TWD212933S - 用於處理腔室基板支撐件的基底板 - Google Patents
用於處理腔室基板支撐件的基底板 Download PDFInfo
- Publication number
- TWD212933S TWD212933S TW108308059F TW108308059F TWD212933S TW D212933 S TWD212933 S TW D212933S TW 108308059 F TW108308059 F TW 108308059F TW 108308059 F TW108308059 F TW 108308059F TW D212933 S TWD212933 S TW D212933S
- Authority
- TW
- Taiwan
- Prior art keywords
- base plate
- processing chamber
- sectional
- cross
- chamber substrate
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract description 3
- 230000000007 visual effect Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 1
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Abstract
【物品用途】;本設計請求具有視覺效果之用於處理腔室基板支撐件的基底板。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。;剖面視圖為俯視圖中依據9-9之截線所取之剖面圖。;另一剖面視圖為俯視圖中依據10-10之截線所取之剖面圖。
Description
本設計請求具有視覺效果之用於處理腔室基板支撐件的基底板。
圖式所揭露之虛線部分，為本案不主張設計之部分。
剖面視圖為俯視圖中依據9-9之截線所取之剖面圖。
另一剖面視圖為俯視圖中依據10-10之截線所取之剖面圖。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/696,587 USD893441S1 (en) | 2019-06-28 | 2019-06-28 | Base plate for a processing chamber substrate support |
| US29/696,587 | 2019-06-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD212933S true TWD212933S (zh) | 2021-08-01 |
Family
ID=71995712
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108308059F TWD212933S (zh) | 2019-06-28 | 2019-12-27 | 用於處理腔室基板支撐件的基底板 |
| TW108308059D01F TWD214516S (zh) | 2019-06-28 | 2019-12-27 | 用於處理腔室基板支撐件的基底板 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108308059D01F TWD214516S (zh) | 2019-06-28 | 2019-12-27 | 用於處理腔室基板支撐件的基底板 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD893441S1 (zh) |
| JP (2) | JP1679911S (zh) |
| TW (2) | TWD212933S (zh) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9412521B2 (en) | 2005-04-07 | 2016-08-09 | American Radionic Company, Inc. | Capacitor with multiple elements for multiple replacement applications |
| US11183338B2 (en) | 2005-04-07 | 2021-11-23 | Amrad Manufacturing, Llc | Capacitor with multiple elements for multiple replacement applications |
| US7203053B2 (en) | 2005-04-07 | 2007-04-10 | American Radionic Company, Inc. | Capacitor for multiple replacement applications |
| US11183336B2 (en) | 2005-04-07 | 2021-11-23 | Amrad Manufacturing, Llc | Capacitor with multiple elements for multiple replacement applications |
| US11183337B1 (en) | 2005-04-07 | 2021-11-23 | Amrad Manufacturing, Llc | Capacitor with multiple elements for multiple replacement applications |
| US7952854B2 (en) | 2006-12-29 | 2011-05-31 | American Radionic Company, Inc. | Electrolytic capacitor |
| WO2014190072A1 (en) | 2013-05-21 | 2014-11-27 | American Radionic Company, Inc. | Power factor correction capacitors |
| US11195663B2 (en) | 2017-05-12 | 2021-12-07 | Amrad Manufacturing, Llc | Capacitor with multiple elements for multiple replacement applications |
| USD868124S1 (en) | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| US11424077B1 (en) | 2017-12-13 | 2022-08-23 | Amrad Manufacturing, Llc | Hard start kit for multiple replacement applications |
| US10586655B1 (en) | 2018-12-28 | 2020-03-10 | American Radionic Company, Inc. | Capacitor with multiple elements for multiple replacement applications |
| USD941754S1 (en) * | 2019-03-29 | 2022-01-25 | Weidmüller Interface GmbH & Co. KG | Wallbox and power outlet |
| US11887878B2 (en) | 2019-06-28 | 2024-01-30 | Applied Materials, Inc. | Detachable biasable electrostatic chuck for high temperature applications |
| USD908645S1 (en) * | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
| USD931241S1 (en) * | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
| USD913979S1 (en) * | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
| US11551960B2 (en) | 2020-01-30 | 2023-01-10 | Applied Materials, Inc. | Helical plug for reduction or prevention of arcing in a substrate support |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD947914S1 (en) * | 2020-11-23 | 2022-04-05 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
| USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD975010S1 (en) * | 2020-12-28 | 2023-01-10 | Philip Morris Products S.A. | Charger for an aerosol generating device |
| USD985362S1 (en) * | 2021-04-12 | 2023-05-09 | Youjun HU | Base bracket |
| CA3157689A1 (en) | 2021-04-30 | 2022-10-30 | Amrad Manufacturing, Llc | Hard start kit for multiple replacement applications |
| USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD193794S (zh) | 2017-11-10 | 2018-11-01 | 日商日立全球先端科技股份有限公司 | Semiconductor manufacturing device uses infrared lamp heater to penetrate window |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD375961S (en) * | 1995-08-03 | 1996-11-26 | American Standard Inc. | Base plate for a refrigeration compressor |
| US6046885A (en) * | 1998-04-03 | 2000-04-04 | Intri-Plex Technologies, Inc. | Base plate suspension assembly in a hard disk drive with step in flange |
| FR2786420B1 (fr) * | 1998-11-30 | 2001-01-05 | Prospection & Inventions | Procede de pose d'une embase de fixation de piece et outil de fixation pour la mise en oeuvre du procede |
| JP3526788B2 (ja) * | 1999-07-01 | 2004-05-17 | 沖電気工業株式会社 | 半導体装置の製造方法 |
| KR20010111058A (ko) | 2000-06-09 | 2001-12-15 | 조셉 제이. 스위니 | 전체 영역 온도 제어 정전기 척 및 그 제조방법 |
| US7324307B2 (en) * | 2002-02-20 | 2008-01-29 | Intri-Plex Technologies, Inc. | Plated base plate for suspension assembly in hard disk drive |
| US7697260B2 (en) | 2004-03-31 | 2010-04-13 | Applied Materials, Inc. | Detachable electrostatic chuck |
| US7589950B2 (en) | 2006-10-13 | 2009-09-15 | Applied Materials, Inc. | Detachable electrostatic chuck having sealing assembly |
| US8476793B2 (en) * | 2008-05-03 | 2013-07-02 | Anthony J. Aiello | Stiffener tab for a spindle motor base plate |
| USD623500S1 (en) * | 2009-04-20 | 2010-09-14 | Armorworks Enterprises, Llc | Tie-down base plate |
| USD707257S1 (en) * | 2012-04-30 | 2014-06-17 | Samhongsa Co., Ltd. | Base plate for spindle motor |
| US9668873B2 (en) * | 2013-03-08 | 2017-06-06 | Biomet Manufacturing, Llc | Modular glenoid base plate with augments |
| US9853579B2 (en) | 2013-12-18 | 2017-12-26 | Applied Materials, Inc. | Rotatable heated electrostatic chuck |
| USD793816S1 (en) * | 2014-08-19 | 2017-08-08 | Frank J Alteslaben | Saucer base plate |
| US9666467B2 (en) | 2014-11-21 | 2017-05-30 | Varian Semiconductor Equipment Associates, Inc. | Detachable high-temperature electrostatic chuck assembly |
| USD847982S1 (en) * | 2016-02-04 | 2019-05-07 | Atos Medical Ab | Heat exchanger base plate |
| JP2019149218A (ja) * | 2018-02-28 | 2019-09-05 | 日本電産株式会社 | ベースプレートおよびベースプレートの製造方法 |
-
2019
- 2019-06-28 US US29/696,587 patent/USD893441S1/en active Active
- 2019-12-27 TW TW108308059F patent/TWD212933S/zh unknown
- 2019-12-27 TW TW108308059D01F patent/TWD214516S/zh unknown
-
2020
- 2020-01-06 JP JPD2020-20290F patent/JP1679911S/ja active Active
- 2020-01-06 JP JPD2020-45F patent/JP1679836S/ja active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD193794S (zh) | 2017-11-10 | 2018-11-01 | 日商日立全球先端科技股份有限公司 | Semiconductor manufacturing device uses infrared lamp heater to penetrate window |
Also Published As
| Publication number | Publication date |
|---|---|
| USD893441S1 (en) | 2020-08-18 |
| JP1679911S (zh) | 2021-02-22 |
| JP1679836S (zh) | 2021-02-22 |
| TWD214516S (zh) | 2021-10-11 |
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