TWD159673S - 基板處理裝置用廻轉器 - Google Patents
基板處理裝置用廻轉器Info
- Publication number
- TWD159673S TWD159673S TW102302397F TW102302397F TWD159673S TW D159673 S TWD159673 S TW D159673S TW 102302397 F TW102302397 F TW 102302397F TW 102302397 F TW102302397 F TW 102302397F TW D159673 S TWD159673 S TW D159673S
- Authority
- TW
- Taiwan
- Prior art keywords
- processing device
- substrate processing
- rotator
- revolver
- article
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 3
- 235000012431 wafers Nutrition 0.000 abstract 4
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是基板處理裝置用廻轉器，為一種中介著安裝凸緣而安裝在用來處理晶圓的基板處理裝置上來使用的廻轉器，並且是在廻轉部載置著用來保持晶圓的晶舟，可使晶舟廻轉的廻轉器。再者，驅動廻轉部的馬達，是被安裝在馬達安裝部(coupling)使用。;【設計說明】
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012029396 | 2012-11-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD159673S true TWD159673S (zh) | 2014-04-01 |
Family
ID=90414846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102302397F TWD159673S (zh) | 2012-11-30 | 2013-04-01 | 基板處理裝置用廻轉器 |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWD159673S (zh) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD947914S1 (en) | 2020-11-23 | 2022-04-05 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| US11887878B2 (en) | 2019-06-28 | 2024-01-30 | Applied Materials, Inc. | Detachable biasable electrostatic chuck for high temperature applications |
| USD1038901S1 (en) | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
-
2013
- 2013-04-01 TW TW102302397F patent/TWD159673S/zh unknown
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| US11887878B2 (en) | 2019-06-28 | 2024-01-30 | Applied Materials, Inc. | Detachable biasable electrostatic chuck for high temperature applications |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD947914S1 (en) | 2020-11-23 | 2022-04-05 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
| USD960216S1 (en) | 2020-11-23 | 2022-08-09 | Applied Materials, Inc. | Base plate for a processing chamber substrate support |
| USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1038901S1 (en) | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD1110975S1 (en) | 2022-01-12 | 2026-02-03 | Applied Materials Inc. | Collimator for a physical vapor deposition (PVD) chamber |
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