TWD168827S - 半導體製造裝置用晶舟 - Google Patents
半導體製造裝置用晶舟Info
- Publication number
- TWD168827S TWD168827S TW103300468D01F TW103300468D01F TWD168827S TW D168827 S TWD168827 S TW D168827S TW 103300468D01 F TW103300468D01 F TW 103300468D01F TW 103300468D01 F TW103300468D01 F TW 103300468D01F TW D168827 S TWD168827 S TW D168827S
- Authority
- TW
- Taiwan
- Prior art keywords
- design
- view
- manufacturing equipment
- derivative
- semiconductor wafer
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 210000000078 claw Anatomy 0.000 abstract 2
- 239000010453 quartz Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是半導體製造裝置用晶舟,為一種半導體晶圓施行成膜時,用以將半導體晶圓水平地保持在反應室內的晶舟。;【設計說明】;如B-B放大剖面圖所示,將半導體晶圓載置在前方左右形成梳子狀的爪部、和形成在後方左右之支柱部的梳子狀段差部。本物品是由石英製成。;本衍生設計與原設計之外觀差異在於:如立體圖及前視圖、左、右側視圖所示,本衍生案的爪部具有一條細長狀的貫穿槽,原設計案並無此貫穿槽設計,故本案與原設計案之差異些微,不影響原設計與衍生設計之近似。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013017234 | 2013-07-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD168827S true TWD168827S (zh) | 2015-07-01 |
Family
ID=55026800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103300468D01F TWD168827S (zh) | 2013-07-29 | 2014-01-24 | 半導體製造裝置用晶舟 |
Country Status (2)
Country | Link |
---|---|
US (1) | USD747279S1 (zh) |
TW (1) | TWD168827S (zh) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD766850S1 (en) * | 2014-03-28 | 2016-09-20 | Tokyo Electron Limited | Wafer holder for manufacturing semiconductor |
JP1537629S (zh) * | 2014-11-20 | 2015-11-09 | ||
JP1537630S (zh) * | 2014-11-20 | 2015-11-09 | ||
JP1537312S (zh) * | 2014-11-20 | 2015-11-09 | ||
JP1537313S (zh) * | 2014-11-20 | 2015-11-09 | ||
JP1563649S (zh) * | 2016-02-12 | 2016-11-21 | ||
CN206961808U (zh) * | 2017-07-14 | 2018-02-02 | 君泰创新(北京)科技有限公司 | 硅片清洗工装 |
JP1597807S (zh) * | 2017-08-21 | 2018-02-19 | ||
USD847105S1 (en) * | 2018-05-03 | 2019-04-30 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD846514S1 (en) * | 2018-05-03 | 2019-04-23 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
JP1638282S (zh) * | 2018-09-20 | 2019-08-05 | ||
USD908103S1 (en) * | 2019-02-20 | 2021-01-19 | Veeco Instruments Inc. | Transportable semiconductor wafer rack |
USD908102S1 (en) * | 2019-02-20 | 2021-01-19 | Veeco Instruments Inc. | Transportable semiconductor wafer rack |
JP1658652S (zh) * | 2019-08-07 | 2020-04-27 | ||
JP1678278S (ja) * | 2020-03-19 | 2021-02-01 | 基板処理装置用ボート | |
JP1731674S (zh) * | 2022-05-30 | 2022-12-08 | ||
JP1731675S (zh) * | 2022-05-30 | 2022-12-08 | ||
JP1731673S (zh) * | 2022-05-30 | 2022-12-08 |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD361752S (en) * | 1993-09-17 | 1995-08-29 | Tokyo Electron Kasbushiki Kaisha | Wafer boat or rack for holding semiconductor wafers |
USD366868S (en) * | 1993-09-29 | 1996-02-06 | Tokyo Electron Kabushiki Kaisha | Wafer boat or rack |
USD378675S (en) * | 1995-05-30 | 1997-04-01 | Tokyo Electron Limited | Wafer boat |
USD380454S (en) * | 1995-05-30 | 1997-07-01 | Tokyo Electron Limited | Wafer boat |
USD378823S (en) * | 1995-05-30 | 1997-04-15 | Tokyo Electron Limited | Wafer boat |
JP3218164B2 (ja) * | 1995-05-31 | 2001-10-15 | 東京エレクトロン株式会社 | 被処理体の支持ボート、熱処理装置及び熱処理方法 |
JP3122364B2 (ja) * | 1996-02-06 | 2001-01-09 | 東京エレクトロン株式会社 | ウエハボート |
TW325588B (en) * | 1996-02-28 | 1998-01-21 | Asahi Glass Co Ltd | Vertical wafer boat |
KR19990077350A (ko) * | 1996-02-29 | 1999-10-25 | 히가시 데쓰로 | 반도체웨이퍼의 열처리용 보트 |
USD404015S (en) * | 1997-01-31 | 1999-01-12 | Tokyo Electron Ltd. | Wafer boat for use in a semiconductor wafer heat processing apparatus |
USD404371S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Wafer boat for use in a semiconductor wafer heat processing apparatus |
USD411176S (en) * | 1997-08-20 | 1999-06-22 | Tokyo Electron Limited | Wafer boat for use in a semiconductor wafer heat processing apparatus |
USD409158S (en) * | 1997-08-20 | 1999-05-04 | Tokyo Electron Limited | Wafer boat for use in a semiconductor wafer heat processing apparatus |
KR20000002833A (ko) * | 1998-06-23 | 2000-01-15 | 윤종용 | 반도체 웨이퍼 보트 |
JP3487497B2 (ja) * | 1998-06-24 | 2004-01-19 | 岩手東芝エレクトロニクス株式会社 | 被処理体収容治具及びこれを用いた熱処理装置 |
US6099645A (en) * | 1999-07-09 | 2000-08-08 | Union Oil Company Of California | Vertical semiconductor wafer carrier with slats |
US6287112B1 (en) * | 2000-03-30 | 2001-09-11 | Asm International, N.V. | Wafer boat |
US6341935B1 (en) * | 2000-06-14 | 2002-01-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer boat having improved wafer holding capability |
JP4506125B2 (ja) * | 2003-07-16 | 2010-07-21 | 信越半導体株式会社 | 熱処理用縦型ボート及びその製造方法 |
USD570308S1 (en) * | 2006-05-01 | 2008-06-03 | Tokyo Electron Limited | Wafer boat |
USD580894S1 (en) * | 2006-05-01 | 2008-11-18 | Tokyo Electron Limited | Wafer boat |
USD570309S1 (en) * | 2006-10-25 | 2008-06-03 | Tokyo Electron Limited | Wafer boat |
USD600222S1 (en) * | 2008-03-28 | 2009-09-15 | Tokyo Electron Limited | Wafer boat |
USD600221S1 (en) * | 2008-03-28 | 2009-09-15 | Tokyo Electron Limited | Wafer boat |
USD616394S1 (en) * | 2009-03-06 | 2010-05-25 | Tokyo Electron Limited | Support of wafer boat for manufacturing semiconductor wafers |
USD616395S1 (en) * | 2009-03-11 | 2010-05-25 | Tokyo Electron Limited | Support of wafer boat for manufacturing semiconductor wafers |
USD616396S1 (en) * | 2009-03-12 | 2010-05-25 | Tokyo Electron Limited | Pedestal of heat insulating cylinder for manufacturing semiconductor wafers |
USD655682S1 (en) * | 2010-06-18 | 2012-03-13 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
USD655255S1 (en) * | 2010-06-18 | 2012-03-06 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
-
2014
- 2014-01-24 TW TW103300468D01F patent/TWD168827S/zh unknown
- 2014-01-27 US US29/480,455 patent/USD747279S1/en active Active
Also Published As
Publication number | Publication date |
---|---|
USD747279S1 (en) | 2016-01-12 |
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