RU2019117901A - Защитное покрытие - Google Patents

Защитное покрытие Download PDF

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RU2019117901A
RU2019117901A RU2019117901A RU2019117901A RU2019117901A RU 2019117901 A RU2019117901 A RU 2019117901A RU 2019117901 A RU2019117901 A RU 2019117901A RU 2019117901 A RU2019117901 A RU 2019117901A RU 2019117901 A RU2019117901 A RU 2019117901A
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precursor
precursor mixture
compound
formula
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Шайлендра Викрам СИНГХ
Джанфранко АРЕСТА
Эндрю Саймон Холл БРУКС
Сиобан Мари ВУЛЛАРД
Гарет ХЕННИГЭН
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Семблант Лимитед
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/34Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain
    • C08G2261/342Monomer units or repeat units incorporating structural elements in the main chain incorporating partially-aromatic structural elements in the main chain containing only carbon atoms
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Claims (34)

1. Способ осаждения защитного покрытия на основу, причем
защитное покрытие содержит (i) гидроизолирующий слой, который находится в контакте с основой, и который содержит первый подслой, необязательно - один или более промежуточных подслоев, и конечный подслой, (ii) слой для защиты от механических повреждений, который является неорганическим, и (iii) градиентный слой, расположенный между гидроизолирующим слоем и слоем для защиты от механических повреждений; и
способ включает
(а) осаждение первого подслоя гидроизолирующего слоя на основу посредством плазменного осаждения прекурсорной смеси (А), содержащей кремнийорганическое соединение, фторуглеводород или соединение формулы (X)
Figure 00000001
,
в которой Z1 обозначает C1-C3-алкильную группу или С23-алкенильную группу;
Z2 обозначает атом водорода, C1-C3-алкильную группу или С23-алкенильную группу;
Z3 обозначает атом водорода, C1-C3-алкильную группу или С23-алкенильную группу;
Z4 обозначает атом водорода, C1-C3-алкильную группу или С23-алкенильную группу;
Z5 обозначает атом водорода, C1-C3-алкильную группу или С23-алкенильную группу; и
Z6 обозначает атом водорода, C1-C3-алкильную группу или С23-алкенильную группу;
(b) осаждение, если они имеются, одного или более промежуточных подслоев гидроизолирующего слоя, во всех случаях - посредством плазменного осаждения прекурсорной смеси (В), содержащей кремнийорганическое соединение, фторуглеводород или соединение формулы (X);
(c) осаждение конечного подслоя гидроизолирующего слоя посредством плазменного осаждения прекурсорной смеси (С), содержащей кремнийорганическое соединение, фторуглеводород или соединение формулы (X);
(d) осаждение градиентного слоя на конечный подслой гидроизолирующего слоя посредством плазменного осаждения прекурсорной смеси (D), которая содержит компоненты обеих прекурсорных смесей (С) и (Е); и
(e) осаждение слоя для защиты от механических повреждений на градиентный слой посредством плазменного осаждения прекурсорной смеси (Е), содержащей кремнийорганическое соединение.
2. Способ по п. 1, отличающийся тем, что плазменное осаждение является стимулированным плазмой химическим осаждением из паровой фазы (PECVD).
3. Способ по п. 1 или п. 2, отличающийся тем, что плазменное осаждение происходит при давлении, лежащем в диапазоне от 0,001 мбар до 10 мбар.
4. Способ по любому из предыдущих пунктов, отличающийся тем, что кремнийорганические соединения, которые могут присутствовать в любой из прекурсорных смесей с (А) по (Е), независимо друг от друга выбраны из гексаметилдисилоксана (HMDSO), тетраметилдисилоксана (TMDSO), 1,3-дивинилтетраметилдисилоксана (DVTMDSO), гексавинилдисилоксана (HVDSO), аллилтриметилсилана, аллилтриметоксисилана (ATMOS), тетраэтилортосиликата (TEOS), триметилсилана (TMS), триизопропилсилана (TiPS), тривинил-триметил-циклотрисилоксана (V3D3), тетравинил-тетраметил-циклотетрасилоксана (V4D4), тетраметилциклотетрасилоксана (TMCS), октаметилциклотетрасилоксана (OMCTS), гексаметилдисилазана (HMDSN), 2,4,6-триметил-2,4,6-тривинилциклотрисилазана, диметиламино-триметилсилана (DMATMS), бис(диметиламино)диметилсилана (BDMADMS) и трис(диметиламино)метилсилана (TDMAMS).
5. Способ по п. 4, отличающийся тем, что кремнийорганические соединения, которые могут присутствовать в любой из прекурсорных смесей с (А) по (Е), независимо друг от друга выбраны из гексаметилдисилоксана (HMDSO) и тетраметилдисилоксана (TMDSO), и предпочтительно являются гексаметилдисилоксаном (HMDSO).
6. Способ по любому из предыдущих пунктов, отличающийся тем, что углеводородные соединения формулы (X), которые могут присутствовать в любой из прекурсорных смесей с (А) по (Е), независимо друг от друга выбраны из 1,4-диметилбензола, 1,3-диметилбензола, 1,2-диметилбензола, толуола, 4-метилстирола, 3-метилстирола, 2-метилстирола, 1,4-дивинилбензола, 1,3-дивинилбензола, 1,2-дивинилбензола, 1,4-этилвинилбензола, 1,3-этилвинилбензола и 1,2-этилвинилбензола.
7. Способ по п. 6, отличающийся тем, что углеводородные соединения формулы (X), которые могут присутствовать в любой из прекурсорных смесей с (А) по (Е), являются 1,4-диметилбензолом.
8. Способ по любому из предыдущих пунктов, отличающийся тем, что фторуглеводородные соединения, которые могут присутствовать в любой из прекурсорных смесей с (А) по (Е), независимо друг от друга выбраны из CF4, C2F4, C2F6, C3F6, C3F8 и C4F8.
9. Способ по п. 8, отличающийся тем, что фторуглеводородные соединения, которые могут присутствовать в любой из прекурсорных смесей с (А) по (Е), являются C3F6.
10. Способ по любому из предыдущих пунктов, отличающийся тем, что слой для защиты от механических повреждений имеет нанотвердость, равную по меньшей мере 6 ГПа, предпочтительно - по меньшей мере 10 ГПа.
11. Способ по любому из предыдущих пунктов, отличающийся тем, что прекурсорная смесь (Е) содержит кремнийорганическое соединение и O2, N2O или NO2.
12. Способ по любому из пунктов с 1 по 10, отличающийся тем, что прекурсорная смесь (Е) содержит азотсодержащее кремнийорганическое соединение.
13. Способ по любому из пунктов с 1 по 10, отличающийся тем, что прекурсорная смесь (Е) содержит кремнийорганическое соединение и N2 или NH3.
14. Способ по любому из пунктов с 11 по 13, отличающийся тем, что прекурсорная смесь (Е) дополнительно содержит Не, Ar и/или Kr.
15. Способ по любому из предыдущих пунктов, отличающийся тем, что (i) прекурсорная смесь (А) содержит фторуглеводород и (ii) прекурсорные смеси (С) и, если она присутствует, (В) содержат либо фторуглеводород, либо соединение формулы (X), при условии, что по меньшей мере одна из прекурсорных смесей (В) или (С) содержит соединение формулы (X).
16. Способ по любому из пунктов с 1 по 14, отличающийся тем, что каждая из прекурсорной смеси (А), прекурсорной смеси (С) и, если она присутствует, прекурсорной смеси (В) содержит кремнийорганическое соединение.
17. Способ по любому из пунктов с 1 по 14, отличающийся тем, что (i) прекурсорная смесь (А) содержит кремнийорганическое соединение и (ii) прекурсорные смеси (С) и, если она присутствует, (В) содержат либо кремнийорганическое соединение, либо соединение формулы (X), при условии, что по меньшей мере одна из прекурсорных смесей (В) или (С) содержит соединение формулы (X).
18. Способ по п. 16 или п. 17, отличающийся тем, что прекурсорная смесь (А) содержит кремнийорганическое соединение и не содержит или по существу не содержит O2, N2O или NO2, так что образующийся первый подслой является органическим.
19. Способ по любому из предыдущих пунктов, отличающийся тем, что основой является (i) наружный корпус электрического прибора или (ii) печатная плата.
20. Основа с защитным покрытием, которое может быть получено способом по любому из предыдущих пунктов.
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US20190344307A1 (en) 2019-11-14
CN110268810A (zh) 2019-09-20
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US11786930B2 (en) 2023-10-17
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