TWD210894S - 用於基材處理室的處理遮罩件 - Google Patents

用於基材處理室的處理遮罩件 Download PDF

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Publication number
TWD210894S
TWD210894S TW108304735F TW108304735F TWD210894S TW D210894 S TWD210894 S TW D210894S TW 108304735 F TW108304735 F TW 108304735F TW 108304735 F TW108304735 F TW 108304735F TW D210894 S TWD210894 S TW D210894S
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TW
Taiwan
Prior art keywords
processing chamber
substrate processing
process shield
design
cover
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TW108304735F
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English (en)
Inventor
曼裘那薩Ｐ 高帕
亞拉文德 卡曼司
振雄 蔡
曼裘納斯 Ｈ 范卡塔斯瓦瑪帕
史蒂芬Ｖ 珊索尼
傳偉 柯
Original Assignee
美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD210894S publication Critical patent/TWD210894S/zh

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Abstract

【物品用途】;本設計所請求之用於基材處理室的處理遮罩件係用於在基材處理室中作為遮罩件。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。

Description

用於基材處理室的處理遮罩件
本設計所請求之用於基材處理室的處理遮罩件係用於在基材處理室中作為遮罩件。
圖式所揭露之虛線部分，為本案不主張設計之部分。
TW108304735F 2019-02-08 2019-08-08 用於基材處理室的處理遮罩件 TWD210894S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/679,734 USD942516S1 (en) 2019-02-08 2019-02-08 Process shield for a substrate processing chamber
US29/679,734 2019-02-08

Publications (1)

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TWD210894S true TWD210894S (zh) 2021-04-11

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TW108304735F TWD210894S (zh) 2019-02-08 2019-08-08 用於基材處理室的處理遮罩件
TW108304735D01F TWD210895S (zh) 2019-02-08 2019-08-08 用於基材處理室的處理遮罩件

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TW108304735D01F TWD210895S (zh) 2019-02-08 2019-08-08 用於基材處理室的處理遮罩件

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US (1) USD942516S1 (zh)
TW (2) TWD210894S (zh)

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TWD210895S (zh) 2021-04-11
USD942516S1 (en) 2022-02-01

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