USD361752S
(en)
*
|
1993-09-17 |
1995-08-29 |
Tokyo Electron Kasbushiki Kaisha |
Wafer boat or rack for holding semiconductor wafers
|
USD366868S
(en)
*
|
1993-09-29 |
1996-02-06 |
Tokyo Electron Kabushiki Kaisha |
Wafer boat or rack
|
USD378675S
(en)
*
|
1995-05-30 |
1997-04-01 |
Tokyo Electron Limited |
Wafer boat
|
USD380454S
(en)
*
|
1995-05-30 |
1997-07-01 |
Tokyo Electron Limited |
Wafer boat
|
USD378823S
(en)
*
|
1995-05-30 |
1997-04-15 |
Tokyo Electron Limited |
Wafer boat
|
JP3122364B2
(ja)
*
|
1996-02-06 |
2001-01-09 |
東京エレクトロン株式会社 |
ウエハボート
|
TW325588B
(en)
*
|
1996-02-28 |
1998-01-21 |
Asahi Glass Co Ltd |
Vertical wafer boat
|
US6062853A
(en)
*
|
1996-02-29 |
2000-05-16 |
Tokyo Electron Limited |
Heat-treating boat for semiconductor wafers
|
USD404015S
(en)
*
|
1997-01-31 |
1999-01-12 |
Tokyo Electron Ltd. |
Wafer boat for use in a semiconductor wafer heat processing apparatus
|
USD411176S
(en)
*
|
1997-08-20 |
1999-06-22 |
Tokyo Electron Limited |
Wafer boat for use in a semiconductor wafer heat processing apparatus
|
USD404371S
(en)
*
|
1997-08-20 |
1999-01-19 |
Tokyo Electron Limited |
Wafer boat for use in a semiconductor wafer heat processing apparatus
|
USD409158S
(en)
*
|
1997-08-20 |
1999-05-04 |
Tokyo Electron Limited |
Wafer boat for use in a semiconductor wafer heat processing apparatus
|
KR20000002833A
(ko)
*
|
1998-06-23 |
2000-01-15 |
윤종용 |
반도체 웨이퍼 보트
|
US6099645A
(en)
*
|
1999-07-09 |
2000-08-08 |
Union Oil Company Of California |
Vertical semiconductor wafer carrier with slats
|
US6287112B1
(en)
*
|
2000-03-30 |
2001-09-11 |
Asm International, N.V. |
Wafer boat
|
US6341935B1
(en)
*
|
2000-06-14 |
2002-01-29 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Wafer boat having improved wafer holding capability
|
US20020130061A1
(en)
*
|
2000-11-02 |
2002-09-19 |
Hengst Richard R. |
Apparatus and method of making a slip free wafer boat
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KR100410982B1
(ko)
*
|
2001-01-18 |
2003-12-18 |
삼성전자주식회사 |
반도체 제조장치용 보트
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JP2002324830A
(ja)
*
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2001-02-20 |
2002-11-08 |
Mitsubishi Electric Corp |
基板熱処理用保持具、基板熱処理装置、半導体装置の製造方法、基板熱処理用保持具の製造方法及び基板熱処理用保持具の構造決定方法
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JP4467028B2
(ja)
*
|
2001-05-11 |
2010-05-26 |
信越石英株式会社 |
縦型ウェーハ支持治具
|
US6811040B2
(en)
*
|
2001-07-16 |
2004-11-02 |
Rohm And Haas Company |
Wafer holding apparatus
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JP4506125B2
(ja)
*
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2003-07-16 |
2010-07-21 |
信越半導体株式会社 |
熱処理用縦型ボート及びその製造方法
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US20050145584A1
(en)
*
|
2004-01-06 |
2005-07-07 |
Buckley Richard F. |
Wafer boat with interference fit wafer supports
|
CN101326623B
(zh)
*
|
2005-12-06 |
2011-04-20 |
富士通微电子株式会社 |
半导体晶片的容置盒以及半导体晶片的容置方法
|
USD570308S1
(en)
*
|
2006-05-01 |
2008-06-03 |
Tokyo Electron Limited |
Wafer boat
|
USD580894S1
(en)
*
|
2006-05-01 |
2008-11-18 |
Tokyo Electron Limited |
Wafer boat
|
USD570309S1
(en)
*
|
2006-10-25 |
2008-06-03 |
Tokyo Electron Limited |
Wafer boat
|
USD600222S1
(en)
*
|
2008-03-28 |
2009-09-15 |
Tokyo Electron Limited |
Wafer boat
|
USD600221S1
(en)
*
|
2008-03-28 |
2009-09-15 |
Tokyo Electron Limited |
Wafer boat
|
USD616396S1
(en)
*
|
2009-03-12 |
2010-05-25 |
Tokyo Electron Limited |
Pedestal of heat insulating cylinder for manufacturing semiconductor wafers
|
USD655682S1
(en)
*
|
2010-06-18 |
2012-03-13 |
Hitachi Kokusai Electric Inc. |
Boat of wafer processing apparatus
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USD655255S1
(en)
*
|
2010-06-18 |
2012-03-06 |
Hitachi Kokusai Electric Inc. |
Boat of wafer processing apparatus
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TWD161688S
(zh)
*
|
2012-12-27 |
2014-07-11 |
日立國際電氣股份有限公司 |
半導體製造裝置用晶舟
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TWD168827S
(zh)
*
|
2013-07-29 |
2015-07-01 |
日立國際電氣股份有限公司 |
半導體製造裝置用晶舟
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TWD165429S
(zh)
*
|
2013-07-29 |
2015-01-11 |
日立國際電氣股份有限公司 |
半導體製造裝置用晶舟
|
TWD167988S
(zh)
*
|
2013-07-29 |
2015-05-21 |
日立國際電氣股份有限公司 |
半導體製造裝置用晶舟
|
KR20160026572A
(ko)
|
2014-09-01 |
2016-03-09 |
삼성전자주식회사 |
기판 처리 장치
|
JP1563649S
(zh)
*
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2016-02-12 |
2016-11-21 |
|
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JP6469046B2
(ja)
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2016-07-15 |
2019-02-13 |
クアーズテック株式会社 |
縦型ウエハボート
|
US11521876B2
(en)
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2018-03-07 |
2022-12-06 |
Tokyo Electron Limited |
Horizontal substrate boat
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USD846514S1
(en)
*
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2018-05-03 |
2019-04-23 |
Kokusai Electric Corporation |
Boat of substrate processing apparatus
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CN110246791B
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2019-05-20 |
2022-10-28 |
武汉新芯集成电路制造有限公司 |
一种晶圆传送装置、去除杂质的设备及去除杂质的方法
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