TWD220838S - 用於基板處理腔室的限制板 - Google Patents

用於基板處理腔室的限制板 Download PDF

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Publication number
TWD220838S
TWD220838S TW110303814F TW110303814F TWD220838S TW D220838 S TWD220838 S TW D220838S TW 110303814 F TW110303814 F TW 110303814F TW 110303814 F TW110303814 F TW 110303814F TW D220838 S TWD220838 S TW D220838S
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TW
Taiwan
Prior art keywords
substrate processing
processing chamber
confinement plate
design
sectional
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TW110303814F
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English (en)
Inventor
喬瑟夫 佩里
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美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD220838S publication Critical patent/TWD220838S/zh

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Abstract

【物品用途】;本設計請求具有視覺效果之用於基板處理腔室的限制板。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。;放大剖面圖為俯視圖中依據8-8之截線所取之剖面圖。

Description

用於基板處理腔室的限制板
本設計請求具有視覺效果之用於基板處理腔室的限制板。
圖式所揭露之虛線部分，為本案不主張設計之部分。
放大剖面圖為俯視圖中依據8-8之截線所取之剖面圖。
TW110303814F 2020-03-19 2020-09-16 用於基板處理腔室的限制板 TWD220838S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/728,616 USD943539S1 (en) 2020-03-19 2020-03-19 Confinement plate for a substrate processing chamber
US29/728,616 2020-03-19

Publications (1)

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TWD220838S true TWD220838S (zh) 2022-09-01

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TW110303814F TWD220838S (zh) 2020-03-19 2020-09-16 用於基板處理腔室的限制板
TW109305190F TWD216905S (zh) 2020-03-19 2020-09-16 用於基板處理腔室的限制板

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US (2) USD943539S1 (zh)
JP (2) JP1698489S (zh)
TW (2) TWD220838S (zh)

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Publication number Publication date
JP1686348S (zh) 2021-05-31
JP1698489S (zh) 2021-11-01
USD986190S1 (en) 2023-05-16
USD943539S1 (en) 2022-02-15
TWD216905S (zh) 2022-02-01

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