TWD174924S - 反應管 - Google Patents

反應管

Info

Publication number
TWD174924S
TWD174924S TW104304589F TW104304589F TWD174924S TW D174924 S TWD174924 S TW D174924S TW 104304589 F TW104304589 F TW 104304589F TW 104304589 F TW104304589 F TW 104304589F TW D174924 S TWD174924 S TW D174924S
Authority
TW
Taiwan
Prior art keywords
reaction tube
item
raw materials
product
tube
Prior art date
Application number
TW104304589F
Other languages
English (en)
Inventor
Hideto Tateno
Daisuke Hara
Original Assignee
日立國際電氣股份有限公司
Hitachi Int Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司, Hitachi Int Electric Inc filed Critical 日立國際電氣股份有限公司
Publication of TWD174924S publication Critical patent/TWD174924S/zh

Links

Abstract

【物品用途】;本設計的物品是基板處理裝置用反應管。;【設計說明】;液體原料或氣體化原料,通過噴嘴供給至反應管內,對載置於反應管內的半導體基板進行處理。本物品本體內壁具有氣體噴嘴、熱電偶保護管,是利用焊接固定在本體上。;本物品之本體、氣體噴嘴、熱電偶保護管、排氣管及反應管凸緣全部都是透明的。
TW104304589F 2015-02-23 2015-08-21 反應管 TWD174924S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-3570F JP1534829S (zh) 2015-02-23 2015-02-23

Publications (1)

Publication Number Publication Date
TWD174924S true TWD174924S (zh) 2016-04-11

Family

ID=54258269

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104304589F TWD174924S (zh) 2015-02-23 2015-08-21 反應管

Country Status (3)

Country Link
US (1) USD778458S1 (zh)
JP (1) JP1534829S (zh)
TW (1) TWD174924S (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD813065S1 (en) * 2016-02-10 2018-03-20 Hitachi Kokusai Electric Inc. Gas sampling cell
JP1605460S (zh) 2017-08-09 2021-05-31
USD857227S1 (en) * 2017-11-22 2019-08-20 Droycon Bioconcepts Inc. Microbiologically interactive growth platform
JP1605982S (zh) * 2017-12-27 2021-05-31
USD923808S1 (en) * 2018-07-30 2021-06-29 Zhejiang Orieng Gene Biotech Co., Ltd. Liquid sample collector and test device in combination
USD931823S1 (en) 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
USD1010476S1 (en) * 2020-02-14 2024-01-09 Olababy Incorporated Translucent cup with measurement indicators
JP1678273S (ja) * 2020-03-10 2021-02-01 反応管

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US6867393B1 (en) * 2003-12-05 2005-03-15 Robert W. Lewis Steam sterilization system for sterilizing medical waste
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD569008S1 (en) * 2007-12-20 2008-05-13 Ge Healthcare Bio-Sciences Ab Chromatography column
JP4930438B2 (ja) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 反応管及び熱処理装置
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167985S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
USD742339S1 (en) * 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD748594S1 (en) * 2014-03-12 2016-02-02 Hitachi Kokusai Electric Inc. Reaction tube

Also Published As

Publication number Publication date
JP1534829S (zh) 2015-10-13
USD778458S1 (en) 2017-02-07

Similar Documents

Publication Publication Date Title
TWD174924S (zh) 反應管
TWD176127S (zh) 反應管之部分
TWD186431S (zh) 用於半導體沉積設備的排氣流控制環
TWD167986S (zh) 反應管之部分
UA112456C2 (uk) Аерозолеутворювальний виріб для використання з пристроєм для утворення аерозолю
TWD167987S (zh) 反應管之部分
TWD185135S (zh) 超音波裝置
TWD167985S (zh) 反應管之部分
TWD177508S (zh) 超音波裝置
TWD177997S (zh) 基板處理裝置用隔熱具
TWD178203S (zh) 管配件
TWD169004S (zh) 反應管之部分
TWD186396S (zh) 電漿處理裝置用環
TWD177998S (zh) 基板處理裝置用隔熱具
TWD177999S (zh) 基板處理裝置用隔熱具
TWD167038S (zh) 瓶子
TWD197467S (zh) 基板處理裝置用氣體導入管
TWD177996S (zh) 基板處理裝置用隔熱具
TWD171078S (zh) 基板處理裝置用氣體供給噴嘴之部分
TWD183009S (zh) 基板處理裝置用加熱器之部分
TWD184739S (zh) 排氣配管
TWD187000S (zh) 基板處理裝置用加熱機之部分
TWD192802S (zh) Bottle (1)
TWD174919S (zh) 基板處理裝置用氣體供給噴嘴
TWD195807S (zh) 托架