TWD183010S - 基板處理裝置用晶舟 - Google Patents

基板處理裝置用晶舟

Info

Publication number
TWD183010S
TWD183010S TW105304454F TW105304454F TWD183010S TW D183010 S TWD183010 S TW D183010S TW 105304454 F TW105304454 F TW 105304454F TW 105304454 F TW105304454 F TW 105304454F TW D183010 S TWD183010 S TW D183010S
Authority
TW
Taiwan
Prior art keywords
substrate processing
processing equipment
article
wafer boats
wafer boat
Prior art date
Application number
TW105304454F
Other languages
English (en)
Inventor
Hidenari Yoshida
Toru Kagaya
Atsushi Hirano
Original Assignee
日立國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司 filed Critical 日立國際電氣股份有限公司
Publication of TWD183010S publication Critical patent/TWD183010S/zh

Links

Abstract

【物品用途】;本設計的物品是基板處理裝置用晶舟，為一種用於處理基板的基板處理裝置之晶舟。本物品是為了將複數的基板水平保持在基板處理裝置的反應室內的晶舟，係將基板載置於形成在左右及後方的柱子上的插銷形狀的突起上。;【設計說明】;(無)
TW105304454F 2016-02-12 2016-08-03 基板處理裝置用晶舟 TWD183010S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2016-3052F JP1563649S (zh) 2016-02-12 2016-02-12

Publications (1)

Publication Number Publication Date
TWD183010S true TWD183010S (zh) 2017-05-11

Family

ID=57321979

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105304454F TWD183010S (zh) 2016-02-12 2016-08-03 基板處理裝置用晶舟

Country Status (3)

Country Link
US (1) USD839219S1 (zh)
JP (1) JP1563649S (zh)
TW (1) TWD183010S (zh)

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CN206961808U (zh) * 2017-07-14 2018-02-02 君泰创新（北京）科技有限公司 硅片清洗工装
JP1597807S (zh) * 2017-08-21 2018-02-19
USD846514S1 (en) 2018-05-03 2019-04-23 Kokusai Electric Corporation Boat of substrate processing apparatus
JP1638282S (zh) * 2018-09-20 2019-08-05
USD908102S1 (en) * 2019-02-20 2021-01-19 Veeco Instruments Inc. Transportable semiconductor wafer rack
USD908103S1 (en) * 2019-02-20 2021-01-19 Veeco Instruments Inc. Transportable semiconductor wafer rack
KR102552458B1 (ko) * 2019-07-31 2023-07-06 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치, 기판 지지구 및 반도체 장치의 제조 방법
JP1658652S (zh) * 2019-08-07 2020-04-27
JP1678278S (ja) * 2020-03-19 2021-02-01 基板処理装置用ボート
JP1731674S (zh) * 2022-05-30 2022-12-08
JP1731673S (zh) * 2022-05-30 2022-12-08
JP1731675S (zh) * 2022-05-30 2022-12-08

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TWD161688S (zh) * 2012-12-27 2014-07-11 日立國際電氣股份有限公司 半導體製造裝置用晶舟
TWD166332S (zh) * 2013-03-22 2015-03-01 日立國際電氣股份有限公司 基板處理裝置用晶舟之部分
TWD163542S (zh) * 2013-03-22 2014-10-11 日立國際電氣股份有限公司 基板處理裝置用晶舟
TWD168827S (zh) * 2013-07-29 2015-07-01 日立國際電氣股份有限公司 半導體製造裝置用晶舟
TWD167988S (zh) * 2013-07-29 2015-05-21 日立國際電氣股份有限公司 半導體製造裝置用晶舟
TWD165429S (zh) * 2013-07-29 2015-01-11 日立國際電氣股份有限公司 半導體製造裝置用晶舟
JP1537312S (zh) * 2014-11-20 2015-11-09
JP1537629S (zh) * 2014-11-20 2015-11-09

Also Published As

Publication number Publication date
JP1563649S (zh) 2016-11-21
USD839219S1 (en) 2019-01-29

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