TWD155119S - 電漿處理裝置用電極板 - Google Patents
電漿處理裝置用電極板Info
- Publication number
- TWD155119S TWD155119S TW101301746F TW101301746F TWD155119S TW D155119 S TWD155119 S TW D155119S TW 101301746 F TW101301746 F TW 101301746F TW 101301746 F TW101301746 F TW 101301746F TW D155119 S TWD155119 S TW D155119S
- Authority
- TW
- Taiwan
- Prior art keywords
- main body
- cavity
- item
- creation
- electrode plate
- Prior art date
Links
- 230000035515 penetration Effects 0.000 abstract 2
- 238000009832 plasma treatment Methods 0.000 abstract 2
- 238000010586 diagram Methods 0.000 abstract 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Abstract
【物品用途】;本創作的物品是電漿處理裝置用電極板,主要由單晶矽圓板形件所組成,設置於電漿處理裝置之腔體中,具有許多氣體穿透孔以引導氣體進入腔體內。;【創作特點】;由各視圖觀之,本創作本體呈薄圓板形體,本體前方近外圓周處設有一圈不同大小之非貫通圓孔排列,本體上設有同心圓狀排列之氣體穿透孔,本體外輪廓由頂面向下垂直內收形成一段差部;由使用狀態參考圖觀之,本物品設置於腔體內之電漿淋浴頭底部,並面對承座台上之半導體晶圓。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011022448 | 2011-09-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD155119S true TWD155119S (zh) | 2013-08-01 |
Family
ID=50033090
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101301746F TWD155119S (zh) | 2011-09-30 | 2012-03-30 | 電漿處理裝置用電極板 |
Country Status (2)
Country | Link |
---|---|
US (1) | USD699199S1 (zh) |
TW (1) | TWD155119S (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWD169790S (zh) * | 2013-07-10 | 2015-08-11 | 日立國際電氣股份有限公司 | 基板處理裝置用氣化器之部分 |
USD795315S1 (en) * | 2014-12-12 | 2017-08-22 | Ebara Corporation | Dresser disk |
USD793971S1 (en) | 2015-03-27 | 2017-08-08 | Veeco Instruments Inc. | Wafer carrier with a 14-pocket configuration |
USD793972S1 (en) | 2015-03-27 | 2017-08-08 | Veeco Instruments Inc. | Wafer carrier with a 31-pocket configuration |
USD778247S1 (en) * | 2015-04-16 | 2017-02-07 | Veeco Instruments Inc. | Wafer carrier with a multi-pocket configuration |
JP1545222S (zh) * | 2015-06-10 | 2016-03-07 | ||
TWD178425S (zh) * | 2016-01-08 | 2016-09-21 | Asm Ip Holding Bv | 用於半導體製造設備的電極板 |
JP1584241S (zh) * | 2017-01-31 | 2017-08-21 | ||
JP1584906S (zh) * | 2017-01-31 | 2017-08-28 | ||
JP1584784S (zh) * | 2017-01-31 | 2017-08-28 | ||
USD870719S1 (en) * | 2018-05-23 | 2019-12-24 | Annex Products Pty. Ltd. | Adhesive base |
JP1643123S (zh) | 2018-07-25 | 2019-10-07 | ||
JP1642983S (zh) | 2018-07-25 | 2019-10-07 | ||
JP1643124S (zh) | 2018-07-25 | 2019-10-07 | ||
JP1643125S (zh) | 2018-07-25 | 2019-10-07 | ||
JP1642984S (zh) | 2018-07-25 | 2019-10-07 | ||
USD904305S1 (en) * | 2019-02-25 | 2020-12-08 | Petram Technologies, Inc. | Electrode cage for a plasma blasting probe |
-
2012
- 2012-03-29 US US29/417,062 patent/USD699199S1/en active Active
- 2012-03-30 TW TW101301746F patent/TWD155119S/zh unknown
Also Published As
Publication number | Publication date |
---|---|
USD699199S1 (en) | 2014-02-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWD155119S (zh) | 電漿處理裝置用電極板 | |
TWD155120S (zh) | 電漿處理裝置用電極構件 | |
TWD155015S (zh) | 聚焦環 | |
TWD155016S (zh) | 聚焦環 | |
TWD154352S (zh) | 聚焦環 | |
TWD177427S (zh) | 電漿處理裝置用電極板 | |
TWD154353S (zh) | 聚焦環 | |
TWD138225S1 (zh) | 半導體晶圓研磨裝置用彈性膜 | |
TWD178425S (zh) | 用於半導體製造設備的電極板 | |
EP2750174A3 (en) | Bonding apparatus and bonding process method | |
TWD197827S (zh) | 半導體晶圓研磨用彈性膜 | |
TWD156030S (zh) | 電漿處理裝置用內襯材 | |
GB2491930B (en) | Method for controlled removal of a semiconductor device layer from a base substrate | |
JP2015510260A5 (zh) | ||
TWD187175S (zh) | 圖案化石英晶圓 | |
TWD171078S (zh) | 基板處理裝置用氣體供給噴嘴之部分 | |
TWD183002S (zh) | 圖案化石英晶圓 | |
MX2015013298A (es) | Dispositivo de reposabrazos ajustable para asegurar en un portavasos de un vehiculo. | |
TWD149222S (zh) | 空腔塊 | |
WO2012016422A8 (zh) | 保温桶及具有该保温桶的立式热处理装置 | |
TWD178422S (zh) | 電漿處理裝置用電極板之部分 | |
TWD164162S (zh) | 半導體晶圓硏磨裝置用彈性膜之部分 | |
TWD167111S (zh) | 半導體晶圓硏磨裝置用彈性膜 | |
SG171503A1 (en) | Vacuum chuck table of semiconductor device cutting apparatus capable of supplying cooling water | |
TWD164163S (zh) | 半導體晶圓硏磨裝置用彈性膜之部分 |