TWD155016S - 聚焦環 - Google Patents

聚焦環

Info

Publication number
TWD155016S
TWD155016S TW101301749F TW101301749F TWD155016S TW D155016 S TWD155016 S TW D155016S TW 101301749 F TW101301749 F TW 101301749F TW 101301749 F TW101301749 F TW 101301749F TW D155016 S TWD155016 S TW D155016S
Authority
TW
Taiwan
Prior art keywords
main body
item
creation
ring
focusing ring
Prior art date
Application number
TW101301749F
Other languages
English (en)
Inventor
Shunsuke Mizukami
Original Assignee
東京威力科創股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東京威力科創股份有限公司 filed Critical 東京威力科創股份有限公司
Publication of TWD155016S publication Critical patent/TWD155016S/zh

Links

Abstract

【物品用途】;本創作的物品是聚焦環，主要由單晶矽環件所組成，設置於電漿處理裝置之腔體中，可將產生在半導體晶圓上的電漿分布擴大至本聚焦環附近。;【創作特點】;由各視圖觀之，本創作本體呈薄圓環形體，中間為中空部，本體上方內側處設有一斜面，該斜面向內側呈較大之傾斜度後向下延伸，由放大剖視圖觀之，本體外輪廓呈一方形部；由使用狀態參考圖觀之，本物品設置於腔體內並環繞於承座台上之半導體晶圓外側，且相對於電漿淋浴頭。
TW101301749F 2011-09-30 2012-03-30 聚焦環 TWD155016S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011022451 2011-09-30

Publications (1)

Publication Number Publication Date
TWD155016S true TWD155016S (zh) 2013-08-01

Family

ID=51178372

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101301749F TWD155016S (zh) 2011-09-30 2012-03-30 聚焦環

Country Status (2)

Country Link
US (1) USD709538S1 (zh)
TW (1) TWD155016S (zh)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring
TWD169790S (zh) * 2013-07-10 2015-08-11 日立國際電氣股份有限公司 基板處理裝置用氣化器之部分
JP1546800S (zh) 2015-06-12 2016-03-28
JP1545407S (zh) * 2015-06-16 2016-03-14
JP1545406S (zh) * 2015-06-16 2016-03-14
JP1549880S (zh) * 2015-08-06 2016-05-23
JP1549882S (zh) * 2015-08-18 2016-05-23
JP1550115S (zh) * 2015-08-18 2016-05-23
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD797691S1 (en) * 2016-04-14 2017-09-19 Applied Materials, Inc. Composite edge ring
USD839224S1 (en) * 2016-12-12 2019-01-29 Ebara Corporation Elastic membrane for semiconductor wafer polishing
JP1584906S (zh) * 2017-01-31 2017-08-28
JP1584241S (zh) * 2017-01-31 2017-08-21
JP1642984S (zh) 2018-07-25 2019-10-07
JP1643124S (zh) 2018-07-25 2019-10-07
JP1642983S (zh) 2018-07-25 2019-10-07
JP1643123S (zh) 2018-07-25 2019-10-07
JP1643125S (zh) 2018-07-25 2019-10-07
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD900176S1 (en) * 2019-03-19 2020-10-27 Makerbot Industries, Llc Spool for filament of a three-dimensional printer
USD900178S1 (en) * 2019-03-20 2020-10-27 Makerbot Industries, Llc Spool for filament of a three-dimensional printer
USD979524S1 (en) * 2020-03-19 2023-02-28 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD943539S1 (en) 2020-03-19 2022-02-15 Applied Materials, Inc. Confinement plate for a substrate processing chamber
USD934315S1 (en) * 2020-03-20 2021-10-26 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life

Also Published As

Publication number Publication date
USD709538S1 (en) 2014-07-22

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