TWD186397S - 電漿處理裝置用放電腔室 - Google Patents
電漿處理裝置用放電腔室Info
- Publication number
- TWD186397S TWD186397S TW106301396F TW106301396F TWD186397S TW D186397 S TWD186397 S TW D186397S TW 106301396 F TW106301396 F TW 106301396F TW 106301396 F TW106301396 F TW 106301396F TW D186397 S TWD186397 S TW D186397S
- Authority
- TW
- Taiwan
- Prior art keywords
- processing equipment
- plasma processing
- discharge chamber
- article
- design
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000012780 transparent material Substances 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是電漿處理裝置用放電腔室,為一種在半導體製造時所使用的電漿處理裝置中,形成進行利用放電來產生電漿之反應的空間之放電腔室。另外,在「使用狀態之參考圖」中,在試料台的上方載置著作為試料的半導體晶圓。;【設計說明】;呈現在「立體圖」及「D-D、E-E部分放大圖」中的細線,皆為用來表現立體表面的形狀。本物品為透明素材。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2017-807F JP1611626S (zh) | 2017-01-20 | 2017-01-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD186397S true TWD186397S (zh) | 2017-11-01 |
Family
ID=63168682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106301396F TWD186397S (zh) | 2017-01-20 | 2017-03-17 | 電漿處理裝置用放電腔室 |
Country Status (3)
Country | Link |
---|---|
US (1) | USD907593S1 (zh) |
JP (1) | JP1611626S (zh) |
TW (1) | TWD186397S (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1027656S1 (en) * | 2023-09-14 | 2024-05-21 | Edible Ip, Llc | Customizable container |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD463586S1 (en) * | 2001-05-16 | 2002-09-24 | Hosley International Trading Corporation | Snowflake candle holder |
USD458698S1 (en) * | 2001-05-16 | 2002-06-11 | Hosley International Trading Corporation | Heart candle holder |
USD494551S1 (en) | 2002-12-12 | 2004-08-17 | Tokyo Electron Limited | Exhaust ring for manufacturing semiconductors |
USD559994S1 (en) | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
USD557226S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD557425S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD556704S1 (en) * | 2005-08-25 | 2007-12-04 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
USD703160S1 (en) * | 2011-01-27 | 2014-04-22 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
USD682448S1 (en) * | 2011-09-09 | 2013-05-14 | Mvp Group International, Inc. | Candle holder |
USD768510S1 (en) * | 2015-05-01 | 2016-10-11 | Milacron Llc | Container |
JP1551512S (zh) | 2015-06-12 | 2016-06-13 | ||
JP1546801S (zh) * | 2015-06-12 | 2016-03-28 | ||
JP1546799S (zh) * | 2015-06-12 | 2016-03-28 | ||
JP1546800S (zh) * | 2015-06-12 | 2016-03-28 | ||
JP1564934S (zh) * | 2016-02-26 | 2016-12-05 | ||
USD842109S1 (en) * | 2016-12-08 | 2019-03-05 | Orange Products, Inc. | Space wall jar |
JP1584241S (zh) * | 2017-01-31 | 2017-08-21 | ||
USD875054S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875053S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
JP1605838S (zh) * | 2017-11-10 | 2018-06-04 | ||
JP1605982S (zh) * | 2017-12-27 | 2021-05-31 |
-
2017
- 2017-01-20 JP JPD2017-807F patent/JP1611626S/ja active Active
- 2017-03-17 TW TW106301396F patent/TWD186397S/zh unknown
- 2017-07-18 US US29/611,001 patent/USD907593S1/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP1611626S (zh) | 2018-08-20 |
USD907593S1 (en) | 2021-01-12 |
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