TWD211589S - 基板支撐底座 - Google Patents
基板支撐底座 Download PDFInfo
- Publication number
- TWD211589S TWD211589S TW109306863F TW109306863F TWD211589S TW D211589 S TWD211589 S TW D211589S TW 109306863 F TW109306863 F TW 109306863F TW 109306863 F TW109306863 F TW 109306863F TW D211589 S TWD211589 S TW D211589S
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate support
- support pedestal
- design
- support base
- dotted line
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 title 1
- 230000000007 visual effect Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 1
Images
Abstract
【物品用途】;本設計請求具有視覺效果之基板支撐底座。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。
Description
本設計請求具有視覺效果之基板支撐底座。
圖式所揭露之虛線部分，為本案不主張設計之部分。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/700,012 USD931240S1 (en) | 2019-07-30 | 2019-07-30 | Substrate support pedestal |
| US29/700,012 | 2019-07-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD211589S true TWD211589S (zh) | 2021-05-11 |
Family
ID=72322262
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109300093F TWD213398S (zh) | 2019-07-30 | 2020-01-08 | 基板支撐底座 |
| TW109306863F TWD211589S (zh) | 2019-07-30 | 2020-01-08 | 基板支撐底座 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109300093F TWD213398S (zh) | 2019-07-30 | 2020-01-08 | 基板支撐底座 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD931240S1 (zh) |
| JP (2) | JP1667762S (zh) |
| TW (2) | TWD213398S (zh) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1655453S (zh) * | 2019-06-17 | 2020-03-23 | ||
| USD896767S1 (en) * | 2019-12-02 | 2020-09-22 | Advanced Thermal Solutions, Inc. | Fluid mover enclosure |
| USD956376S1 (en) * | 2019-12-18 | 2022-06-28 | Goldeep Ltd. | Vacuum bag valve |
| USD989012S1 (en) * | 2020-09-17 | 2023-06-13 | Ebara Corporation | Elastic membrane |
| USD990533S1 (en) * | 2020-10-21 | 2023-06-27 | Bryan Ross Schmitt | Sanding table for attachment to a garbage can |
| USD1006768S1 (en) * | 2021-01-07 | 2023-12-05 | Solaero Technologies Corp. | Semiconductor wafer for mosaic solar cell fabrication |
| USD1037778S1 (en) * | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD406852S (en) | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| TWD193203S (zh) | 2016-12-12 | 2018-10-01 | 荏原製作所股份有限公司 | Elastic film for semiconductor wafer polishing |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD490827S1 (en) * | 2002-12-20 | 2004-06-01 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
| KR20070017255A (ko) | 2005-08-06 | 2007-02-09 | 삼성전자주식회사 | 플라즈마 장치의 반도체 기판 고정 장치 |
| KR100854500B1 (ko) | 2007-02-12 | 2008-08-26 | 삼성전자주식회사 | 척 어셈블리 및 이를 구비한 고밀도 플라즈마 설비 |
| JP5022077B2 (ja) | 2007-03-27 | 2012-09-12 | 株式会社アルバック | 成膜装置 |
| USD621804S1 (en) * | 2009-08-07 | 2010-08-17 | Hon Hai Precision Industry Co., Ltd. | PCB for arranging LED lights |
| US8409995B2 (en) | 2009-08-07 | 2013-04-02 | Tokyo Electron Limited | Substrate processing apparatus, positioning method and focus ring installation method |
| JP5183659B2 (ja) | 2010-03-23 | 2013-04-17 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、プログラム及びコンピュータ記憶媒体 |
| USD664249S1 (en) * | 2011-07-01 | 2012-07-24 | Applied Materials, Inc. | Flow blocker plate |
| USD708651S1 (en) * | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
| US9673077B2 (en) * | 2012-07-03 | 2017-06-06 | Watlow Electric Manufacturing Company | Pedestal construction with low coefficient of thermal expansion top |
| US9490150B2 (en) | 2012-07-03 | 2016-11-08 | Applied Materials, Inc. | Substrate support for substrate backside contamination control |
| US9478447B2 (en) | 2012-11-26 | 2016-10-25 | Applied Materials, Inc. | Substrate support with wire mesh plasma containment |
| US9543186B2 (en) | 2013-02-01 | 2017-01-10 | Applied Materials, Inc. | Substrate support with controlled sealing gap |
| TWD163540S (zh) | 2013-03-28 | 2014-10-11 | 平田機工股份有限公司 | 晶圓載入／載出腔用蓋 |
| USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
| USD723077S1 (en) * | 2013-12-03 | 2015-02-24 | Applied Materials, Inc. | Chuck carrier film |
| US9779971B2 (en) | 2014-04-11 | 2017-10-03 | Applied Materials, Inc. | Methods and apparatus for rapidly cooling a substrate |
| US20160002778A1 (en) | 2014-07-03 | 2016-01-07 | Applied Materials, Inc. | Substrate support with more uniform edge purge |
| JP1528261S (zh) | 2014-12-25 | 2016-06-27 | ||
| USD798248S1 (en) * | 2015-06-18 | 2017-09-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| JP1547357S (zh) | 2015-07-27 | 2016-04-11 | ||
| USD813181S1 (en) * | 2016-07-26 | 2018-03-20 | Hitachi Kokusai Electric Inc. | Cover of seal cap for reaction chamber of semiconductor |
| US10435784B2 (en) | 2016-08-10 | 2019-10-08 | Applied Materials, Inc. | Thermally optimized rings |
| USD830981S1 (en) * | 2017-04-07 | 2018-10-16 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate processing apparatus |
| CN109478531B (zh) * | 2017-05-25 | 2023-03-17 | 日本碍子株式会社 | 晶片用基座 |
| TWD197827S (zh) | 2017-12-19 | 2019-06-01 | 日商荏原製作所股份有限公司 | 半導體晶圓研磨用彈性膜 |
| CN110291625A (zh) | 2018-01-19 | 2019-09-27 | 株式会社爱发科 | 加热器基座及处理装置 |
| JP7030006B2 (ja) * | 2018-04-12 | 2022-03-04 | 株式会社ディスコ | 拡張方法及び拡張装置 |
-
2019
- 2019-07-30 US US29/700,012 patent/USD931240S1/en active Active
-
2020
- 2020-01-08 TW TW109300093F patent/TWD213398S/zh unknown
- 2020-01-08 TW TW109306863F patent/TWD211589S/zh unknown
- 2020-01-30 JP JPD2020-1659F patent/JP1667762S/ja active Active
- 2020-01-30 JP JPD2020-1663F patent/JP1667763S/ja active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD406852S (en) | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| TWD193203S (zh) | 2016-12-12 | 2018-10-01 | 荏原製作所股份有限公司 | Elastic film for semiconductor wafer polishing |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1667763S (zh) | 2020-09-07 |
| TWD213398S (zh) | 2021-08-21 |
| USD931240S1 (en) | 2021-09-21 |
| JP1667762S (zh) | 2020-09-07 |
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