TWD166552S - 基板處理裝置用氣化器 - Google Patents

基板處理裝置用氣化器

Info

Publication number
TWD166552S
TWD166552S TW102305014F TW102305014F TWD166552S TW D166552 S TWD166552 S TW D166552S TW 102305014 F TW102305014 F TW 102305014F TW 102305014 F TW102305014 F TW 102305014F TW D166552 S TWD166552 S TW D166552S
Authority
TW
Taiwan
Prior art keywords
design
vaporizer
substrate processing
view
processing equipment
Prior art date
Application number
TW102305014F
Other languages
English (en)
Inventor
Hideto Tateno
Atsushi Umekawa
Tadashi Kontani
Masahisa Okuno
Takuya Joda
Original Assignee
日立國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司 filed Critical 日立國際電氣股份有限公司
Publication of TWD166552S publication Critical patent/TWD166552S/zh

Links

Abstract

【物品用途】;本設計的物品是基板處理裝置用氣化器，設在處理晶圓用的基板處理裝置內，使處理液(H2O2液)氣化的氣化器。;【設計說明】;本設計的物品，如使用狀態參考圖所示，是配置在支撐基板的晶舟上；再者，比本設計的物品的突出部更下方的部分，是進入到形成在晶舟的孔；藉此，當晶舟移動時，可防止本設計的物品的位置偏移或脫落。;後視圖與前視圖相同，後視圖省略。;右側視圖與左側視圖相對稱，右側視圖省略。
TW102305014F 2013-01-25 2013-07-23 基板處理裝置用氣化器 TWD166552S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013001375 2013-01-25

Publications (1)

Publication Number Publication Date
TWD166552S true TWD166552S (zh) 2015-03-11

Family

ID=89712183

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102305014F TWD166552S (zh) 2013-01-25 2013-07-23 基板處理裝置用氣化器

Country Status (1)

Country Link
TW (1) TWD166552S (zh)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD933725S1 (en) 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD942516S1 (en) 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD859333S1 (en) 2018-03-16 2019-09-10 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD933725S1 (en) 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD942516S1 (en) 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1110975S1 (en) 2022-01-12 2026-02-03 Applied Materials Inc. Collimator for a physical vapor deposition (PVD) chamber

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