TWD203479S - 基板處理裝置用入口蓋 - Google Patents

基板處理裝置用入口蓋 Download PDF

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Publication number
TWD203479S
TWD203479S TW108303245F TW108303245F TWD203479S TW D203479 S TWD203479 S TW D203479S TW 108303245 F TW108303245 F TW 108303245F TW 108303245 F TW108303245 F TW 108303245F TW D203479 S TWD203479 S TW D203479S
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TW
Taiwan
Prior art keywords
substrate processing
processing device
design
inlet
cover
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TW108303245F
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English (en)
Inventor
加賀谷徹
江端慎也
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日商國際電氣股份有限公司
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Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD203479S publication Critical patent/TWD203479S/zh

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Abstract

【物品用途】;本設計物品係一種蓋，其在處理晶圓的基板處理裝置中，被使用安裝於構成爐口部且具有氣體導入口的入口之內壁面，用於抑制對於入口的副產物之附著。;【設計說明】;本創作係有關於一種基板處理裝置用入口蓋之新穎設計。;本創作之基板處理裝置用入口蓋如附圖所示，其整體外形設計新穎美觀，為根據使用機能所作之最佳與最合理之設計，於申請前未見於刊物亦未公開使用，符合設計專利要件。

Description

基板處理裝置用入口蓋
本設計物品係一種蓋，其在處理晶圓的基板處理裝置中，被使用安裝於構成爐口部且具有氣體導入口的入口之內壁面，用於抑制對於入口的副產物之附著。
本創作係有關於一種基板處理裝置用入口蓋之新穎設計。
本創作之基板處理裝置用入口蓋如附圖所示，其整體外形設計新穎美觀，為根據使用機能所作之最佳與最合理之設計，於申請前未見於刊物亦未公開使用，符合設計專利要件。
TW108303245F 2018-12-06 2019-05-31 基板處理裝置用入口蓋 TWD203479S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2018-26606F JP1638504S (zh) 2018-12-06 2018-12-06
JP2018-026606 2018-12-06

Publications (1)

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TWD203479S true TWD203479S (zh) 2020-03-21

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US (1) USD925481S1 (zh)
JP (1) JP1638504S (zh)
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Cited By (1)

* Cited by examiner, † Cited by third party
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TWD225034S (zh) 2021-03-15 2023-05-01 日商國際電氣股份有限公司 基板處理裝置用遮蔽具

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD225034S (zh) 2021-03-15 2023-05-01 日商國際電氣股份有限公司 基板處理裝置用遮蔽具

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JP1638504S (zh) 2019-08-05
USD925481S1 (en) 2021-07-20

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