical-type heat processing apparatus |
US20080232787A1 (en) * | 2007-03-20 | 2008-09-25 | Takashi Ichikawa | Heat processing furnace and vertical-type heat processing apparatus |
USD594488S1 (en) * | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
USD611013S1 (en) * | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD619630S1 (en) * | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
US20120186573A1 (en) * | 2011-01-21 | 2012-07-26 | Jdira Lucian C | Thermal processing furnace and liner for the same |
USD711843S1 (en) * | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD719114S1 (en) * | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
USD720308S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
USD720707S1 (en) * | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
USD725055S1 (en) * | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD738329S1 (en) * | 2013-07-29 | 2015-09-08 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD740769S1 (en) * | 2013-03-22 | 2015-10-13 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD747279S1 (en) * | 2013-07-29 | 2016-01-12 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
JP1563524S (en) | 2016-03-30 | 2016-11-21 | ||
USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD791090S1 (en) * | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD839219S1 (en) * | 2016-02-12 | 2019-01-29 | Kokusai Electric Corporation | Boat for substrate processing apparatus |
USD842824S1 (en) * | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
USD842823S1 (en) * | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
USD843958S1 (en) * | 2017-08-10 | 2019-03-26 | Kokusai Electric Corporation | Reaction tube |
USD846514S1 (en) * | 2018-05-03 | 2019-04-23 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD847105S1 (en) * | 2018-05-03 | 2019-04-30 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD853979S1 (en) * | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube |
JP1644260S (en) | 2019-03-20 | 2019-10-28 | ||
US11015248B2 (en) * | 2018-05-25 | 2021-05-25 | Kokusai Electric Corporation | Substrate processing apparatus and method of manufacturing semiconductor device |
USD920935S1 (en) * | 2018-09-20 | 2021-06-01 | Kokusai Electric Corporation | Boat for substrate processing apparatus |
USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
USD939459S1 (en) * | 2019-08-07 | 2021-12-28 | Kokusai Electric Corporation | Boat for wafer processing apparatus |
USD940669S1 (en) * | 2018-11-19 | 2022-01-11 | Kokusai Electric Corporation | Boat for substrate processing apparatus |
USD958093S1 (en) * | 2019-11-28 | 2022-07-19 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD965542S1 (en) * | 2020-03-19 | 2022-10-04 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD981971S1 (en) * | 2021-03-15 | 2023-03-28 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD986826S1 (en) * | 2020-03-10 | 2023-05-23 | Kokusai Electric Corporation | Reaction tube |
US20230221700A1 (en) * | 2020-09-28 | 2023-07-13 | Kokusai Electric Corporation | Temperature control method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus |
-
2022
- 2022-05-30 JP JP2022011409F patent/JP1731673S/ja active Active
- 2022-11-28 US US29/861,167 patent/USD1019581S1/en active Active
Patent Citations (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5637153A (en) * | 1993-04-30 | 1997-06-10 | Tokyo Electron Limited | Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus |
USD405430S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
USD551634S1 (en) * | 2005-02-28 | 2007-09-25 | Tokyo Electron Limited | Wafer-boat for heat-processing of semiconductor wafers |
USD552047S1 (en) * | 2005-02-28 | 2007-10-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
US20080205864A1 (en) * | 2007-02-28 | 2008-08-28 | Tokyo Electron Limited | Heat processing furnace and vertical-type heat processing apparatus |
US20080232787A1 (en) * | 2007-03-20 | 2008-09-25 | Takashi Ichikawa | Heat processing furnace and vertical-type heat processing apparatus |
USD594488S1 (en) * | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD619630S1 (en) * | 2007-05-08 | 2010-07-13 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD611013S1 (en) * | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
US20120186573A1 (en) * | 2011-01-21 | 2012-07-26 | Jdira Lucian C | Thermal processing furnace and liner for the same |
USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
USD720308S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
USD740769S1 (en) * | 2013-03-22 | 2015-10-13 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD711843S1 (en) * | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD719114S1 (en) * | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD720707S1 (en) * | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD725055S1 (en) * | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD747279S1 (en) * | 2013-07-29 | 2016-01-12 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD738329S1 (en) * | 2013-07-29 | 2015-09-08 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD791090S1 (en) * | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
USD839219S1 (en) * | 2016-02-12 | 2019-01-29 | Kokusai Electric Corporation | Boat for substrate processing apparatus |
JP1563524S (en) | 2016-03-30 | 2016-11-21 | ||
USD800080S1 (en) * | 2016-03-30 | 2017-10-17 | Tokyo Electron Limited | Reactor tube for semiconductor production devices |
USD842824S1 (en) * | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
USD842823S1 (en) * | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
USD843958S1 (en) * | 2017-08-10 | 2019-03-26 | Kokusai Electric Corporation | Reaction tube |
JP1605462S (en) * | 2017-08-10 | 2021-05-31 | ||
USD853979S1 (en) * | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube |
USD846514S1 (en) * | 2018-05-03 | 2019-04-23 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD847105S1 (en) * | 2018-05-03 | 2019-04-30 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
US11015248B2 (en) * | 2018-05-25 | 2021-05-25 | Kokusai Electric Corporation | Substrate processing apparatus and method of manufacturing semiconductor device |
USD920935S1 (en) * | 2018-09-20 | 2021-06-01 | Kokusai Electric Corporation | Boat for substrate processing apparatus |
USD940669S1 (en) * | 2018-11-19 | 2022-01-11 | Kokusai Electric Corporation | Boat for substrate processing apparatus |
JP1644260S (en) | 2019-03-20 | 2019-10-28 | ||
USD901406S1 (en) | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication |
USD939459S1 (en) * | 2019-08-07 | 2021-12-28 | Kokusai Electric Corporation | Boat for wafer processing apparatus |
USD958093S1 (en) * | 2019-11-28 | 2022-07-19 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
USD986826S1 (en) * | 2020-03-10 | 2023-05-23 | Kokusai Electric Corporation | Reaction tube |
USD965542S1 (en) * | 2020-03-19 | 2022-10-04 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
US20230221700A1 (en) * | 2020-09-28 | 2023-07-13 | Kokusai Electric Corporation | Temperature control method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus |
USD981971S1 (en) * | 2021-03-15 | 2023-03-28 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP1731673S (en) | 2022-12-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
USD950075S1 (en) | Brace assembly | |
USD901406S1 (en) | Inner tube of reactor for semiconductor fabrication | |
USD919311S1 (en) | Footrest | |
USD950074S1 (en) | Brace assembly | |
USD986826S1 (en) | Reaction tube | |
USD995633S1 (en) | Ring toss | |
USD988769S1 (en) | Carbonator | |
USD947475S1 (en) | Vacuum | |
USD978647S1 (en) | Pliers | |
USD980348S1 (en) | Kettlebell | |
USD1019581S1 (en) | Inner tube of reaction tube for semiconductor manufacturing equipment | |
USD986313S1 (en) | Teleprompter | |
USD983703S1 (en) | Cart | |
USD987576S1 (en) | Connector | |
USD953143S1 (en) | Pull | |
USD943526S1 (en) | Converter | |
USD901611S1 (en) | Putter | |
USD1019583S1 (en) | Inner tube of reaction tube for semiconductor manufacturing equipment | |
USD1019582S1 (en) | Inner tube of reaction tube for semiconductor manufacturing equipment | |
USD1017166S1 (en) | Dish caddy | |
USD1022904S1 (en) | Tubular reactor | |
USD1022906S1 (en) | Tubular reactor | |
USD1022905S1 (en) | Tubular reactor | |
USD1022907S1 (en) | Tubular reactor | |
USD1016982S1 (en) | Faucet |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |