TWD149223S - 電漿處理裝置用內襯材 - Google Patents
電漿處理裝置用內襯材Info
- Publication number
- TWD149223S TWD149223S TW100304782F TW100304782F TWD149223S TW D149223 S TWD149223 S TW D149223S TW 100304782 F TW100304782 F TW 100304782F TW 100304782 F TW100304782 F TW 100304782F TW D149223 S TWD149223 S TW D149223S
- Authority
- TW
- Taiwan
- Prior art keywords
- plasma processing
- processing device
- article
- inner lining
- processing container
- Prior art date
Links
- 239000000463 material Substances 0.000 abstract 5
- 239000000758 substrate Substances 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000012790 confirmation Methods 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Abstract
【物品用途】;本創作的物品是電漿處理裝置用內襯材,係構成可利用電漿在基板上進行氧化膜等之成膜和蝕刻之類的處理的電漿處理裝置之處理容器的一部分之電漿處理裝置用內襯材。;【創作特點】;從各視圖觀之,本物品的本體呈圓形環體,本體環周面上方設有等距之淺梯形突起部,本體之前、後方各設有一不同大小且由下往上凹陷之矩形缺口;如使用狀態參考圖所示,該處理容器1具有確認窗8、處理室及排氣室6,在處理容器1內,係設置有用來載置處理基板9的載置台7,該載置台7的周圍係配設有擋板3,本物品之電漿處理裝置用內襯材2係在處理容器1之內壁上,於其他電漿處理裝置用內襯材4、5之上方;具有防止因處理容器1之構成材料所產生的金屬污染之功能。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011007262 | 2011-03-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD149223S true TWD149223S (zh) | 2012-09-11 |
Family
ID=45991332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100304782F TWD149223S (zh) | 2011-03-30 | 2011-09-09 | 電漿處理裝置用內襯材 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD658692S1 (zh) |
| TW (1) | TWD149223S (zh) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD716239S1 (en) * | 2013-11-06 | 2014-10-28 | Applied Materials, Inc. | Upper chamber liner |
| USD717746S1 (en) * | 2013-11-06 | 2014-11-18 | Applied Materials, Inc. | Lower chamber liner |
| USD716240S1 (en) * | 2013-11-07 | 2014-10-28 | Applied Materials, Inc. | Lower chamber liner |
| USD711331S1 (en) * | 2013-11-07 | 2014-08-19 | Applied Materials, Inc. | Upper chamber liner |
| US20160033070A1 (en) * | 2014-08-01 | 2016-02-04 | Applied Materials, Inc. | Recursive pumping member |
| USD795315S1 (en) * | 2014-12-12 | 2017-08-22 | Ebara Corporation | Dresser disk |
| USD826300S1 (en) * | 2016-09-30 | 2018-08-21 | Oerlikon Metco Ag, Wohlen | Rotably mounted thermal plasma burner for thermalspraying |
| USD838681S1 (en) * | 2017-04-28 | 2019-01-22 | Applied Materials, Inc. | Plasma chamber liner |
| USD842259S1 (en) * | 2017-04-28 | 2019-03-05 | Applied Materials, Inc. | Plasma chamber liner |
| USD837754S1 (en) * | 2017-04-28 | 2019-01-08 | Applied Materials, Inc. | Plasma chamber liner |
| USD909439S1 (en) * | 2018-11-30 | 2021-02-02 | Ferrotec (Usa) Corporation | Two-piece crucible cover |
| JP1638504S (zh) | 2018-12-06 | 2019-08-05 |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD259346S (en) * | 1978-10-04 | 1981-05-26 | Harrelson Rubber Company | Sealing disc for tire retreading |
| USD338621S (en) * | 1991-03-14 | 1993-08-24 | Balson John E | Rim seal for a can |
| US6046425A (en) * | 1991-05-31 | 2000-04-04 | Hitachi, Ltd. | Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber |
| US5410992A (en) * | 1994-04-04 | 1995-05-02 | Ford Motor Company | Cooling system for automotive engine |
| US6361661B2 (en) * | 1997-05-16 | 2002-03-26 | Applies Materials, Inc. | Hybrid coil design for ionized deposition |
| USD404370S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Cap for use in a semiconductor wafer heat processing apparatus |
| USD404372S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Ring for use in a semiconductor wafer heat processing apparatus |
| USD403002S (en) * | 1998-01-27 | 1998-12-22 | Semiconductor Equipment Technology, Inc. | Shield and cover for target of sputter coating apparatus |
| USD403334S (en) * | 1998-01-27 | 1998-12-29 | Semiconductor Equipment Technology, Inc | Shield and cover for target of sputter coating apparatus |
| USD401252S (en) * | 1998-01-27 | 1998-11-17 | Semiconductor Equipment Technology | Shield and cover for target of sputter coating apparatus |
| US6135831A (en) * | 1999-10-22 | 2000-10-24 | Bird-Johnson Company | Impeller for marine waterjet propulsion apparatus |
| USD449621S1 (en) * | 2000-02-15 | 2001-10-23 | Edward W. Hamlin | Securing ring for a flexible bellows of a marine outboard drive |
| USD442864S1 (en) * | 2000-07-12 | 2001-05-29 | Houston Harvest Gift Products, Llc | Two-piece lid |
| US6550484B1 (en) * | 2001-12-07 | 2003-04-22 | Novellus Systems, Inc. | Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing |
| USD490450S1 (en) * | 2002-05-20 | 2004-05-25 | Tokyo Electron Limited | Exhaust ring for semiconductor equipment |
| KR20030090305A (ko) * | 2002-05-22 | 2003-11-28 | 동경엘렉트론코리아(주) | 플라즈마 발생장치의 가스 배기용 배플 플레이트 |
| USD491963S1 (en) * | 2002-11-20 | 2004-06-22 | Tokyo Electron Limited | Inner wall shield for a process chamber for manufacturing semiconductors |
| USD498826S1 (en) * | 2003-02-13 | 2004-11-23 | Nichias Co., Ltd | Metal ring gasket |
| USD489611S1 (en) * | 2003-09-02 | 2004-05-11 | John Monsanty | Can lip protector |
| USD510585S1 (en) * | 2003-10-28 | 2005-10-11 | Enterprises International, Inc. | Guide bushing for a wire tying machine |
| US20050150452A1 (en) * | 2004-01-14 | 2005-07-14 | Soovo Sen | Process kit design for deposition chamber |
| USD525127S1 (en) * | 2004-03-01 | 2006-07-18 | Kraft Foods Holdings, Inc. | Susceptor ring |
| USD532095S1 (en) * | 2004-10-07 | 2006-11-14 | Flex-A-Lite Consolidated, Inc. | Combined fan assembly and shroud |
| JP4149427B2 (ja) * | 2004-10-07 | 2008-09-10 | 東京エレクトロン株式会社 | マイクロ波プラズマ処理装置 |
| US7897009B2 (en) * | 2004-12-17 | 2011-03-01 | Tokyo Electron Limited | Plasma processing apparatus |
| TWD121115S1 (zh) * | 2005-03-30 | 2008-01-21 | 東京威力科創股份有限公司 | 遮護環 |
| US20060272800A1 (en) * | 2005-06-02 | 2006-12-07 | Paccar Inc | Radiator fan shroud with flow directing ports |
| TWD125339S1 (zh) * | 2005-07-29 | 2008-10-11 | 東京威力科創股份有限公司 | 電漿處理裝置之微波導入窗用頂板 |
| USD557226S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
| USD557425S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
| USD556704S1 (en) * | 2005-08-25 | 2007-12-04 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
| KR100978754B1 (ko) * | 2008-04-03 | 2010-08-30 | 주식회사 테스 | 플라즈마 처리 장치 |
| USD605206S1 (en) * | 2008-05-07 | 2009-12-01 | Komatsu Ltd. | Fan shroud for construction machinery |
| USD610176S1 (en) * | 2008-08-26 | 2010-02-16 | Tokyo Electron Limited | Coater cup |
| USD616390S1 (en) * | 2009-03-06 | 2010-05-25 | Tokyo Electron Limited | Quartz cover for manufacturing semiconductor wafers |
| USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
| USD645486S1 (en) * | 2010-03-31 | 2011-09-20 | Tokyo Electron Limited | Dielectric window for plasma processing device |
-
2011
- 2011-09-07 US US29/401,103 patent/USD658692S1/en active Active
- 2011-09-09 TW TW100304782F patent/TWD149223S/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| USD658692S1 (en) | 2012-05-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWD149223S (zh) | 電漿處理裝置用內襯材 | |
| TWD149224S (zh) | 電漿處理裝置用內襯材 | |
| TWD156030S (zh) | 電漿處理裝置用內襯材 | |
| TWD168774S (zh) | 反應管之部分 | |
| TWD167986S (zh) | 反應管之部分 | |
| TWD149222S (zh) | 空腔塊 | |
| WO2012125560A3 (en) | Method and apparatus for plasma dicing a semi-conductor wafer | |
| TWD167985S (zh) | 反應管之部分 | |
| TWD167987S (zh) | 反應管之部分 | |
| TWD155016S (zh) | 聚焦環 | |
| TWD169790S (zh) | 基板處理裝置用氣化器之部分 | |
| JP2016530705A5 (zh) | ||
| TW201612355A (en) | Film deposition apparatus | |
| TWD169687S (zh) | 容器之部分(二) | |
| TWD186397S (zh) | 電漿處理裝置用放電腔室 | |
| SG10201407637TA (en) | An electrostatic chuck with an angled sidewall | |
| TW201614101A (en) | Film forming apparatus, susceptor, and film forming method | |
| TWD172257S (zh) | 裝飾用展示器之部分 | |
| MX2015017022A (es) | Precinto higienico para envases. | |
| WO2014042488A3 (ko) | 기판처리장치 | |
| TWD203479S (zh) | 基板處理裝置用入口蓋 | |
| TWD166710S (zh) | 反應管 | |
| JP2014036026A5 (zh) | ||
| EP3307744A4 (en) | STEAM SEPARATION METHOD FOR THE FORMATION OF SILICONE AND OXYGENY THIN FILMS | |
| USD672354S1 (en) | Cover plate for a computing device |