TWD207532S - Pvd腔的沉積環 - Google Patents
Pvd腔的沉積環 Download PDFInfo
- Publication number
- TWD207532S TWD207532S TW108303547F TW108303547F TWD207532S TW D207532 S TWD207532 S TW D207532S TW 108303547 F TW108303547 F TW 108303547F TW 108303547 F TW108303547 F TW 108303547F TW D207532 S TWD207532 S TW D207532S
- Authority
- TW
- Taiwan
- Prior art keywords
- deposition ring
- pvd chamber
- design
- cross
- sectional
- Prior art date
Links
- 230000008021 deposition Effects 0.000 title abstract description 5
- 238000000034 method Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
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Abstract
【物品用途】;本設計所請求之PVD腔的沉積環係用於半導體製程之沉積環。;【設計說明】;剖視圖所示為俯視圖中剖面線位置之局部剖視結構。
Description
本設計所請求之PVD腔的沉積環係用於半導體製程之沉積環。
剖視圖所示為俯視圖中剖面線位置之局部剖視結構。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/673,685 | 2018-12-17 | ||
US29/673,685 USD888903S1 (en) | 2018-12-17 | 2018-12-17 | Deposition ring for physical vapor deposition chamber |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD207532S true TWD207532S (zh) | 2020-10-01 |
Family
ID=71109521
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108303547F TWD207532S (zh) | 2018-12-17 | 2019-06-17 | Pvd腔的沉積環 |
TW108303547D01F TWD209650S (zh) | 2018-12-17 | 2019-06-17 | Pvd腔的沉積環 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108303547D01F TWD209650S (zh) | 2018-12-17 | 2019-06-17 | Pvd腔的沉積環 |
Country Status (3)
Country | Link |
---|---|
US (1) | USD888903S1 (zh) |
JP (2) | JP1669226S (zh) |
TW (2) | TWD207532S (zh) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1011671S1 (en) | 1991-07-02 | 2024-01-16 | Bway Corporation | Container |
USD868124S1 (en) | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US11961723B2 (en) * | 2018-12-17 | 2024-04-16 | Applied Materials, Inc. | Process kit having tall deposition ring for PVD chamber |
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD932721S1 (en) * | 2020-02-26 | 2021-10-05 | Bway Corporation | Container ring |
USD908645S1 (en) * | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
US11832770B2 (en) | 2019-11-06 | 2023-12-05 | North Shore Medical, Llc | Disposable commode receptacle |
USD939694S1 (en) * | 2019-11-06 | 2021-12-28 | North Shore Medical, Llc | Disposable commode receptacle |
US11551960B2 (en) | 2020-01-30 | 2023-01-10 | Applied Materials, Inc. | Helical plug for reduction or prevention of arcing in a substrate support |
USD1015669S1 (en) | 2020-02-26 | 2024-02-20 | Bway Corporation | Container ring |
USD936190S1 (en) * | 2020-02-27 | 2021-11-16 | Caterpillar Inc. | Ripple seal |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD972101S1 (en) * | 2020-05-08 | 2022-12-06 | Bloomy Lotus Ltd | Air purifier |
TWD214021S (zh) | 2020-07-27 | 2021-09-11 | 美商應用材料股份有限公司 | 邊緣環 |
USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
US11581166B2 (en) | 2020-07-31 | 2023-02-14 | Applied Materials, Inc. | Low profile deposition ring for enhanced life |
USD985741S1 (en) * | 2020-11-06 | 2023-05-09 | Kubota Corporation | Gland for pipe joints |
US11996315B2 (en) | 2020-11-18 | 2024-05-28 | Applied Materials, Inc. | Thin substrate handling via edge clamping |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD939695S1 (en) * | 2020-12-18 | 2021-12-28 | North Shore Medical, Llc | Disposable commode receptacle |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US11581167B2 (en) * | 2021-06-18 | 2023-02-14 | Applied Materials, Inc. | Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber |
TWD227909S (zh) | 2023-04-21 | 2023-10-01 | 錩崎勝企業有限公司 | 壁式水龍頭蓋板用密封材 |
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CN207176067U (zh) | 2017-06-08 | 2018-04-03 | 北京北方华创微电子装备有限公司 | 沉积环及卡盘组件 |
-
2018
- 2018-12-17 US US29/673,685 patent/USD888903S1/en active Active
-
2019
- 2019-06-17 TW TW108303547F patent/TWD207532S/zh unknown
- 2019-06-17 JP JPD2019-13254F patent/JP1669226S/ja active Active
- 2019-06-17 JP JPD2020-4209F patent/JP1669283S/ja active Active
- 2019-06-17 TW TW108303547D01F patent/TWD209650S/zh unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW366550B (en) | 1996-05-08 | 1999-08-11 | Applied Materials Inc | Deposition ring anti-rotation apparatus |
TW200420193A (en) | 2002-12-16 | 2004-10-01 | Ifire Technology Inc | Composite sputter target and phosphor deposition method |
TWM431893U (en) | 2012-02-10 | 2012-06-21 | Well Thin Technology Ltd | Deposition ring |
TW201413868A (zh) | 2012-08-30 | 2014-04-01 | 應用材料股份有限公司 | 反射沉積環及包含反射沉積環之基板處理室 |
TWI600108B (zh) | 2012-08-30 | 2017-09-21 | 應用材料股份有限公司 | 反射沉積環及包含反射沉積環之基板處理室 |
TW201525172A (zh) | 2013-12-18 | 2015-07-01 | Applied Materials Inc | 具有低摩擦墊之物理氣相沉積標靶 |
TWD188898S (zh) | 2016-09-30 | 2018-03-01 | 應用材料股份有限公司 | 物理氣相沉積室靶 |
TWD191626S (zh) | 2016-09-30 | 2018-07-11 | 應用材料股份有限公司 | 物理氣相沉積室靶 |
Also Published As
Publication number | Publication date |
---|---|
TWD209650S (zh) | 2021-02-01 |
JP1669283S (zh) | 2020-09-28 |
USD888903S1 (en) | 2020-06-30 |
JP1669226S (zh) | 2020-09-28 |
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