JP1494712S - - Google Patents
Info
- Publication number
- JP1494712S JP1494712S JPD2013-10671F JP2013010671F JP1494712S JP 1494712 S JP1494712 S JP 1494712S JP 2013010671 F JP2013010671 F JP 2013010671F JP 1494712 S JP1494712 S JP 1494712S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2013-10671F JP1494712S (zh) | 2013-05-15 | 2013-05-15 | |
US29/472,350 USD766849S1 (en) | 2013-05-15 | 2013-11-12 | Substrate retaining ring |
TW102307326F TWD167109S (zh) | 2013-05-15 | 2013-11-14 | 基板保持環 |
US29/573,831 USD793976S1 (en) | 2013-05-15 | 2016-08-10 | Substrate retaining ring |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2013-10671F JP1494712S (zh) | 2013-05-15 | 2013-05-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP1494712S true JP1494712S (zh) | 2017-04-03 |
Family
ID=58418545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JPD2013-10671F Active JP1494712S (zh) | 2013-05-15 | 2013-05-15 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP1494712S (zh) |
TW (1) | TWD167109S (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD981459S1 (en) | 2021-06-16 | 2023-03-21 | Ebara Corporation | Retaining ring for substrate |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3210105U (ja) | 2016-03-04 | 2017-04-27 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | ユニバーサルプロセスキット |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD942516S1 (en) | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD931241S1 (en) | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
US11996315B2 (en) | 2020-11-18 | 2024-05-28 | Applied Materials, Inc. | Thin substrate handling via edge clamping |
-
2013
- 2013-05-15 JP JPD2013-10671F patent/JP1494712S/ja active Active
- 2013-11-14 TW TW102307326F patent/TWD167109S/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD981459S1 (en) | 2021-06-16 | 2023-03-21 | Ebara Corporation | Retaining ring for substrate |
Also Published As
Publication number | Publication date |
---|---|
TWD167109S (zh) | 2015-04-11 |