USD425919S - Electrostatic chuck with improved spacing mask and workpiece detection device - Google Patents

Electrostatic chuck with improved spacing mask and workpiece detection device Download PDF

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Publication number
USD425919S
USD425919S US29/079,585 US07958597F USD425919S US D425919 S USD425919 S US D425919S US 07958597 F US07958597 F US 07958597F US D425919 S USD425919 S US D425919S
Authority
US
United States
Prior art keywords
electrostatic chuck
detection device
workpiece detection
spacing mask
improved spacing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/079,585
Inventor
Vincent E. Burkhart
Allen Flanigan
Steven Sansoni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BURKHART, VINCENT E., FLANIGAN, ALLEN, SANSONI, STEVEN
Application granted granted Critical
Publication of USD425919S publication Critical patent/USD425919S/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 depicts a top view of the electrostatic chuck with improved spacing mask and workpiece detection device;
FIG. 2 depicts an elevation view of the electrostatic chuck when looking up along the y-axis of FIG. 1;
FIG. 3 depicts a detailed view of part of a surface and circumferential edge of the electrostatic chuck seen of FIG. 2;
FIG. 4 depicts an elevation view of the electrostatic chuck when looking down along the y-axis of FIG. 1;
FIG. 5 depicts an elevation view of the electrostatic chuck when looking to the left along the x-axis of FIG. 1, the view when looking to the right being a mirror image to that of FIG. 5; and,
FIG. 6 is a bottom view of the electrostatic chuck.

Claims (1)

  1. The ornamental design for an electrostatic chuck with improved spacing mask and workpiece detection device, as shown.
US29/079,585 1997-11-14 Electrostatic chuck with improved spacing mask and workpiece detection device Expired - Lifetime USD425919S (en)

Publications (1)

Publication Number Publication Date
USD425919S true USD425919S (en) 2000-05-30

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Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100003824A1 (en) * 2008-07-07 2010-01-07 Lam Research Corporation Clamped showerhead electrode assembly
US20100252197A1 (en) * 2009-04-07 2010-10-07 Lam Reseach Corporation Showerhead electrode with centering feature
US20110070740A1 (en) * 2009-09-18 2011-03-24 Lam Research Corporation Clamped monolithic showerhead electrode
US20110083809A1 (en) * 2009-10-13 2011-04-14 Lam Research Corporation Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly
US8206506B2 (en) 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
US8221582B2 (en) 2008-07-07 2012-07-17 Lam Research Corporation Clamped monolithic showerhead electrode
US8272346B2 (en) 2009-04-10 2012-09-25 Lam Research Corporation Gasket with positioning feature for clamped monolithic showerhead electrode
US8573152B2 (en) 2010-09-03 2013-11-05 Lam Research Corporation Showerhead electrode
USD795208S1 (en) * 2015-08-18 2017-08-22 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing equipment
USD802472S1 (en) * 2015-08-06 2017-11-14 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing equipment
USD803802S1 (en) * 2015-08-18 2017-11-28 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing equipment
USD931240S1 (en) * 2019-07-30 2021-09-21 Applied Materials, Inc. Substrate support pedestal
USD937329S1 (en) * 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) * 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) * 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD947802S1 (en) 2020-05-20 2022-04-05 Applied Materials, Inc. Replaceable substrate carrier interfacing film
USD984972S1 (en) * 2021-03-29 2023-05-02 Beijing Naura Microelectronics Equipment Co., Ltd. Electrostatic chuck for semiconductor manufacture
USD990533S1 (en) * 2020-10-21 2023-06-27 Bryan Ross Schmitt Sanding table for attachment to a garbage can
USD1007449S1 (en) * 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8796153B2 (en) 2008-07-07 2014-08-05 Lam Research Corporation Clamped monolithic showerhead electrode
US8414719B2 (en) 2008-07-07 2013-04-09 Lam Research Corporation Clamped monolithic showerhead electrode
US8161906B2 (en) 2008-07-07 2012-04-24 Lam Research Corporation Clamped showerhead electrode assembly
US8206506B2 (en) 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
US8221582B2 (en) 2008-07-07 2012-07-17 Lam Research Corporation Clamped monolithic showerhead electrode
US20100003824A1 (en) * 2008-07-07 2010-01-07 Lam Research Corporation Clamped showerhead electrode assembly
US8313805B2 (en) 2008-07-07 2012-11-20 Lam Research Corporation Clamped showerhead electrode assembly
US8402918B2 (en) 2009-04-07 2013-03-26 Lam Research Corporation Showerhead electrode with centering feature
US20100252197A1 (en) * 2009-04-07 2010-10-07 Lam Reseach Corporation Showerhead electrode with centering feature
US8272346B2 (en) 2009-04-10 2012-09-25 Lam Research Corporation Gasket with positioning feature for clamped monolithic showerhead electrode
US8536071B2 (en) 2009-04-10 2013-09-17 Lam Research Corporation Gasket with positioning feature for clamped monolithic showerhead electrode
US8419959B2 (en) 2009-09-18 2013-04-16 Lam Research Corporation Clamped monolithic showerhead electrode
US20110070740A1 (en) * 2009-09-18 2011-03-24 Lam Research Corporation Clamped monolithic showerhead electrode
US9245716B2 (en) 2009-10-13 2016-01-26 Lam Research Corporation Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly
US10262834B2 (en) 2009-10-13 2019-04-16 Lam Research Corporation Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly
US20110083809A1 (en) * 2009-10-13 2011-04-14 Lam Research Corporation Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly
US8573152B2 (en) 2010-09-03 2013-11-05 Lam Research Corporation Showerhead electrode
USD802472S1 (en) * 2015-08-06 2017-11-14 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing equipment
USD795208S1 (en) * 2015-08-18 2017-08-22 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing equipment
USD803802S1 (en) * 2015-08-18 2017-11-28 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing equipment
USD946638S1 (en) * 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD931240S1 (en) * 2019-07-30 2021-09-21 Applied Materials, Inc. Substrate support pedestal
USD937329S1 (en) * 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD970566S1 (en) * 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD947802S1 (en) 2020-05-20 2022-04-05 Applied Materials, Inc. Replaceable substrate carrier interfacing film
USD990533S1 (en) * 2020-10-21 2023-06-27 Bryan Ross Schmitt Sanding table for attachment to a garbage can
USD940765S1 (en) * 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD966357S1 (en) * 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD984972S1 (en) * 2021-03-29 2023-05-02 Beijing Naura Microelectronics Equipment Co., Ltd. Electrostatic chuck for semiconductor manufacture
USD1007449S1 (en) * 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

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