TWD215399S - 基板處理腔室的製程護罩 - Google Patents

基板處理腔室的製程護罩 Download PDF

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Publication number
TWD215399S
TWD215399S TW109305205D01F TW109305205D01F TWD215399S TW D215399 S TWD215399 S TW D215399S TW 109305205D01 F TW109305205D01 F TW 109305205D01F TW 109305205D01 F TW109305205D01 F TW 109305205D01F TW D215399 S TWD215399 S TW D215399S
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TW
Taiwan
Prior art keywords
design
processing chamber
substrate processing
process shield
derivative
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Application number
TW109305205D01F
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English (en)
Inventor
伊利亞 拉維斯基
凱斯Ａ 米勒
吉留剛一
Original Assignee
美商應用材料股份有限公司
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Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD215399S publication Critical patent/TWD215399S/zh

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Abstract

【物品用途】;本衍生設計所請求之基板處理腔室的製程護罩係用於半導體製程。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。;本衍生設計與原設計不同之處在於以虛線呈現部分的外觀。

Description

基板處理腔室的製程護罩
本衍生設計所請求之基板處理腔室的製程護罩係用於半導體製程。
圖式所揭露之虛線部分，為本案不主張設計之部分。
本衍生設計與原設計不同之處在於以虛線呈現部分的外觀。
TW109305205D01F 2020-03-20 2020-09-17 基板處理腔室的製程護罩 TWD215399S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/728,821 2020-03-20
US29/728,821 USD941372S1 (en) 2020-03-20 2020-03-20 Process shield for a substrate processing chamber

Publications (1)

Publication Number Publication Date
TWD215399S true TWD215399S (zh) 2021-11-21

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TW109305205D01F TWD215399S (zh) 2020-03-20 2020-09-17 基板處理腔室的製程護罩
TW109305205F TWD215398S (zh) 2020-03-20 2020-09-17 基板處理腔室的製程護罩

Family Applications After (1)

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TW109305205F TWD215398S (zh) 2020-03-20 2020-09-17 基板處理腔室的製程護罩

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US (1) USD941372S1 (zh)
JP (2) JP1696759S (zh)
TW (2) TWD215399S (zh)

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Also Published As

Publication number Publication date
JP1696764S (zh) 2021-10-11
TWD215398S (zh) 2021-11-21
USD941372S1 (en) 2022-01-18
JP1696759S (zh) 2021-10-11

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