USD420023S - Electrostatic chuck with improved spacing mask and workpiece detection device - Google Patents
Electrostatic chuck with improved spacing mask and workpiece detection device Download PDFInfo
- Publication number
- USD420023S USD420023S US29/098,986 US9898699F USD420023S US D420023 S USD420023 S US D420023S US 9898699 F US9898699 F US 9898699F US D420023 S USD420023 S US D420023S
- Authority
- US
- United States
- Prior art keywords
- electrostatic chuck
- detection device
- workpiece detection
- spacing mask
- improved spacing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
FIG. 1 is a top view of the electrostatic chuck with the improved spacing mask and workpiece detection device;
FIG. 2 is an elevation view of the electrostatic chuck when looking down along the y-axis of FIG. 1;
FIG. 3 is a detailed view of part of the electrostatic chuck seen in FIG. 2;
FIG. 4 is a bottom view of the electrostatic chuck;
FIG. 5 is an elevation view of the electrostatic chuck when looking up along the y-axis of FIG. 1;
FIG. 6 is an elevation view of the electrostatic chuck when looking to the left along the x-axis of FIG. 1; and,
FIG. 7 is an elevation view of the electrostatic chuck when looking to the right along the x-axis in FIG. 1.
Claims (1)
- The ornamental design for an electrostatic chuck with improved spacing mask and workpiece detection device, as shown.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/098,986 USD420023S (en) | 1999-01-09 | 1999-01-09 | Electrostatic chuck with improved spacing mask and workpiece detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/098,986 USD420023S (en) | 1999-01-09 | 1999-01-09 | Electrostatic chuck with improved spacing mask and workpiece detection device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD420023S true USD420023S (en) | 2000-02-01 |
Family
ID=71781377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/098,986 Expired - Lifetime USD420023S (en) | 1999-01-09 | 1999-01-09 | Electrostatic chuck with improved spacing mask and workpiece detection device |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD420023S (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5671116A (en) * | 1995-03-10 | 1997-09-23 | Lam Research Corporation | Multilayered electrostatic chuck and method of manufacture thereof |
| US5691876A (en) * | 1995-01-31 | 1997-11-25 | Applied Materials, Inc. | High temperature polyimide electrostatic chuck |
| US5745332A (en) * | 1996-05-08 | 1998-04-28 | Applied Materials, Inc. | Monopolar electrostatic chuck having an electrode in contact with a workpiece |
| USD406852S (en) * | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
-
1999
- 1999-01-09 US US29/098,986 patent/USD420023S/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5691876A (en) * | 1995-01-31 | 1997-11-25 | Applied Materials, Inc. | High temperature polyimide electrostatic chuck |
| US5671116A (en) * | 1995-03-10 | 1997-09-23 | Lam Research Corporation | Multilayered electrostatic chuck and method of manufacture thereof |
| US5745332A (en) * | 1996-05-08 | 1998-04-28 | Applied Materials, Inc. | Monopolar electrostatic chuck having an electrode in contact with a workpiece |
| USD406852S (en) * | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD947802S1 (en) | 2020-05-20 | 2022-04-05 | Applied Materials, Inc. | Replaceable substrate carrier interfacing film |
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