USD546784S1 - Attracting disc for an electrostatic chuck for semiconductor production - Google Patents
Attracting disc for an electrostatic chuck for semiconductor production Download PDFInfo
- Publication number
- USD546784S1 USD546784S1 US29/245,021 US24502105F USD546784S US D546784 S1 USD546784 S1 US D546784S1 US 24502105 F US24502105 F US 24502105F US D546784 S USD546784 S US D546784S
- Authority
- US
- United States
- Prior art keywords
- electrostatic chuck
- semiconductor production
- attracting disc
- attracting
- disc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
Claims (1)
- The ornamental design for an attracting disc for an electrostatic chuck for semiconductor production, as shown and described.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005028307 | 2005-09-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD546784S1 true USD546784S1 (en) | 2007-07-17 |
Family
ID=38235949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/245,021 Expired - Lifetime USD546784S1 (en) | 2005-09-29 | 2005-12-19 | Attracting disc for an electrostatic chuck for semiconductor production |
Country Status (1)
Country | Link |
---|---|
US (1) | USD546784S1 (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD668211S1 (en) * | 2010-09-10 | 2012-10-02 | Novellus Systems, Inc. | Segmented electroplating anode and anode segment |
USD734377S1 (en) * | 2013-03-28 | 2015-07-14 | Hirata Corporation | Top cover of a load lock chamber |
USD795208S1 (en) * | 2015-08-18 | 2017-08-22 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing equipment |
USD802472S1 (en) * | 2015-08-06 | 2017-11-14 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing equipment |
USD803802S1 (en) * | 2015-08-18 | 2017-11-28 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing equipment |
TWD188484S (en) | 2016-12-12 | 2018-02-11 | 荏原製作所股份有限公司 | Part of the elastic film for semiconductor surface polishing |
TWD194194S (en) | 2016-12-12 | 2018-11-21 | 荏原製作所股份有限公司 | Part of the elastic film for semiconductor surface polishing |
USD839224S1 (en) | 2016-12-12 | 2019-01-29 | Ebara Corporation | Elastic membrane for semiconductor wafer polishing |
USD913256S1 (en) * | 2019-07-31 | 2021-03-16 | Eryn Smith | Antenna pattern for a semiconductive substrate carrier |
USD926716S1 (en) * | 2019-07-31 | 2021-08-03 | Eryn Smith | Antenna pattern for a semiconductive substrate carrier |
TWD214286S (en) | 2020-09-17 | 2021-09-21 | 日商荏原製作所股份有限公司 | Part of elastic film for semiconductor wafer polishing |
USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
USD984972S1 (en) * | 2021-03-29 | 2023-05-02 | Beijing Naura Microelectronics Equipment Co., Ltd. | Electrostatic chuck for semiconductor manufacture |
-
2005
- 2005-12-19 US US29/245,021 patent/USD546784S1/en not_active Expired - Lifetime
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD668211S1 (en) * | 2010-09-10 | 2012-10-02 | Novellus Systems, Inc. | Segmented electroplating anode and anode segment |
USD734377S1 (en) * | 2013-03-28 | 2015-07-14 | Hirata Corporation | Top cover of a load lock chamber |
USD802472S1 (en) * | 2015-08-06 | 2017-11-14 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing equipment |
USD795208S1 (en) * | 2015-08-18 | 2017-08-22 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing equipment |
USD803802S1 (en) * | 2015-08-18 | 2017-11-28 | Tokyo Electron Limited | Electrostatic chuck for semiconductor manufacturing equipment |
TWD194194S (en) | 2016-12-12 | 2018-11-21 | 荏原製作所股份有限公司 | Part of the elastic film for semiconductor surface polishing |
TWD188484S (en) | 2016-12-12 | 2018-02-11 | 荏原製作所股份有限公司 | Part of the elastic film for semiconductor surface polishing |
USD839224S1 (en) | 2016-12-12 | 2019-01-29 | Ebara Corporation | Elastic membrane for semiconductor wafer polishing |
USD913977S1 (en) | 2016-12-12 | 2021-03-23 | Ebara Corporation | Elastic membrane for semiconductor wafer polishing |
USD913256S1 (en) * | 2019-07-31 | 2021-03-16 | Eryn Smith | Antenna pattern for a semiconductive substrate carrier |
USD926716S1 (en) * | 2019-07-31 | 2021-08-03 | Eryn Smith | Antenna pattern for a semiconductive substrate carrier |
USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
TWD214286S (en) | 2020-09-17 | 2021-09-21 | 日商荏原製作所股份有限公司 | Part of elastic film for semiconductor wafer polishing |
USD984972S1 (en) * | 2021-03-29 | 2023-05-02 | Beijing Naura Microelectronics Equipment Co., Ltd. | Electrostatic chuck for semiconductor manufacture |
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