TWD167113S - 半導體晶圓硏磨裝置用彈性膜 - Google Patents
半導體晶圓硏磨裝置用彈性膜Info
- Publication number
- TWD167113S TWD167113S TW102307327D02F TW102307327D02F TWD167113S TW D167113 S TWD167113 S TW D167113S TW 102307327D02 F TW102307327D02 F TW 102307327D02F TW 102307327D02 F TW102307327D02 F TW 102307327D02F TW D167113 S TWD167113 S TW D167113S
- Authority
- TW
- Taiwan
- Prior art keywords
- design
- view
- elastic membrane
- article
- wafer polishing
- Prior art date
Links
Abstract
【物品用途】;本設計的物品是半導體晶圓研磨裝置用彈性膜(Elastic membrane),為一種應用於半導體等製造之晶圓研磨工程中,安裝在研磨裝置的基板保持環內側,從裝置側將空氣等氣體供給到本物品的背面側使膜面朝正面側膨脹,用以將配置在正面側的晶圓單面朝研磨墊按壓。;【設計說明】;本衍生設計與原設計之外觀差異:由「A部分X-X放大剖面圖」及「B部放大圖」即可清楚看出兩者之細部不同,因此本案與原設計案之差異些微,不影響原設計與衍生設計之近似。;仰視圖與俯視圖相對稱,仰視圖省略。;左側視圖與右側視圖相對稱,左側視圖省略。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2013-10674F JP1495081S (zh) | 2013-05-15 | 2013-05-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD167113S true TWD167113S (zh) | 2015-04-11 |
Family
ID=58418594
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102307327D02F TWD167113S (zh) | 2013-05-15 | 2013-11-14 | 半導體晶圓硏磨裝置用彈性膜 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1495081S (zh) |
| TW (1) | TWD167113S (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD897974S1 (en) | 2018-03-29 | 2020-10-06 | Hamamatsu Photonics K.K. | Semiconductor wafer |
-
2013
- 2013-05-15 JP JPD2013-10674F patent/JP1495081S/ja active Active
- 2013-11-14 TW TW102307327D02F patent/TWD167113S/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD897974S1 (en) | 2018-03-29 | 2020-10-06 | Hamamatsu Photonics K.K. | Semiconductor wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1495081S (zh) | 2017-04-03 |
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