TWD214516S - 用於處理腔室基板支撐件的基底板 - Google Patents

用於處理腔室基板支撐件的基底板 Download PDF

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Publication number
TWD214516S
TWD214516S TW108308059D01F TW108308059D01F TWD214516S TW D214516 S TWD214516 S TW D214516S TW 108308059D01 F TW108308059D01 F TW 108308059D01F TW 108308059D01 F TW108308059D01 F TW 108308059D01F TW D214516 S TWD214516 S TW D214516S
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TW
Taiwan
Prior art keywords
cross
sectional
base plate
processing chamber
view
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Application number
TW108308059D01F
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English (en)
Inventor
席夏尤吉許 勞
慕昆德 桑達拉拉珍
振雄 蔡
曼裘那薩Ｐ 高帕
史蒂芬 珊索尼
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美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD214516S publication Critical patent/TWD214516S/zh

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Abstract

【物品用途】;本設計請求具有視覺效果之用於處理腔室基板支撐件的基底板。;【設計說明】;(圖式包括色彩者，如不主張色彩，應於本欄敘明之);;本設計與原設計在中心處略有不同。;圖式所揭露之虛線部分，為本案不主張設計之部分。;剖面視圖為俯視圖中依據19-19之截線所取之剖面圖。;另一剖面視圖為俯視圖中依據20-20之截線所取之剖面圖。

Description

用於處理腔室基板支撐件的基底板
本設計請求具有視覺效果之用於處理腔室基板支撐件的基底板。
( 圖式包括色彩者，如不主張色彩，應於本欄敘明之)
本設計與原設計在中心處略有不同。
圖式所揭露之虛線部分，為本案不主張設計之部分。
剖面視圖為俯視圖中依據19-19之截線所取之剖面圖。
另一剖面視圖為俯視圖中依據20-20之截線所取之剖面圖。
TW108308059D01F 2019-06-28 2019-12-27 用於處理腔室基板支撐件的基底板 TWD214516S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/696,587 USD893441S1 (en) 2019-06-28 2019-06-28 Base plate for a processing chamber substrate support
US29/696,587 2019-06-28

Publications (1)

Publication Number Publication Date
TWD214516S true TWD214516S (zh) 2021-10-11

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TW108308059D01F TWD214516S (zh) 2019-06-28 2019-12-27 用於處理腔室基板支撐件的基底板
TW108308059F TWD212933S (zh) 2019-06-28 2019-12-27 用於處理腔室基板支撐件的基底板

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US (1) USD893441S1 (zh)
JP (2) JP1679911S (zh)
TW (2) TWD214516S (zh)

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USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
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JP1679911S (zh) 2021-02-22
USD893441S1 (en) 2020-08-18
JP1679836S (zh) 2021-02-22
TWD212933S (zh) 2021-08-01

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