TWD227107S - 用於半導體製程的氣體分佈板 - Google Patents

用於半導體製程的氣體分佈板 Download PDF

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Publication number
TWD227107S
TWD227107S TW112302110F TW112302110F TWD227107S TW D227107 S TWD227107 S TW D227107S TW 112302110 F TW112302110 F TW 112302110F TW 112302110 F TW112302110 F TW 112302110F TW D227107 S TWD227107 S TW D227107S
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TW
Taiwan
Prior art keywords
gas distribution
distribution plate
semiconductor process
design
dotted line
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Application number
TW112302110F
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English (en)
Inventor
普拉哈洛德 顏加爾
珍妮史特 格爾查
卡提克 薛
王朝偉
桑傑夫 巴魯札
Original Assignee
美商應用材料股份有限公司
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Publication of TWD227107S publication Critical patent/TWD227107S/zh

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Abstract

【物品用途】;本設計所請為具有視覺效果之氣體分佈板。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。

Description

用於半導體製程的氣體分佈板
本設計所請為具有視覺效果之氣體分佈板。
圖式所揭露之虛線部分，為本案不主張設計之部分。
TW112302110F 2022-04-11 2022-10-11 用於半導體製程的氣體分佈板 TWD227107S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/834,288 USD1071103S1 (en) 2022-04-11 2022-04-11 Gas distribution plate
US29/834,288 2022-04-11

Publications (1)

Publication Number Publication Date
TWD227107S true TWD227107S (zh) 2023-08-11

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TW111305092F TWD227156S (zh) 2022-04-11 2022-10-11 用於半導體製程的氣體分佈板
TW111305092D01F TWD227157S (zh) 2022-04-11 2022-10-11 用於半導體製程的氣體分佈板
TW112302110F TWD227107S (zh) 2022-04-11 2022-10-11 用於半導體製程的氣體分佈板

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TW111305092F TWD227156S (zh) 2022-04-11 2022-10-11 用於半導體製程的氣體分佈板
TW111305092D01F TWD227157S (zh) 2022-04-11 2022-10-11 用於半導體製程的氣體分佈板

Country Status (3)

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US (1) USD1071103S1 (zh)
JP (3) JP1755398S (zh)
TW (3) TWD227156S (zh)

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Also Published As

Publication number Publication date
USD1071103S1 (en) 2025-04-15
TWD227156S (zh) 2023-08-21
JP1755398S (ja) 2023-10-16
JP1755391S (ja) 2023-10-16
TWD227157S (zh) 2023-08-21
JP1755349S (ja) 2023-10-16

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