TWD209650S - Pvd腔的沉積環 - Google Patents
Pvd腔的沉積環 Download PDFInfo
- Publication number
- TWD209650S TWD209650S TW108303547D01F TW108303547D01F TWD209650S TW D209650 S TWD209650 S TW D209650S TW 108303547D01 F TW108303547D01 F TW 108303547D01F TW 108303547D01 F TW108303547D01 F TW 108303547D01F TW D209650 S TWD209650 S TW D209650S
- Authority
- TW
- Taiwan
- Prior art keywords
- design
- deposition ring
- pvd chamber
- cross
- sectional
- Prior art date
Links
- 230000008021 deposition Effects 0.000 title abstract description 5
- 238000000034 method Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 1
Images
Abstract
【物品用途】;本設計所請求之PVD腔的沉積環係用於半導體製程之沉積環。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。;剖視圖所示為俯視圖中剖面線位置之局部剖視結構。;本衍生設計與原設計不同之處在於以虛線呈現部分的外觀。
Description
本設計所請求之PVD腔的沉積環係用於半導體製程之沉積環。
圖式所揭露之虛線部分，為本案不主張設計之部分。
剖視圖所示為俯視圖中剖面線位置之局部剖視結構。
本衍生設計與原設計不同之處在於以虛線呈現部分的外觀。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/673,685 | 2018-12-17 | ||
| US29/673,685 USD888903S1 (en) | 2018-12-17 | 2018-12-17 | Deposition ring for physical vapor deposition chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD209650S true TWD209650S (zh) | 2021-02-01 |
Family
ID=71109521
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108303547F TWD207532S (zh) | 2018-12-17 | 2019-06-17 | Pvd腔的沉積環 |
| TW108303547D01F TWD209650S (zh) | 2018-12-17 | 2019-06-17 | Pvd腔的沉積環 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108303547F TWD207532S (zh) | 2018-12-17 | 2019-06-17 | Pvd腔的沉積環 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD888903S1 (zh) |
| JP (2) | JP1669226S (zh) |
| TW (2) | TWD207532S (zh) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1011671S1 (en) | 1991-07-02 | 2024-01-16 | Bway Corporation | Container |
| USD868124S1 (en) | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| US11961723B2 (en) * | 2018-12-17 | 2024-04-16 | Applied Materials, Inc. | Process kit having tall deposition ring for PVD chamber |
| USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD932721S1 (en) * | 2020-02-26 | 2021-10-05 | Bway Corporation | Container ring |
| USD908645S1 (en) * | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
| US11832770B2 (en) | 2019-11-06 | 2023-12-05 | North Shore Medical, Llc | Disposable commode receptacle |
| USD939694S1 (en) * | 2019-11-06 | 2021-12-28 | North Shore Medical, Llc | Disposable commode receptacle |
| US11551960B2 (en) | 2020-01-30 | 2023-01-10 | Applied Materials, Inc. | Helical plug for reduction or prevention of arcing in a substrate support |
| USD1015669S1 (en) | 2020-02-26 | 2024-02-20 | Bway Corporation | Container ring |
| USD936190S1 (en) * | 2020-02-27 | 2021-11-16 | Caterpillar Inc. | Ripple seal |
| USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
| USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD972101S1 (en) * | 2020-05-08 | 2022-12-06 | Bloomy Lotus Ltd | Air purifier |
| TWD214021S (zh) | 2020-07-27 | 2021-09-11 | 美商應用材料股份有限公司 | 邊緣環 |
| USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
| US11581166B2 (en) | 2020-07-31 | 2023-02-14 | Applied Materials, Inc. | Low profile deposition ring for enhanced life |
| USD985741S1 (en) * | 2020-11-06 | 2023-05-09 | Kubota Corporation | Gland for pipe joints |
| US11996315B2 (en) | 2020-11-18 | 2024-05-28 | Applied Materials, Inc. | Thin substrate handling via edge clamping |
| USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD939695S1 (en) * | 2020-12-18 | 2021-12-28 | North Shore Medical, Llc | Disposable commode receptacle |
| USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| US11581167B2 (en) * | 2021-06-18 | 2023-02-14 | Applied Materials, Inc. | Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber |
| TWD227909S (zh) | 2023-04-21 | 2023-10-01 | 錩崎勝企業有限公司 | 壁式水龍頭蓋板用密封材 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW366550B (en) | 1996-05-08 | 1999-08-11 | Applied Materials Inc | Deposition ring anti-rotation apparatus |
| TW200420193A (en) | 2002-12-16 | 2004-10-01 | Ifire Technology Inc | Composite sputter target and phosphor deposition method |
| TWM431893U (en) | 2012-02-10 | 2012-06-21 | Well Thin Technology Ltd | Deposition ring |
| TW201413868A (zh) | 2012-08-30 | 2014-04-01 | 應用材料股份有限公司 | 反射沉積環及包含反射沉積環之基板處理室 |
| TW201525172A (zh) | 2013-12-18 | 2015-07-01 | Applied Materials Inc | 具有低摩擦墊之物理氣相沉積標靶 |
| TWD188898S (zh) | 2016-09-30 | 2018-03-01 | 應用材料股份有限公司 | 物理氣相沉積室靶 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD244533S (en) * | 1975-06-11 | 1977-05-31 | Ite Imperial Corporation | Water resistant gasket for conduits and the like |
| USD338621S (en) * | 1991-03-14 | 1993-08-24 | Balson John E | Rim seal for a can |
| US5803977A (en) * | 1992-09-30 | 1998-09-08 | Applied Materials, Inc. | Apparatus for full wafer deposition |
| USD379588S (en) * | 1995-03-22 | 1997-06-03 | Greene, Tweed Of Delaware, Inc. | Seal |
| USD497977S1 (en) * | 2003-01-22 | 2004-11-02 | Tour & Andersson Ab | Sealing ring membrane |
| US9127362B2 (en) | 2005-10-31 | 2015-09-08 | Applied Materials, Inc. | Process kit and target for substrate processing chamber |
| US7520969B2 (en) * | 2006-03-07 | 2009-04-21 | Applied Materials, Inc. | Notched deposition ring |
| US8221602B2 (en) * | 2006-12-19 | 2012-07-17 | Applied Materials, Inc. | Non-contact process kit |
| JP5172444B2 (ja) * | 2008-04-14 | 2013-03-27 | 日立建機株式会社 | 軸受装置 |
| JP2013537719A (ja) * | 2010-08-20 | 2013-10-03 | アプライド マテリアルズ インコーポレイテッド | 長寿命デポジションリング |
| CN103140913B (zh) | 2010-10-29 | 2016-09-28 | 应用材料公司 | 用于物理气相沉积腔室的沉积环及静电夹盘 |
| USD665491S1 (en) * | 2012-01-25 | 2012-08-14 | Applied Materials, Inc. | Deposition chamber cover ring |
| US9534286B2 (en) | 2013-03-15 | 2017-01-03 | Applied Materials, Inc. | PVD target for self-centering process shield |
| US9799497B2 (en) | 2013-08-16 | 2017-10-24 | Taiwan Semiconductor Manufacturing Company Limited | Patterned processing kits for material processing |
| USD798248S1 (en) | 2015-06-18 | 2017-09-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| JP6976925B2 (ja) | 2015-07-03 | 2021-12-08 | アプライド マテリアルズ インコーポレイテッドApplied Materials, Incorporated | 背高の堆積リングと堆積リングクランプとを有するプロセスキット |
| CN206573738U (zh) | 2017-03-16 | 2017-10-20 | 江苏亨通光导新材料有限公司 | 低损耗光纤 |
| CN207176067U (zh) | 2017-06-08 | 2018-04-03 | 北京北方华创微电子装备有限公司 | 沉积环及卡盘组件 |
-
2018
- 2018-12-17 US US29/673,685 patent/USD888903S1/en active Active
-
2019
- 2019-06-17 TW TW108303547F patent/TWD207532S/zh unknown
- 2019-06-17 JP JPD2019-13254F patent/JP1669226S/ja active Active
- 2019-06-17 JP JPD2020-4209F patent/JP1669283S/ja active Active
- 2019-06-17 TW TW108303547D01F patent/TWD209650S/zh unknown
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW366550B (en) | 1996-05-08 | 1999-08-11 | Applied Materials Inc | Deposition ring anti-rotation apparatus |
| TW200420193A (en) | 2002-12-16 | 2004-10-01 | Ifire Technology Inc | Composite sputter target and phosphor deposition method |
| TWM431893U (en) | 2012-02-10 | 2012-06-21 | Well Thin Technology Ltd | Deposition ring |
| TW201413868A (zh) | 2012-08-30 | 2014-04-01 | 應用材料股份有限公司 | 反射沉積環及包含反射沉積環之基板處理室 |
| TWI600108B (zh) | 2012-08-30 | 2017-09-21 | 應用材料股份有限公司 | 反射沉積環及包含反射沉積環之基板處理室 |
| TW201525172A (zh) | 2013-12-18 | 2015-07-01 | Applied Materials Inc | 具有低摩擦墊之物理氣相沉積標靶 |
| TWD188898S (zh) | 2016-09-30 | 2018-03-01 | 應用材料股份有限公司 | 物理氣相沉積室靶 |
| TWD191626S (zh) | 2016-09-30 | 2018-07-11 | 應用材料股份有限公司 | 物理氣相沉積室靶 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1669283S (zh) | 2020-09-28 |
| USD888903S1 (en) | 2020-06-30 |
| TWD207532S (zh) | 2020-10-01 |
| JP1669226S (zh) | 2020-09-28 |
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