JP1545406S - - Google Patents

Info

Publication number
JP1545406S
JP1545406S JPD2015-13299F JP2015013299F JP1545406S JP 1545406 S JP1545406 S JP 1545406S JP 2015013299 F JP2015013299 F JP 2015013299F JP 1545406 S JP1545406 S JP 1545406S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2015-13299F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2015-13299F priority Critical patent/JP1545406S/ja
Priority to TW104306988F priority patent/TWD176077S/zh
Priority to US29/548,574 priority patent/USD803917S1/en
Application granted granted Critical
Publication of JP1545406S publication Critical patent/JP1545406S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2015-13299F 2015-06-16 2015-06-16 Active JP1545406S (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2015-13299F JP1545406S (zh) 2015-06-16 2015-06-16
TW104306988F TWD176077S (zh) 2015-06-16 2015-12-15 反射環構件
US29/548,574 USD803917S1 (en) 2015-06-16 2015-12-15 Heat reflector for substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-13299F JP1545406S (zh) 2015-06-16 2015-06-16

Publications (1)

Publication Number Publication Date
JP1545406S true JP1545406S (zh) 2016-03-14

Family

ID=55484211

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2015-13299F Active JP1545406S (zh) 2015-06-16 2015-06-16

Country Status (3)

Country Link
US (1) USD803917S1 (zh)
JP (1) JP1545406S (zh)
TW (1) TWD176077S (zh)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10438795B2 (en) 2015-06-22 2019-10-08 Veeco Instruments, Inc. Self-centering wafer carrier system for chemical vapor deposition
USD868993S1 (en) 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD870314S1 (en) 2017-08-31 2019-12-17 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD871608S1 (en) 2017-07-31 2019-12-31 Hitachi High-Technologies Corporation Gas ring for a plasma processing apparatus
USD871609S1 (en) 2017-08-31 2019-12-31 Hitachi High-Technologies Corporation Electrode plate peripheral ring for a plasma processing apparatus

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1581911S (zh) * 2016-10-25 2017-07-24
JP1584241S (zh) * 2017-01-31 2017-08-21
JP1584906S (zh) * 2017-01-31 2017-08-28
USD828088S1 (en) * 2017-02-09 2018-09-11 Sovaro Coolers, LLC Tumbler rim
USD891923S1 (en) * 2017-11-12 2020-08-04 Yun Lin Container lid
JP1659287S (zh) * 2019-10-18 2020-05-11
USD974910S1 (en) * 2020-02-04 2023-01-10 Wilson Sporting Goods Co. Tennis ball container overcap
USD943642S1 (en) * 2020-02-29 2022-02-15 Bmic Llc Perforating apparatus

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US1798246A (en) * 1930-09-19 1931-03-31 Victor Mfg & Gasket Co Gasket
US3414183A (en) * 1966-08-24 1968-12-03 Phillips Petroleum Co Ring-a-rim closures
USD243664S (en) * 1975-11-10 1977-03-15 Hardinge Brothers, Inc. Index ring for a machine tool
USD348836S (en) * 1991-06-06 1994-07-19 Armstrong Containers, Inc. Transportation safety ring for cylindrical containers
US5533924A (en) * 1994-09-01 1996-07-09 Micron Technology, Inc. Polishing apparatus, a polishing wafer carrier apparatus, a replacable component for a particular polishing apparatus and a process of polishing wafers
USD380527S (en) * 1996-03-19 1997-07-01 Cherle Velez Sink drain shield
USD470050S1 (en) * 2001-07-17 2003-02-11 Playtex Products, Inc. Converter ring
AU2003300375A1 (en) * 2002-10-11 2004-05-04 Semplastics, L.L.C. Retaining ring for use on a carrier of a polishing apparatus
USD525127S1 (en) * 2004-03-01 2006-07-18 Kraft Foods Holdings, Inc. Susceptor ring
USD559994S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
USD588078S1 (en) * 2006-06-16 2009-03-10 Tokyo Electron Limited Heat dissipation deterrence link for semiconductor manufacture
USD684551S1 (en) * 2011-07-07 2013-06-18 Phuong Van Nguyen Wafer polishing pad holder
USD709538S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD665491S1 (en) * 2012-01-25 2012-08-14 Applied Materials, Inc. Deposition chamber cover ring
USD698939S1 (en) * 2013-03-14 2014-02-04 Charles River Laboratories, Inc. Lid
TWD169790S (zh) * 2013-07-10 2015-08-11 日立國際電氣股份有限公司 基板處理裝置用氣化器之部分
USD730734S1 (en) * 2013-07-10 2015-06-02 Gino Rapparini Reinforcement ring for beverage capsule
USD751398S1 (en) * 2014-06-03 2016-03-15 Tri State Distribution, Inc. Scalloped pharmaceutical closure
JP1546800S (zh) * 2015-06-12 2016-03-28

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10438795B2 (en) 2015-06-22 2019-10-08 Veeco Instruments, Inc. Self-centering wafer carrier system for chemical vapor deposition
USD871608S1 (en) 2017-07-31 2019-12-31 Hitachi High-Technologies Corporation Gas ring for a plasma processing apparatus
USD868993S1 (en) 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD870314S1 (en) 2017-08-31 2019-12-17 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD871609S1 (en) 2017-08-31 2019-12-31 Hitachi High-Technologies Corporation Electrode plate peripheral ring for a plasma processing apparatus

Also Published As

Publication number Publication date
TWD176077S (zh) 2016-06-01
USD803917S1 (en) 2017-11-28

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