USD803917S1 - Heat reflector for substrate processing apparatus - Google Patents

Heat reflector for substrate processing apparatus Download PDF

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Publication number
USD803917S1
USD803917S1 US29/548,574 US201529548574F USD803917S US D803917 S1 USD803917 S1 US D803917S1 US 201529548574 F US201529548574 F US 201529548574F US D803917 S USD803917 S US D803917S
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United States
Prior art keywords
processing apparatus
substrate processing
heat reflector
view
dot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
US29/548,574
Inventor
Koichiro Harada
Takeshi Yasui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Hitachi Kokusai Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc filed Critical Hitachi Kokusai Electric Inc
Assigned to HITACHI KOKUSAI ELECTRIC, INC reassignment HITACHI KOKUSAI ELECTRIC, INC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HARADA, KOICHIRO, YASUI, TAKESHI
Application granted granted Critical
Publication of USD803917S1 publication Critical patent/USD803917S1/en
Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HITACHI KOKUSAI ELECTRIC INC.
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Anticipated expiration legal-status Critical

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FIG. 1 is a front and top perspective view of a heat reflector for substrate processing apparatus showing my new design;
FIG. 2 is a front and bottom perspective view of a heat reflector for substrate processing apparatus showing my new design;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a top plan view thereof;
FIG. 5 is a bottom plan view thereof;
FIG. 6 is a cross sectional view take along line 6-6 in FIG. 5 thereof;
FIG. 7 is a cross sectional view take along line 7-7 in FIG. 5 thereof;
FIG. 8 is an enlarged portion view of the area outlined by the dash-dot-dot-dash lines in FIG. 2;
FIG. 9 is an enlarged portion view of the area outlined by the dash-dot-dot-dash lines in FIG. 6; and,
FIG. 10 is an enlarged portion view of the area outlined by the dash-dot-dot-dash lines in FIG. 7.
The broken lines shown in the drawings represent portions of the heat reflector for substrate processing apparatus that form no part of the claimed design.
The dash-dot-dot-dash lines outline areas shown enlarged in other figures and form no part of the claim.
As the rear view, right side view and left side view is identical to the front view, it is omitted.

Claims (1)

    CLAIM
  1. We claim the ornamental design for a heat reflector for substrate processing apparatus, as shown (and described).
US29/548,574 2015-06-16 2015-12-15 Heat reflector for substrate processing apparatus Active USD803917S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015/013299 2015-06-16
JPD2015-13299F JP1545406S (en) 2015-06-16 2015-06-16

Publications (1)

Publication Number Publication Date
USD803917S1 true USD803917S1 (en) 2017-11-28

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US29/548,574 Active USD803917S1 (en) 2015-06-16 2015-12-15 Heat reflector for substrate processing apparatus

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US (1) USD803917S1 (en)
JP (1) JP1545406S (en)
TW (1) TWD176077S (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD827592S1 (en) * 2017-01-31 2018-09-04 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD828088S1 (en) * 2017-02-09 2018-09-11 Sovaro Coolers, LLC Tumbler rim
USD840364S1 (en) * 2017-01-31 2019-02-12 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD862404S1 (en) * 2016-10-25 2019-10-08 Kokusai Electric Corporation Sealing material ring for a semiconductor manufacturing apparatus
USD870314S1 (en) * 2017-08-31 2019-12-17 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD891923S1 (en) * 2017-11-12 2020-08-04 Yun Lin Container lid
USD943642S1 (en) * 2020-02-29 2022-02-15 Bmic Llc Perforating apparatus
USD954986S1 (en) * 2019-10-18 2022-06-14 Hitachi High-Tech Corporation Electrode cover for a plasma processing device
USD974910S1 (en) * 2020-02-04 2023-01-10 Wilson Sporting Goods Co. Tennis ball container overcap

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10438795B2 (en) 2015-06-22 2019-10-08 Veeco Instruments, Inc. Self-centering wafer carrier system for chemical vapor deposition
JP1598984S (en) 2017-07-31 2018-03-05
JP1598996S (en) 2017-08-31 2018-03-05
JP1598997S (en) 2017-08-31 2018-03-05

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US3414183A (en) * 1966-08-24 1968-12-03 Phillips Petroleum Co Ring-a-rim closures
USD243664S (en) * 1975-11-10 1977-03-15 Hardinge Brothers, Inc. Index ring for a machine tool
USD348836S (en) * 1991-06-06 1994-07-19 Armstrong Containers, Inc. Transportation safety ring for cylindrical containers
US5533924A (en) * 1994-09-01 1996-07-09 Micron Technology, Inc. Polishing apparatus, a polishing wafer carrier apparatus, a replacable component for a particular polishing apparatus and a process of polishing wafers
USD380527S (en) * 1996-03-19 1997-07-01 Cherle Velez Sink drain shield
USD470050S1 (en) * 2001-07-17 2003-02-11 Playtex Products, Inc. Converter ring
USD525127S1 (en) * 2004-03-01 2006-07-18 Kraft Foods Holdings, Inc. Susceptor ring
US7160493B2 (en) * 2002-10-11 2007-01-09 Semplastics, Llc Retaining ring for use on a carrier of a polishing apparatus
USD559994S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
USD588078S1 (en) * 2006-06-16 2009-03-10 Tokyo Electron Limited Heat dissipation deterrence link for semiconductor manufacture
USD665491S1 (en) * 2012-01-25 2012-08-14 Applied Materials, Inc. Deposition chamber cover ring
USD684551S1 (en) * 2011-07-07 2013-06-18 Phuong Van Nguyen Wafer polishing pad holder
USD698939S1 (en) * 2013-03-14 2014-02-04 Charles River Laboratories, Inc. Lid
USD709538S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD730734S1 (en) * 2013-07-10 2015-06-02 Gino Rapparini Reinforcement ring for beverage capsule
USD741823S1 (en) * 2013-07-10 2015-10-27 Hitachi Kokusai Electric Inc. Vaporizer for substrate processing apparatus
USD751398S1 (en) * 2014-06-03 2016-03-15 Tri State Distribution, Inc. Scalloped pharmaceutical closure
USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus

Patent Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1798246A (en) * 1930-09-19 1931-03-31 Victor Mfg & Gasket Co Gasket
US3414183A (en) * 1966-08-24 1968-12-03 Phillips Petroleum Co Ring-a-rim closures
USD243664S (en) * 1975-11-10 1977-03-15 Hardinge Brothers, Inc. Index ring for a machine tool
USD348836S (en) * 1991-06-06 1994-07-19 Armstrong Containers, Inc. Transportation safety ring for cylindrical containers
US5533924A (en) * 1994-09-01 1996-07-09 Micron Technology, Inc. Polishing apparatus, a polishing wafer carrier apparatus, a replacable component for a particular polishing apparatus and a process of polishing wafers
USD380527S (en) * 1996-03-19 1997-07-01 Cherle Velez Sink drain shield
USD470050S1 (en) * 2001-07-17 2003-02-11 Playtex Products, Inc. Converter ring
US7160493B2 (en) * 2002-10-11 2007-01-09 Semplastics, Llc Retaining ring for use on a carrier of a polishing apparatus
USD525127S1 (en) * 2004-03-01 2006-07-18 Kraft Foods Holdings, Inc. Susceptor ring
USD559994S1 (en) * 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
USD588078S1 (en) * 2006-06-16 2009-03-10 Tokyo Electron Limited Heat dissipation deterrence link for semiconductor manufacture
USD684551S1 (en) * 2011-07-07 2013-06-18 Phuong Van Nguyen Wafer polishing pad holder
USD709538S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD665491S1 (en) * 2012-01-25 2012-08-14 Applied Materials, Inc. Deposition chamber cover ring
USD698939S1 (en) * 2013-03-14 2014-02-04 Charles River Laboratories, Inc. Lid
USD730734S1 (en) * 2013-07-10 2015-06-02 Gino Rapparini Reinforcement ring for beverage capsule
USD741823S1 (en) * 2013-07-10 2015-10-27 Hitachi Kokusai Electric Inc. Vaporizer for substrate processing apparatus
USD751398S1 (en) * 2014-06-03 2016-03-15 Tri State Distribution, Inc. Scalloped pharmaceutical closure
USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD862404S1 (en) * 2016-10-25 2019-10-08 Kokusai Electric Corporation Sealing material ring for a semiconductor manufacturing apparatus
USD827592S1 (en) * 2017-01-31 2018-09-04 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD840364S1 (en) * 2017-01-31 2019-02-12 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD828088S1 (en) * 2017-02-09 2018-09-11 Sovaro Coolers, LLC Tumbler rim
USD870314S1 (en) * 2017-08-31 2019-12-17 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD891923S1 (en) * 2017-11-12 2020-08-04 Yun Lin Container lid
USD954986S1 (en) * 2019-10-18 2022-06-14 Hitachi High-Tech Corporation Electrode cover for a plasma processing device
USD974910S1 (en) * 2020-02-04 2023-01-10 Wilson Sporting Goods Co. Tennis ball container overcap
USD943642S1 (en) * 2020-02-29 2022-02-15 Bmic Llc Perforating apparatus

Also Published As

Publication number Publication date
JP1545406S (en) 2016-03-14
TWD176077S (en) 2016-06-01

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