TWD207742S - 用於基材處理室的處理遮罩件 - Google Patents

用於基材處理室的處理遮罩件 Download PDF

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Publication number
TWD207742S
TWD207742S TW108304736F TW108304736F TWD207742S TW D207742 S TWD207742 S TW D207742S TW 108304736 F TW108304736 F TW 108304736F TW 108304736 F TW108304736 F TW 108304736F TW D207742 S TWD207742 S TW D207742S
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Taiwan
Prior art keywords
processing chamber
substrate processing
process shield
design
cover
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TW108304736F
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English (en)
Inventor
曼裘那薩Ｐ 高帕
亞拉文德 卡曼司
振雄 蔡
曼裘納斯Ｈ 范卡塔斯瓦瑪帕
史蒂芬Ｖ 珊索尼
傳偉 柯
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美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD207742S publication Critical patent/TWD207742S/zh

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Abstract

【物品用途】;本設計所請求之用於基材處理室的處理遮罩件係用於在基材處理室中作為遮罩件。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。

Description

用於基材處理室的處理遮罩件
本設計所請求之用於基材處理室的處理遮罩件係用於在基材處理室中作為遮罩件。
圖式所揭露之虛線部分，為本案不主張設計之部分。
TW108304736F 2019-02-08 2019-08-08 用於基材處理室的處理遮罩件 TWD207742S (zh)

Applications Claiming Priority (2)

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US29/679,738 USD891382S1 (en) 2019-02-08 2019-02-08 Process shield for a substrate processing chamber
US29/679,738 2019-02-08

Publications (1)

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TWD207742S true TWD207742S (zh) 2020-10-11

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TW108304736F TWD207742S (zh) 2019-02-08 2019-08-08 用於基材處理室的處理遮罩件

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TW (1) TWD207742S (zh)

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Cited By (3)

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TWD220836S (zh) 2020-12-22 2022-09-01 美商應用材料股份有限公司 處理腔室部件的包裝插件
TWD224466S (zh) 2020-12-22 2023-04-01 美商應用材料股份有限公司 處理腔室部件的包裝插件
USD984895S1 (en) 2020-12-22 2023-05-02 Applied Materials, Inc. Packaging insert for a process chamber component

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