TWD218527S - 基板處理腔室的內部護罩 - Google Patents

基板處理腔室的內部護罩 Download PDF

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Publication number
TWD218527S
TWD218527S TW110301539F TW110301539F TWD218527S TW D218527 S TWD218527 S TW D218527S TW 110301539 F TW110301539 F TW 110301539F TW 110301539 F TW110301539 F TW 110301539F TW D218527 S TWD218527 S TW D218527S
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Taiwan
Prior art keywords
substrate processing
processing chamber
inner shield
design
sectional
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TW110301539F
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English (en)
Inventor
薩拉斯 巴布
安恩克斯納 朱普迪
岳生 歐
魏俊琪
泰銘 莫
和田優一
康 張
Original Assignee
美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD218527S publication Critical patent/TWD218527S/zh

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Abstract

【物品用途】;本設計請求具有視覺效果之用於基板處理腔室的內部護罩。;【設計說明】;圖式所揭露之虛線部分,為本案不主張設計之部分。;剖面視圖為俯視圖中依據8-8之截線所取之剖面圖。

Description

基板處理腔室的內部護罩
本設計請求具有視覺效果之用於基板處理腔室的內部護罩。
圖式所揭露之虛線部分,為本案不主張設計之部分。
剖面視圖為俯視圖中依據8-8之截線所取之剖面圖。
TW110301539F 2019-08-28 2020-02-27 基板處理腔室的內部護罩 TWD218527S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/703,655 USD913979S1 (en) 2019-08-28 2019-08-28 Inner shield for a substrate processing chamber
US29/703,655 2019-08-28

Publications (1)

Publication Number Publication Date
TWD218527S true TWD218527S (zh) 2022-05-01

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TW110301539F TWD218527S (zh) 2019-08-28 2020-02-27 基板處理腔室的內部護罩
TW109300959F TWD214316S (zh) 2019-08-28 2020-02-27 基板處理腔室的內部護罩

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TW109300959F TWD214316S (zh) 2019-08-28 2020-02-27 基板處理腔室的內部護罩

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US (1) USD913979S1 (zh)
JP (2) JP1683107S (zh)
TW (2) TWD218527S (zh)

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USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD997111S1 (en) * 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
JP1733480S (ja) 2022-01-20 2022-12-28 基板処理チャンバ用基板支持体

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Publication number Publication date
USD913979S1 (en) 2021-03-23
JP1683051S (zh) 2021-04-12
JP1683107S (zh) 2021-04-12
TWD214316S (zh) 2021-10-01

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