TWD214316S - 基板處理腔室的內部護罩 - Google Patents

基板處理腔室的內部護罩 Download PDF

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Publication number
TWD214316S
TWD214316S TW109300959F TW109300959F TWD214316S TW D214316 S TWD214316 S TW D214316S TW 109300959 F TW109300959 F TW 109300959F TW 109300959 F TW109300959 F TW 109300959F TW D214316 S TWD214316 S TW D214316S
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Taiwan
Prior art keywords
processing chamber
substrate processing
inner shield
design
sectional
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Application number
TW109300959F
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English (en)
Inventor
薩拉斯 巴布
安恩克斯納 朱普迪
岳生 歐
魏俊琪
泰銘 莫
和田優一
康 張
Original Assignee
美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD214316S publication Critical patent/TWD214316S/zh

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Abstract

【物品用途】;本設計請求具有視覺效果之用於基板處理腔室的內部護罩。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。;剖面視圖為俯視圖中依據16-16之截線所取之剖面圖。

Description

基板處理腔室的內部護罩
本設計請求具有視覺效果之用於基板處理腔室的內部護罩。
圖式所揭露之虛線部分，為本案不主張設計之部分。
剖面視圖為俯視圖中依據16-16之截線所取之剖面圖。
TW109300959F 2019-08-28 2020-02-27 基板處理腔室的內部護罩 TWD214316S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/703,655 2019-08-28
US29/703,655 USD913979S1 (en) 2019-08-28 2019-08-28 Inner shield for a substrate processing chamber

Publications (1)

Publication Number Publication Date
TWD214316S true TWD214316S (zh) 2021-10-01

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TW109300959F TWD214316S (zh) 2019-08-28 2020-02-27 基板處理腔室的內部護罩
TW110301539F TWD218527S (zh) 2019-08-28 2020-02-27 基板處理腔室的內部護罩

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TW110301539F TWD218527S (zh) 2019-08-28 2020-02-27 基板處理腔室的內部護罩

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US (1) USD913979S1 (zh)
JP (2) JP1683051S (zh)
TW (2) TWD214316S (zh)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD227251S (zh) 2022-01-20 2023-09-01 美商應用材料股份有限公司 基板處理腔室用的基板支撐件
TWD227252S (zh) 2022-01-20 2023-09-01 美商應用材料股份有限公司 基板處理腔室用的基板支撐件

Also Published As

Publication number Publication date
JP1683107S (zh) 2021-04-12
USD913979S1 (en) 2021-03-23
TWD218527S (zh) 2022-05-01
JP1683051S (zh) 2021-04-12

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