TWD182750S - 用於半導體處理腔室之噴淋頭（三） - Google Patents

用於半導體處理腔室之噴淋頭（三）

Info

Publication number
TWD182750S
TWD182750S TW105305434F TW105305434F TWD182750S TW D182750 S TWD182750 S TW D182750S TW 105305434 F TW105305434 F TW 105305434F TW 105305434 F TW105305434 F TW 105305434F TW D182750 S TWD182750 S TW D182750S
Authority
TW
Taiwan
Prior art keywords
semiconductor processing
showerhead
processing chamber
view
design
Prior art date
Application number
TW105305434F
Other languages
English (en)
Inventor
Lara Hawrylchak
Kong Lung Samuel Chan
Aaron Miller
Original Assignee
應用材料股份有限公司
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 應用材料股份有限公司, Applied Materials Inc filed Critical 應用材料股份有限公司
Publication of TWD182750S publication Critical patent/TWD182750S/zh

Links

Abstract

【物品用途】;本設計所請求為用於半導體處理腔室之噴淋頭。;【設計說明】;後視圖與前視圖呈左右鏡射因而省略；左側視圖與右側視圖呈左右鏡射因而省略。
TW105305434F 2016-04-08 2016-09-13 用於半導體處理腔室之噴淋頭（三） TWD182750S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/560,680 USD790039S1 (en) 2016-04-08 2016-04-08 Showerhead for a semiconductor processing chamber

Publications (1)

Publication Number Publication Date
TWD182750S true TWD182750S (zh) 2017-05-01

Family

ID=59033933

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105305434F TWD182750S (zh) 2016-04-08 2016-09-13 用於半導體處理腔室之噴淋頭（三）

Country Status (2)

Country Link
US (1) USD790039S1 (zh)
TW (1) TWD182750S (zh)

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USD823985S1 (en) * 2016-12-16 2018-07-24 Kohler Co. Showerhead with non-uniform arrangement of spray nozzles of varying sizes
JP1598996S (zh) * 2017-08-31 2018-03-05
USD868124S1 (en) 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11577260B2 (en) 2018-08-22 2023-02-14 Kohler Co. Showerhead
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD968563S1 (en) 2019-08-29 2022-11-01 Kohler Co. Showerhead
USD975239S1 (en) 2019-10-30 2023-01-10 Kohler Co. Showerhead
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD969980S1 (en) 2020-10-20 2022-11-15 Applied Materials, Inc. Deposition chamber showerhead
USD967351S1 (en) 2020-10-20 2022-10-18 Applied Materials, Inc. Showerhead reflector
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

Family Cites Families (22)

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US6086677A (en) 1998-06-16 2000-07-11 Applied Materials, Inc. Dual gas faceplate for a showerhead in a semiconductor wafer processing system
US6793733B2 (en) 2002-01-25 2004-09-21 Applied Materials Inc. Gas distribution showerhead
US20050103265A1 (en) 2003-11-19 2005-05-19 Applied Materials, Inc., A Delaware Corporation Gas distribution showerhead featuring exhaust apertures
US6983892B2 (en) 2004-02-05 2006-01-10 Applied Materials, Inc. Gas distribution showerhead for semiconductor processing
US20060021703A1 (en) 2004-07-29 2006-02-02 Applied Materials, Inc. Dual gas faceplate for a showerhead in a semiconductor wafer processing system
CN100451163C (zh) * 2006-10-18 2009-01-14 中微半导体设备(上海)有限公司 用于半导体工艺件处理反应器的气体分布装置及其反应器
USD566228S1 (en) * 2007-03-09 2008-04-08 Speakman Company Shower
US8876024B2 (en) 2008-01-10 2014-11-04 Applied Materials, Inc. Heated showerhead assembly
USD587339S1 (en) * 2008-01-31 2009-02-24 Hansgrohe Ag Showerhead
USD639385S1 (en) * 2010-04-08 2011-06-07 Grohe Ag Shower head
USD641829S1 (en) * 2010-10-29 2011-07-19 Novellus Systems, Inc. Plasma reactor showerhead face plate having concentric ridge pattern
USD694359S1 (en) * 2012-07-11 2013-11-26 Hansgrohe Se Overhead shower
TWD161516S (zh) * 2013-02-07 2014-07-01 漢斯葛洛公司 蓮蓬頭
US9353439B2 (en) * 2013-04-05 2016-05-31 Lam Research Corporation Cascade design showerhead for transient uniformity
US9464353B2 (en) * 2013-11-21 2016-10-11 Wonik Ips Co., Ltd. Substrate processing apparatus
US9343307B2 (en) 2013-12-24 2016-05-17 Ultratech, Inc. Laser spike annealing using fiber lasers
US9484190B2 (en) * 2014-01-25 2016-11-01 Yuri Glukhoy Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area
USD733257S1 (en) * 2014-02-14 2015-06-30 Hansgrohe Se Overhead shower
USD736348S1 (en) * 2014-07-07 2015-08-11 Jiangmen Triumph Rain Showers Co., LTD Spray head for a shower
USD751176S1 (en) * 2014-08-07 2016-03-08 Hansgrohe Se Overhead shower
USD757893S1 (en) * 2014-11-04 2016-05-31 Custom Molded Products, Inc. Jet nozzle insert
USD752708S1 (en) * 2014-12-01 2016-03-29 Shong I Copper Co., Ltd. Showerhead

Also Published As

Publication number Publication date
USD790039S1 (en) 2017-06-20

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