TWD213398S - Substrate support pedestal - Google Patents
Substrate support pedestal Download PDFInfo
- Publication number
- TWD213398S TWD213398S TW109300093F TW109300093F TWD213398S TW D213398 S TWD213398 S TW D213398S TW 109300093 F TW109300093 F TW 109300093F TW 109300093 F TW109300093 F TW 109300093F TW D213398 S TWD213398 S TW D213398S
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate support
- support pedestal
- design
- support base
- dotted line
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 title 1
- 230000000007 visual effect Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 1
Images
Abstract
【物品用途】;本設計請求具有視覺效果之基板支撐底座。;【設計說明】;圖式所揭露之虛線部分,為本案不主張設計之部分。[Use of item]; This design requires a substrate support base with visual effects. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.
Description
本設計請求具有視覺效果之基板支撐底座。 This design requests a substrate support base with visual effects.
圖式所揭露之虛線部分,為本案不主張設計之部分。 The dotted line exposed in the diagram is the part that is not recommended for design in this case.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/700,012 | 2019-07-30 | ||
US29/700,012 USD931240S1 (en) | 2019-07-30 | 2019-07-30 | Substrate support pedestal |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD213398S true TWD213398S (en) | 2021-08-21 |
Family
ID=72322262
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109300093F TWD213398S (en) | 2019-07-30 | 2020-01-08 | Substrate support pedestal |
TW109306863F TWD211589S (en) | 2019-07-30 | 2020-01-08 | Substrate support pedestal |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109306863F TWD211589S (en) | 2019-07-30 | 2020-01-08 | Substrate support pedestal |
Country Status (3)
Country | Link |
---|---|
US (1) | USD931240S1 (en) |
JP (2) | JP1667763S (en) |
TW (2) | TWD213398S (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1655453S (en) * | 2019-06-17 | 2020-03-23 | ||
USD896767S1 (en) * | 2019-12-02 | 2020-09-22 | Advanced Thermal Solutions, Inc. | Fluid mover enclosure |
USD956376S1 (en) * | 2019-12-18 | 2022-06-28 | Goldeep Ltd. | Vacuum bag valve |
USD989012S1 (en) | 2020-09-17 | 2023-06-13 | Ebara Corporation | Elastic membrane |
USD990533S1 (en) * | 2020-10-21 | 2023-06-27 | Bryan Ross Schmitt | Sanding table for attachment to a garbage can |
USD1006768S1 (en) * | 2021-01-07 | 2023-12-05 | Solaero Technologies Corp. | Semiconductor wafer for mosaic solar cell fabrication |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD406852S (en) | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
USD708651S1 (en) | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD490827S1 (en) * | 2002-12-20 | 2004-06-01 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
KR20070017255A (en) | 2005-08-06 | 2007-02-09 | 삼성전자주식회사 | Apparatus for fixing semiconductor substrates of plasma apparatus |
KR100854500B1 (en) | 2007-02-12 | 2008-08-26 | 삼성전자주식회사 | Chuck assembly and high density plasma equipment having the same |
JP5022077B2 (en) | 2007-03-27 | 2012-09-12 | 株式会社アルバック | Deposition equipment |
US8409995B2 (en) | 2009-08-07 | 2013-04-02 | Tokyo Electron Limited | Substrate processing apparatus, positioning method and focus ring installation method |
USD621804S1 (en) * | 2009-08-07 | 2010-08-17 | Hon Hai Precision Industry Co., Ltd. | PCB for arranging LED lights |
JP5183659B2 (en) | 2010-03-23 | 2013-04-17 | 東京エレクトロン株式会社 | Substrate processing apparatus, substrate processing method, program, and computer storage medium |
USD664249S1 (en) * | 2011-07-01 | 2012-07-24 | Applied Materials, Inc. | Flow blocker plate |
US9673077B2 (en) * | 2012-07-03 | 2017-06-06 | Watlow Electric Manufacturing Company | Pedestal construction with low coefficient of thermal expansion top |
US9490150B2 (en) | 2012-07-03 | 2016-11-08 | Applied Materials, Inc. | Substrate support for substrate backside contamination control |
US9478447B2 (en) | 2012-11-26 | 2016-10-25 | Applied Materials, Inc. | Substrate support with wire mesh plasma containment |
US9543186B2 (en) | 2013-02-01 | 2017-01-10 | Applied Materials, Inc. | Substrate support with controlled sealing gap |
TWD163540S (en) | 2013-03-28 | 2014-10-11 | 平田機工股份有限公司 | Wafer loading/unloading chamber cover |
USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
USD723077S1 (en) * | 2013-12-03 | 2015-02-24 | Applied Materials, Inc. | Chuck carrier film |
US9779971B2 (en) | 2014-04-11 | 2017-10-03 | Applied Materials, Inc. | Methods and apparatus for rapidly cooling a substrate |
US20160002778A1 (en) | 2014-07-03 | 2016-01-07 | Applied Materials, Inc. | Substrate support with more uniform edge purge |
JP1528261S (en) | 2014-12-25 | 2016-06-27 | ||
USD798248S1 (en) * | 2015-06-18 | 2017-09-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
JP1547357S (en) | 2015-07-27 | 2016-04-11 | ||
USD813181S1 (en) * | 2016-07-26 | 2018-03-20 | Hitachi Kokusai Electric Inc. | Cover of seal cap for reaction chamber of semiconductor |
US10435784B2 (en) | 2016-08-10 | 2019-10-08 | Applied Materials, Inc. | Thermally optimized rings |
JP1582993S (en) | 2016-12-12 | 2018-07-30 | ||
USD830981S1 (en) * | 2017-04-07 | 2018-10-16 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate processing apparatus |
WO2018216797A1 (en) * | 2017-05-25 | 2018-11-29 | 日本碍子株式会社 | Susceptor for wafer |
TWD197827S (en) | 2017-12-19 | 2019-06-01 | 日商荏原製作所股份有限公 | Elastic film for semiconductor wafer polishing |
CN110291625A (en) | 2018-01-19 | 2019-09-27 | 株式会社爱发科 | Heater pedestal and processing unit |
JP7030006B2 (en) * | 2018-04-12 | 2022-03-04 | 株式会社ディスコ | Expansion method and expansion device |
-
2019
- 2019-07-30 US US29/700,012 patent/USD931240S1/en active Active
-
2020
- 2020-01-08 TW TW109300093F patent/TWD213398S/en unknown
- 2020-01-08 TW TW109306863F patent/TWD211589S/en unknown
- 2020-01-30 JP JPD2020-1663F patent/JP1667763S/ja active Active
- 2020-01-30 JP JPD2020-1659F patent/JP1667762S/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD406852S (en) | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
USD708651S1 (en) | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
Also Published As
Publication number | Publication date |
---|---|
TWD211589S (en) | 2021-05-11 |
USD931240S1 (en) | 2021-09-21 |
JP1667763S (en) | 2020-09-07 |
JP1667762S (en) | 2020-09-07 |
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