USD406852S - Electrostatic chuck with improved spacing mask and workpiece detection device - Google Patents
Electrostatic chuck with improved spacing mask and workpiece detection device Download PDFInfo
- Publication number
- USD406852S USD406852S US29/079,584 US7958497F USD406852S US D406852 S USD406852 S US D406852S US 7958497 F US7958497 F US 7958497F US D406852 S USD406852 S US D406852S
- Authority
- US
- United States
- Prior art keywords
- electrostatic chuck
- detection device
- workpiece detection
- spacing mask
- improved spacing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
FIG. 1 depicts a top view of the electrostatic chuck with improved spacing mask and workpiece detection device;
FIG. 2 depicts an elevation view of the electrostatic chuck when looking up along the y-axis of FIG. 1, the view when looking down along the y-axis, being identical to that of FIG. 2;
FIG. 3 depicts a detailed view of part of a surface and circumferential edge of the electrostatic chuck seen in FIG. 2;
FIG. 4 depicts a bottom view of the electrostatic chuck;
FIG. 5 depicts an elevation view of the electrostatic chuck when looking to the left along the x-axis of FIG. 1; and,
FIG. 6 depicts an elevation view of the electrostatic chuck when looking to the right along the x-axis of FIG. 1.
Claims (1)
- The ornamental design for an electrostatic chuck with improved spacing mask and workpiece detection device, as shown.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/079,584 USD406852S (en) | 1997-11-14 | 1997-11-14 | Electrostatic chuck with improved spacing mask and workpiece detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/079,584 USD406852S (en) | 1997-11-14 | 1997-11-14 | Electrostatic chuck with improved spacing mask and workpiece detection device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD406852S true USD406852S (en) | 1999-03-16 |
Family
ID=71669988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/079,584 Expired - Lifetime USD406852S (en) | 1997-11-14 | 1997-11-14 | Electrostatic chuck with improved spacing mask and workpiece detection device |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD406852S (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD420023S (en) * | 1999-01-09 | 2000-02-01 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| TWD211589S (en) | 2019-07-30 | 2021-05-11 | 美商應用材料股份有限公司 | Substrate support pedestal |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5671116A (en) * | 1995-03-10 | 1997-09-23 | Lam Research Corporation | Multilayered electrostatic chuck and method of manufacture thereof |
| US5691876A (en) * | 1995-01-31 | 1997-11-25 | Applied Materials, Inc. | High temperature polyimide electrostatic chuck |
| US5745332A (en) * | 1996-05-08 | 1998-04-28 | Applied Materials, Inc. | Monopolar electrostatic chuck having an electrode in contact with a workpiece |
-
1997
- 1997-11-14 US US29/079,584 patent/USD406852S/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5691876A (en) * | 1995-01-31 | 1997-11-25 | Applied Materials, Inc. | High temperature polyimide electrostatic chuck |
| US5671116A (en) * | 1995-03-10 | 1997-09-23 | Lam Research Corporation | Multilayered electrostatic chuck and method of manufacture thereof |
| US5745332A (en) * | 1996-05-08 | 1998-04-28 | Applied Materials, Inc. | Monopolar electrostatic chuck having an electrode in contact with a workpiece |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD420023S (en) * | 1999-01-09 | 2000-02-01 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| TWD211589S (en) | 2019-07-30 | 2021-05-11 | 美商應用材料股份有限公司 | Substrate support pedestal |
| TWD213398S (en) | 2019-07-30 | 2021-08-21 | 美商應用材料股份有限公司 | Substrate support pedestal |
| USD931240S1 (en) | 2019-07-30 | 2021-09-21 | Applied Materials, Inc. | Substrate support pedestal |
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